Youri Johannes Laurentius Maria VAN DOMMELEN

Person

Ballston Lake, NY, US

People

Patents Grantslast 30 patents

Information Patent Grant
Inspection method, lithographic apparatus, mask and substrate
- Patent number 10,394,137
- Issue date Aug 27, 2019
- ASML Netherlands B.V.
- Youri Johannes Laurentius Maria Van Dommelen
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Lithographic apparatus and a method of operating the apparatus
- Patent number 10,175,585
- Issue date Jan 8, 2019
- ASML Netherlands B.V.
- Robert Douglas Watso
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Inspection method, lithographic apparatus, mask and substrate
- Patent number 10,001,711
- Issue date Jun 19, 2018
- ASML Netherlands B.V.
- Youri Johannes Laurentius Maria Van Dommelen
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Lens heating aware source mask optimization for advanced lithography
- Patent number 9,940,427
- Issue date Apr 10, 2018
- ASML Netherlands B.V.
- Michael Matthew M. Crouse
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Lithographic apparatus, reflective member and a method of irradiati...
- Patent number 9,019,466
- Issue date Apr 28, 2015
- ASML Netherlands B.V.
- Martinus Hendrikus Antonius Leenders
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Lithographic apparatus and a method of operating the apparatus
- Patent number 8,823,918
- Issue date Sep 2, 2014
- ASML Netherlands B.V.
- Robert Douglas Watso
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Lithographic apparatus and device manufacturing method
- Patent number 8,780,321
- Issue date Jul 15, 2014
- ASML Netherlands B.V.
- Thijs Egidius Johannes Knaapen
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method of inspecting a substrate and method of preparing a substrat...
- Patent number 8,435,593
- Issue date May 7, 2013
- ASML Netherlands B.V.
- Rik Teodoor Vangheluwe
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Patents Applicationslast 30 patents

Information Patent Application
INSPECTION METHOD, LITHOGRAPHIC APPARATUS, MASK AND SUBSTRATE
- Publication number 20180253018
- Publication date Sep 6, 2018
- ASML NETHERLANDS B.V.
- Youri Johannes Laurentius Maria VAN DOMMELEN
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
INSPECTION METHOD, LITHOGRAPHIC APPARATUS, MASK AND SUBSTRATE
- Publication number 20160313656
- Publication date Oct 27, 2016
- ASML NETHERLANDS B.V.
- Youri Johannes Laurentius Maria VAN DOMMELEN
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
LITHOGRAPHIC APPARATUS AND A METHOD OF OPERATING THE APPARATUS
- Publication number 20150055102
- Publication date Feb 26, 2015
- ASML NETHERLANDS B.V.
- Robert Douglas WATSO
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
LENS HEATING AWARE SOURCE MASK OPTIMIZATION FOR ADVANCED LITHOGRAPHY
- Publication number 20130212543
- Publication date Aug 15, 2013
- ASML NETHERLANDS B.V.
- Michael Matthew M. CROUSE
- G06 - COMPUTING CALCULATING COUNTING

Youri Johannes Laurentius Maria VAN DOMMELEN

Person

Patents Grantslast 30 patents

Inspection method, lithographic apparatus, mask and substrate

Lithographic apparatus and a method of operating the apparatus

Inspection method, lithographic apparatus, mask and substrate

Lens heating aware source mask optimization for advanced lithography

Lithographic apparatus, reflective member and a method of irradiati...

Lithographic apparatus and a method of operating the apparatus

Lithographic apparatus and device manufacturing method

Method of inspecting a substrate and method of preparing a substrat...

Patents Applicationslast 30 patents

INSPECTION METHOD, LITHOGRAPHIC APPARATUS, MASK AND SUBSTRATE

INSPECTION METHOD, LITHOGRAPHIC APPARATUS, MASK AND SUBSTRATE

LITHOGRAPHIC APPARATUS AND A METHOD OF OPERATING THE APPARATUS

LENS HEATING AWARE SOURCE MASK OPTIMIZATION FOR ADVANCED LITHOGRAPHY