Yousuke Aoki

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Ibaraki, JP

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Patents Grantslast 30 patents

Information Patent Grant
Radiation-sensitive composition, method of forming silica-based coa...
- Patent number 8,158,981
- Issue date Apr 17, 2012
- Hitachi Chemical Company, Ltd.
- Kouichi Abe
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC

Patents Applicationslast 30 patents

Information Patent Application
PHOTOSENSITIVE RESIN COMPOSITION, METHOD FOR FORMING SILICA COATING...
- Publication number 20120021190
- Publication date Jan 26, 2012
- Yousuke Aoki
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
RADIATION-SENSITIVE COMPOSITION, METHOD OF FORMING SILICA-BASED COA...
- Publication number 20100102321
- Publication date Apr 29, 2010
- Hitachi Chemical Company, Ltd.
- Kouichi Abe
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY