Youxian Wen

Person

Fremont, CA, US

People

Patents Grantslast 30 patents

Information Patent Grant
Systems and methods for enhancing inspection sensitivity of an insp...
- Patent number 9,747,520
- Issue date Aug 29, 2017
- KLA-Tencor Corporation
- Shifang Li
- H04 - ELECTRIC COMMUNICATION TECHNIQUE
Information Patent Grant
System and method for semiconductor wafer inspection and metrology
- Patent number 9,658,150
- Issue date May 23, 2017
- KLA-Tencor Corporation
- Shifang Li
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
In-line wafer edge inspection, wafer pre-alignment, and wafer cleaning
- Patent number 9,645,097
- Issue date May 9, 2017
- KLA-Tencor Corporation
- Lena Nicolaides
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Evolution of library data sets
- Patent number 8,543,557
- Issue date Sep 24, 2013
- KLA-Tencor Corporation
- David M. Aikens
- G01 - MEASURING TESTING
Information Patent Grant
Determining transmittance of a photomask using optical metrology
- Patent number 7,639,375
- Issue date Dec 29, 2009
- Tokyo Electron Limited
- Sanjay Yedur
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Global shape definition method for scatterometry
- Patent number 7,613,598
- Issue date Nov 3, 2009
- KLA-Tencor Corp.
- Jon Opsal
- G01 - MEASURING TESTING
Information Patent Grant
Determining position accuracy of double exposure lithography using...
- Patent number 7,523,439
- Issue date Apr 21, 2009
- Tokyo Electron Limited
- Youxian Wen
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Evaluating a profile model to characterize a structure to be examin...
- Patent number 7,518,740
- Issue date Apr 14, 2009
- Tokyo Electron Limited
- Jeffrey A. Chard
- G01 - MEASURING TESTING
Information Patent Grant
Multiple tool and structure analysis
- Patent number 7,478,019
- Issue date Jan 13, 2009
- KLA-Tencor Corporation
- Shahin Zangooie
- G01 - MEASURING TESTING
Information Patent Grant
Global shape definition method for scatterometry
- Patent number 7,145,664
- Issue date Dec 5, 2006
- Therma-Wave, Inc.
- Jon Opsal
- G01 - MEASURING TESTING
Information Patent Grant
Feed forward critical dimension control
- Patent number 7,085,676
- Issue date Aug 1, 2006
- Tokyo Electron Limited
- Jon Opsal
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Standardized sample for characterizing the performance of a scatter...
- Patent number 6,989,896
- Issue date Jan 24, 2006
- Therma-Wave, Inc.
- Youxian Wen
- G01 - MEASURING TESTING
Information Patent Grant
Evolution of library data sets
- Patent number 6,898,596
- Issue date May 24, 2005
- Therma-Wave, Inc.
- David M. Aikens
- G01 - MEASURING TESTING
Information Patent Grant
Apparatus for optical measurements of nitrogen concentration in thi...
- Patent number 6,882,421
- Issue date Apr 19, 2005
- Therma-Wave, Inc.
- Jon Opsal
- G01 - MEASURING TESTING
Information Patent Grant
Apparatus for optical measurements of nitrogen concentration in thi...
- Patent number 6,784,993
- Issue date Aug 31, 2004
- Therma-Wave, Inc.
- Jon Opsal
- G01 - MEASURING TESTING
Information Patent Grant
Apparatus for optical measurements of nitrogen concentration in thi...
- Patent number 6,583,876
- Issue date Jun 24, 2003
- Therma-Wave, Inc.
- Jon Opsal
- G01 - MEASURING TESTING

Patents Applicationslast 30 patents

Information Patent Application
COMBINED MODELING AND MACHINE LEARNING IN OPTICAL METROLOGY
- Publication number 20240159656
- Publication date May 16, 2024
- ONTO INNOVATION INC.
- Pei Fen Teh
- G01 - MEASURING TESTING
Information Patent Application
METROLOGY SOLUTIONS FOR COMPLEX STRUCTURES OF INTEREST
- Publication number 20230417682
- Publication date Dec 28, 2023
- ONTO INNOVATION INC.
- Jingsheng SHI
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
Systems and Methods for Enhancing Inspection Sensitivity of an Insp...
- Publication number 20160275671
- Publication date Sep 22, 2016
- KLA-Tencor Corporation
- Shifang Li
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
SYSTEM AND METHOD FOR SEMICONDUCTOR WAFER INSPECTION AND METROLOGY
- Publication number 20160202177
- Publication date Jul 14, 2016
- KLA-Tencor Corporation
- Shifang LI
- G01 - MEASURING TESTING
Information Patent Application
IN-LINE WAFER EDGE INSPECTION, WAFER PRE-ALIGNMENT, AND WAFER CLEANING
- Publication number 20150370175
- Publication date Dec 24, 2015
- KLA-Tencor Corporation
- Lena Nicolaides
- G01 - MEASURING TESTING
Information Patent Application
Determining transmittance of a photomask using optical metrology
- Publication number 20080144919
- Publication date Jun 19, 2008
- TOKYO ELECTRON LIMITED
- Sanjay Yedur
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
Determining position accuracy of double exposure lithography using...
- Publication number 20080016487
- Publication date Jan 17, 2008
- TOKYO ELECTRON LIMITED
- Youxian Wen
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Evaluating a profile model to characterize a structure to be examin...
- Publication number 20080007738
- Publication date Jan 10, 2008
- TOKYO ELECTRON LIMITED
- Jeffrey A. Chard
- G01 - MEASURING TESTING
Information Patent Application
Global shape definition method for scatterometry
- Publication number 20070040852
- Publication date Feb 22, 2007
- Jon Opsal
- G01 - MEASURING TESTING
Information Patent Application
Multiple tool and structure analysis
- Publication number 20060167651
- Publication date Jul 27, 2006
- Shahin Zangooie
- G05 - CONTROLLING REGULATING
Information Patent Application
Evolution of library data sets
- Publication number 20050182592
- Publication date Aug 18, 2005
- David M. Aikens
- G01 - MEASURING TESTING
Information Patent Application
Standardized sample for characterizing the performance of a scatter...
- Publication number 20050083520
- Publication date Apr 21, 2005
- Youxian Wen
- G01 - MEASURING TESTING
Information Patent Application
Feed forward critical dimension control
- Publication number 20040267490
- Publication date Dec 30, 2004
- Jon Opsal
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Apparatus for optical measurements of nitrogen concentration in thi...
- Publication number 20040239933
- Publication date Dec 2, 2004
- Jon Opsal
- G01 - MEASURING TESTING
Information Patent Application
Global shape definition method for scatterometry
- Publication number 20040210402
- Publication date Oct 21, 2004
- Jon Opsal
- G01 - MEASURING TESTING
Information Patent Application
Apparatus for optical measurements of nitrogen concentration in thi...
- Publication number 20030206299
- Publication date Nov 6, 2003
- Jon Opsal
- G01 - MEASURING TESTING
Information Patent Application
Evolution of library data sets
- Publication number 20030076511
- Publication date Apr 24, 2003
- David M. Aikens
- G01 - MEASURING TESTING
Information Patent Application
Apparatus for optical measurements of nitrogen concentration in thi...
- Publication number 20030053053
- Publication date Mar 20, 2003
- Jon Opsal
- G01 - MEASURING TESTING

Youxian Wen

Person

Patents Grantslast 30 patents

Systems and methods for enhancing inspection sensitivity of an insp...

System and method for semiconductor wafer inspection and metrology

In-line wafer edge inspection, wafer pre-alignment, and wafer cleaning

Evolution of library data sets

Determining transmittance of a photomask using optical metrology

Global shape definition method for scatterometry

Determining position accuracy of double exposure lithography using...

Evaluating a profile model to characterize a structure to be examin...

Multiple tool and structure analysis

Global shape definition method for scatterometry

Feed forward critical dimension control

Standardized sample for characterizing the performance of a scatter...

Evolution of library data sets

Apparatus for optical measurements of nitrogen concentration in thi...

Apparatus for optical measurements of nitrogen concentration in thi...

Apparatus for optical measurements of nitrogen concentration in thi...

Patents Applicationslast 30 patents

COMBINED MODELING AND MACHINE LEARNING IN OPTICAL METROLOGY

METROLOGY SOLUTIONS FOR COMPLEX STRUCTURES OF INTEREST

Systems and Methods for Enhancing Inspection Sensitivity of an Insp...

SYSTEM AND METHOD FOR SEMICONDUCTOR WAFER INSPECTION AND METROLOGY

IN-LINE WAFER EDGE INSPECTION, WAFER PRE-ALIGNMENT, AND WAFER CLEANING

Determining transmittance of a photomask using optical metrology

Determining position accuracy of double exposure lithography using...

Evaluating a profile model to characterize a structure to be examin...

Global shape definition method for scatterometry

Multiple tool and structure analysis

Evolution of library data sets

Standardized sample for characterizing the performance of a scatter...

Feed forward critical dimension control

Apparatus for optical measurements of nitrogen concentration in thi...

Global shape definition method for scatterometry

Apparatus for optical measurements of nitrogen concentration in thi...

Evolution of library data sets

Apparatus for optical measurements of nitrogen concentration in thi...