Yu WAMURA

Person

Oshu-shi, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Output inspection method for ozone mass flow controller
- Patent number 10,793,432
- Issue date Oct 6, 2020
- Tokyo Electron Limited
- Yu Wamura
- C01 - INORGANIC CHEMISTRY
Information Patent Grant
Nozzle and substrate processing apparatus using same
- Patent number 10,472,719
- Issue date Nov 12, 2019
- Tokyo Electron Limited
- Yu Wamura
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method of detoxifying exhaust pipe and film forming apparatus
- Patent number 10,053,776
- Issue date Aug 21, 2018
- Tokyo Electron Limited
- Yu Wamura
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Substrate processing method and substrate processing apparatus
- Patent number 9,929,008
- Issue date Mar 27, 2018
- Tokyo Electron Limited
- Yu Wamura
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method of depositing film
- Patent number 9,748,104
- Issue date Aug 29, 2017
- Tokyo Electron Limited
- Hiroko Sasaki
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Film deposition apparatus
- Patent number 9,435,026
- Issue date Sep 6, 2016
- Tokyo Electron Limited
- Yu Wamura
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Semiconductor device manufacturing method and substrate treatment s...
- Patent number 9,418,837
- Issue date Aug 16, 2016
- Tokyo Electron Limited
- Koji Akiyama
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Film forming method and film forming apparatus
- Patent number 9,293,543
- Issue date Mar 22, 2016
- Tokyo Electron Limited
- Shuji Azumo
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Plasma processing apparatus and plasma processing method
- Patent number 9,165,780
- Issue date Oct 20, 2015
- Tokyo Electron Limited
- Akira Shimizu
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Processing apparatus and film forming method
- Patent number 9,103,029
- Issue date Aug 11, 2015
- Tokyo Electron Limited
- Yu Wamura
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Raw material supplying device and film forming apparatus
- Patent number 9,080,238
- Issue date Jul 14, 2015
- Tokyo Electron Limited
- Yu Wamura
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Substrate processing apparatus, substrate processing method, and co...
- Patent number 8,992,685
- Issue date Mar 31, 2015
- Tokyo Electron Limited
- Hitoshi Kato
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method of depositing a film
- Patent number 8,895,456
- Issue date Nov 25, 2014
- Tokyo Electron Limited
- Mitsuhiro Tachibana
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method of manufacturing capacitor, capacitor and method of forming...
- Patent number 8,896,097
- Issue date Nov 25, 2014
- Tokyo Electron Limited
- Yu Wamura
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

Patents Applicationslast 30 patents

Information Patent Application
SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD
- Publication number 20240401199
- Publication date Dec 5, 2024
- TOKYO ELECTRON LIMITED
- Hitoshi KATO
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
DEPOSITION METHOD AND DEPOSITION APPARATUS
- Publication number 20230230817
- Publication date Jul 20, 2023
- TOKYO ELECTRON LIMITED
- Hitoshi KATO
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
OUTPUT INSPECTION METHOD FOR OZONE MASS FLOW CONTROLLER
- Publication number 20180334385
- Publication date Nov 22, 2018
- TOKYO ELECTRON LIMITED
- Yu WAMURA
- C01 - INORGANIC CHEMISTRY
Information Patent Application
METHOD OF DETOXIFYING EXHAUST PIPE AND FILM FORMING APPARATUS
- Publication number 20160220953
- Publication date Aug 4, 2016
- TOKYO ELECTRON LIMITED
- Yu Wamura
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
NOZZLE AND SUBSTRATE PROCESSING APPARATUS USING SAME
- Publication number 20160138158
- Publication date May 19, 2016
- TOKYO ELECTRON LIMITED
- Yu WAMURA
- B05 - SPRAYING OR ATOMISING IN GENERAL APPLYING LIQUIDS OR OTHER FLUENT MATER...
Information Patent Application
SUBSTRATE PROCESSING METHOD AND SUBSTRATE PROCESSING APPARATUS
- Publication number 20160111278
- Publication date Apr 21, 2016
- TOKYO ELECTRON LIMITED
- Yu WAMURA
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHOD OF DEPOSITING FILM
- Publication number 20150031204
- Publication date Jan 29, 2015
- TOKYO ELECTRON LIMITED
- Hiroko SASAKI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Semiconductor Device Manufacturing Method and Substrate Treatment S...
- Publication number 20150017813
- Publication date Jan 15, 2015
- TOKYO ELECTRON LIMITED
- Koji AKIYAMA
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
FILM DEPOSITION APPARATUS
- Publication number 20140290578
- Publication date Oct 2, 2014
- TOKYO ELECTRON LIMITED
- Yu WAMURA
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHOD OF DEPOSITING A FILM
- Publication number 20140179122
- Publication date Jun 26, 2014
- TOKYO ELECTRON LIMITED
- Mitsuhiro Tachibana
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SUBSTRATE PROCESSING APPARATUS
- Publication number 20140126980
- Publication date May 8, 2014
- TOKYO ELECTRON LIMITED
- Yu WAMURA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
FILM FORMING METHOD AND FILM FORMING APPARATUS
- Publication number 20140094027
- Publication date Apr 3, 2014
- OSAKA UNIVERSITY
- Shuji AZUMO
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
PLASAMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD
- Publication number 20140087564
- Publication date Mar 27, 2014
- TOKYO ELECTRON LIMITED
- Akira SHIMIZU
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
GAS SUPPLY APPARATUS AND FILM FORMING APPARATUS
- Publication number 20130340678
- Publication date Dec 26, 2013
- Yu WAMURA
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
GAS SUPPLY APPARATUS AND HEAT TREATMENT APPARATUS
- Publication number 20130205611
- Publication date Aug 15, 2013
- TOKYO ELECTRON LIMITED
- Yu WAMURA
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHOD OF MANUFACTURING CAPACITOR, CAPACITOR AND METHOD OF FORMING...
- Publication number 20130200491
- Publication date Aug 8, 2013
- TOKYO ELECTRON LIMITED
- Yu WAMURA
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
RAW MATERIAL SUPPLYING DEVICE AND FILM FORMING APPARATUS
- Publication number 20120160172
- Publication date Jun 28, 2012
- TOKYO ELECTRON LIMITED
- Yu WAMURA
- B08 - CLEANING
Information Patent Application
PROCESSING APPARATUS AND FILM FORMING METHOD
- Publication number 20110312188
- Publication date Dec 22, 2011
- TOKYO ELECTRON LIMITED
- Yu WAMURA
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

Person

Patents Grantslast 30 patents

Output inspection method for ozone mass flow controller

Nozzle and substrate processing apparatus using same

Method of detoxifying exhaust pipe and film forming apparatus

Substrate processing method and substrate processing apparatus

Method of depositing film

Film deposition apparatus

Semiconductor device manufacturing method and substrate treatment s...

Film forming method and film forming apparatus

Plasma processing apparatus and plasma processing method

Processing apparatus and film forming method

Raw material supplying device and film forming apparatus

Substrate processing apparatus, substrate processing method, and co...

Method of depositing a film

Method of manufacturing capacitor, capacitor and method of forming...

Patents Applicationslast 30 patents

SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD

DEPOSITION METHOD AND DEPOSITION APPARATUS

OUTPUT INSPECTION METHOD FOR OZONE MASS FLOW CONTROLLER

METHOD OF DETOXIFYING EXHAUST PIPE AND FILM FORMING APPARATUS

NOZZLE AND SUBSTRATE PROCESSING APPARATUS USING SAME

SUBSTRATE PROCESSING METHOD AND SUBSTRATE PROCESSING APPARATUS

METHOD OF DEPOSITING FILM

Semiconductor Device Manufacturing Method and Substrate Treatment S...

FILM DEPOSITION APPARATUS

METHOD OF DEPOSITING A FILM

SUBSTRATE PROCESSING APPARATUS

FILM FORMING METHOD AND FILM FORMING APPARATUS

PLASAMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD

GAS SUPPLY APPARATUS AND FILM FORMING APPARATUS

GAS SUPPLY APPARATUS AND HEAT TREATMENT APPARATUS

METHOD OF MANUFACTURING CAPACITOR, CAPACITOR AND METHOD OF FORMING...

RAW MATERIAL SUPPLYING DEVICE AND FILM FORMING APPARATUS

PROCESSING APPARATUS AND FILM FORMING METHOD