Yuan-Chi Pai

Person

Nantou, TW

People

Patents Grantslast 30 patents

Information Patent Grant
Asymmetry compensation method used in lithography overlay process
- Patent number 9,494,873
- Issue date Nov 15, 2016
- United Microelectronics Corporation
- En-Chiuan Liou
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photo-mask and method of manufacturing semiconductor structures by...
- Patent number 9,448,471
- Issue date Sep 20, 2016
- United Microelectronics Corp.
- En-Chiuan Liou
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method of correcting overlay error
- Patent number 9,400,435
- Issue date Jul 26, 2016
- United Microelectronics Corp.
- En-Chiuan Liou
- G05 - CONTROLLING REGULATING
Information Patent Grant
Method of manufacturing semiconductor device having gate metal
- Patent number 9,305,847
- Issue date Apr 5, 2016
- United Microelectronics Corp.
- Shin-Chi Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for manufacturing semiconductor device
- Patent number 9,245,972
- Issue date Jan 26, 2016
- United Microelectronics Corp.
- Shin-Chi Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Photoresist removal method and patterning process utilizing the same
- Patent number 8,785,115
- Issue date Jul 22, 2014
- United Microelectronics Corp.
- Hung-Yi Wu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Overlay mark for multiple pre-layers and currently layer
- Patent number 8,564,143
- Issue date Oct 22, 2013
- United Microelectronics Corp.
- Yi-Ting Chen
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method of forming assist feature patterns
- Patent number 8,524,423
- Issue date Sep 3, 2013
- United Microelectronics Corp.
- Yi-Chih Chiang
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method for forming photoresist patterns
- Patent number 8,476,004
- Issue date Jul 2, 2013
- United Microelectronics Corp.
- Yong-Fa Huang
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Process for removing photoresist material
- Patent number 6,410,447
- Issue date Jun 25, 2002
- United Microelectronics Crop.
- Yuan-Chi Pai
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Focusing and color-filtering structure for semiconductor light-sens...
- Patent number 6,376,872
- Issue date Apr 23, 2002
- Yuan-Chi Pai
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Processing flow of a complementary metal-oxide semiconductor color...
- Patent number 6,261,861
- Issue date Jul 17, 2001
- United Microelectronics Corp.
- Yuan-Chi Pai
- G02 - OPTICS
Information Patent Grant
Method of manufacturing complementary metal-oxide-semiconductor pho...
- Patent number 6,251,700
- Issue date Jun 26, 2001
- United Microelectronics Corp.
- Wei-Chiang Lin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of fabricating a complementary metal-oxide semiconductor sen...
- Patent number 6,242,277
- Issue date Jun 5, 2001
- United Microelectronics Corp.
- Wei-Chang Lin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for in-situ removing photoresist material
- Patent number 6,194,324
- Issue date Feb 27, 2001
- United Microelectronics Corp.
- Lung-Yi Cheng
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of fabricating focusing and color-filtering structure for se...
- Patent number 6,133,062
- Issue date Oct 17, 2000
- United Microelectronics Corp.
- Yuan-Chi Pai
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
PHOTO-MASK AND METHOD OF MANUFACTURING SEMICONDUCTOR STRUCTURES BY...
- Publication number 20160018728
- Publication date Jan 21, 2016
- UNITED MICROELECTRONICS CORP.
- En-Chiuan Liou
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ASYMMETRY COMPENSATION METHOD USED IN LITHOGRAPHY OVERLAY PROCESS
- Publication number 20160018741
- Publication date Jan 21, 2016
- UNITED MICROELECTRONICS CORPORATION
- EN-CHIUAN LIOU
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE
- Publication number 20150380312
- Publication date Dec 31, 2015
- United Microelectronics Corp.
- Shin-Chi Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF CORRECTING OVERLAY ERROR
- Publication number 20150362905
- Publication date Dec 17, 2015
- UNITED MICROELECTRONICS CORP.
- En-Chiuan Liou
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE
- Publication number 20150064861
- Publication date Mar 5, 2015
- United Microelectronics Corp.
- Shin-Chi Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method of forming a photoresist pattern
- Publication number 20140120476
- Publication date May 1, 2014
- UNITED MICROELECTRONICS CORP.
- Tuan-Yen Yu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PHOTORESIST REMOVAL METHOD AND PATTERNING PROCESS UTILIZING THE SAME
- Publication number 20130210237
- Publication date Aug 15, 2013
- United Microelectronics Corp.
- Hung-Yi Wu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
OVERLAY MARK FOR MULTIPLE PRE-LAYERS AND CURRENTLY LAYER
- Publication number 20130200535
- Publication date Aug 8, 2013
- United Microelectronics Corp.
- Yi-Ting Chen
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD OF FORMING ASSIST FEATURE PATTERNS
- Publication number 20130017474
- Publication date Jan 17, 2013
- Yi-Chih Chiang
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD FOR FORMING PHOTORESIST PATTERNS
- Publication number 20120329280
- Publication date Dec 27, 2012
- Yong-Fa Huang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PROCESS FOR REMOVING PHOTORESIST MATERIAL
- Publication number 20010053604
- Publication date Dec 20, 2001
- YUAN-CHI PAI
- H01 - BASIC ELECTRIC ELEMENTS

Yuan-Chi Pai

Person

Patents Grantslast 30 patents

Asymmetry compensation method used in lithography overlay process

Photo-mask and method of manufacturing semiconductor structures by...

Method of correcting overlay error

Method of manufacturing semiconductor device having gate metal

Method for manufacturing semiconductor device

Photoresist removal method and patterning process utilizing the same

Overlay mark for multiple pre-layers and currently layer

Method of forming assist feature patterns

Method for forming photoresist patterns

Process for removing photoresist material

Focusing and color-filtering structure for semiconductor light-sens...

Processing flow of a complementary metal-oxide semiconductor color...

Method of manufacturing complementary metal-oxide-semiconductor pho...

Method of fabricating a complementary metal-oxide semiconductor sen...

Method for in-situ removing photoresist material

Method of fabricating focusing and color-filtering structure for se...

Patents Applicationslast 30 patents

PHOTO-MASK AND METHOD OF MANUFACTURING SEMICONDUCTOR STRUCTURES BY...

ASYMMETRY COMPENSATION METHOD USED IN LITHOGRAPHY OVERLAY PROCESS

METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE

METHOD OF CORRECTING OVERLAY ERROR

METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE

Method of forming a photoresist pattern

PHOTORESIST REMOVAL METHOD AND PATTERNING PROCESS UTILIZING THE SAME

OVERLAY MARK FOR MULTIPLE PRE-LAYERS AND CURRENTLY LAYER

METHOD OF FORMING ASSIST FEATURE PATTERNS

METHOD FOR FORMING PHOTORESIST PATTERNS

PROCESS FOR REMOVING PHOTORESIST MATERIAL