Yuan Ko Hwang

Person

Hualien Hsien, TW

People

Patents Grantslast 30 patents

Information Patent Grant
Metal-insensitive epitaxy formation
- Patent number 11,935,951
- Issue date Mar 19, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd
- Chun Hsiung Tsai
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Metal-insensitive epitaxy formation
- Patent number 11,495,685
- Issue date Nov 8, 2022
- Taiwan Semiconductor Manufacturing Company, Ltd
- Chun Hsiung Tsai
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Metal-insensitive epitaxy formation
- Patent number 10,804,395
- Issue date Oct 13, 2020
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Chun Hsiung Tsai
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Metal-insensitive epitaxy formation
- Patent number 10,263,108
- Issue date Apr 16, 2019
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Chun Hsiung Tsai
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Under bump metallization
- Patent number 9,373,594
- Issue date Jun 21, 2016
- Taiwan Semiconductor Manufacturing Co., Ltd
- Chih-Fei Lee
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor device with robust polysilicon fuse
- Patent number 7,576,374
- Issue date Aug 18, 2009
- Taiwan Semiconductor Manufacturing Company
- Yuan-Pang Lee
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method to avoid amorphous-si damage during wet stripping processes...
- Patent number 7,384,799
- Issue date Jun 10, 2008
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Fei-Yun Chen
- B81 - MICRO-STRUCTURAL TECHNOLOGY
Information Patent Grant
Effective photoresist stripping process for high dosage and high en...
- Patent number 7,144,673
- Issue date Dec 5, 2006
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Fei-Yun Chen
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method of fabricating a poly fuse
- Patent number 7,083,897
- Issue date Aug 1, 2006
- Taiwan Semiconductor Manufacturing Company
- Yuan-Pang Lee
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of forming tiny silicon nitride spacer for flash EPROM by fu...
- Patent number 6,908,813
- Issue date Jun 21, 2005
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Hung-Hsin Liu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and apparatus for in-situ descum/hot bake/dry etch photoresi...
- Patent number 6,723,654
- Issue date Apr 20, 2004
- Taiwan Semiconductor Manufacturing Co., Ltd
- Kuei-Jen Chang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of forming tiny silicon nitride spacer for flash EPROM by us...
- Patent number 6,706,601
- Issue date Mar 16, 2004
- Taiwan Semiconductor Manufacturing Company
- Hung-Hsin Liu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of making capacitors
- Patent number 6,617,221
- Issue date Sep 9, 2003
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Hao-Chih Yuan
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of etching a polysilicon layer during the stripping of the p...
- Patent number 6,489,227
- Issue date Dec 3, 2002
- Taiwan Semiconductor Manufacturing Company
- Tsung-Chi Hsieh
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Removal of particulate contamination in loadlocks
- Patent number 6,256,825
- Issue date Jul 10, 2001
- Taiwan Semiconductor Manufacturing Company
- Yuan-Ko Hwang
- B08 - CLEANING
Information Patent Grant
Method for transporting and electrostatically chucking a semiconduc...
- Patent number 6,238,160
- Issue date May 29, 2001
- Taiwan Semiconductor Manufacturing Company, Ltd
- Yuan-Ko Hwang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method to prevent auto-doping induced threshold voltage shift
- Patent number 6,232,172
- Issue date May 15, 2001
- Taiwan Semiconductor Manufacturing Company
- Sen-Fu Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
System for transporting and electrostatically chucking a semiconduc...
- Patent number 6,185,085
- Issue date Feb 6, 2001
- Taiwan Semiconductor Manufacturing Co., Ltd
- Yuan-Ko Hwang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and system for on-line monitoring plasma chamber condition b...
- Patent number 6,157,867
- Issue date Dec 5, 2000
- Taiwan Semiconductor Manufacturing Company
- Yuan-Ko Hwang
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Real time monitoring of plasma etching process
- Patent number 6,117,348
- Issue date Sep 12, 2000
- Taiwan Semiconductor Manufacturing Company, Ltd
- Yung-Sung Peng
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Apparatus for controlling etch rate when using consumable electrode...
- Patent number 6,030,489
- Issue date Feb 29, 2000
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Yuan-Ko Hwang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Spin-on-glass etchback uniformity improvement using hot backside he...
- Patent number 6,024,828
- Issue date Feb 15, 2000
- Taiwan Semiconductor Manufacturing Company
- Yuan Ko Hwang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and apparatus for monitoring plasma chamber condition by obs...
- Patent number 6,024,831
- Issue date Feb 15, 2000
- Vanguard International Semiconductor Corporation
- Yuan-Ko Hwang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for controlling etch rate when using consumable electrodes d...
- Patent number 5,955,383
- Issue date Sep 21, 1999
- Taiwan Semiconductor Manufacturing Company Ltd.
- Yuan-Ko Hwang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Removal of particulate contamination in loadlocks
- Patent number 5,858,108
- Issue date Jan 12, 1999
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Yuan-ko Hwang
- B08 - CLEANING
Information Patent Grant
Method of spin-on-glass etchback using hot backside helium
- Patent number 5,753,566
- Issue date May 19, 1998
- Taiwan Semiconductor Manufactured Company, Ltd.
- Yuan Ko Hwang
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
Metal-Insensitive Epitaxy Formation
- Publication number 20230063033
- Publication date Mar 2, 2023
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Chun Hsiung Tsai
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Metal-Insensitive Epitaxy Formation
- Publication number 20210043770
- Publication date Feb 11, 2021
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Chun Hsiung Tsai
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METAL-INSENSITIVE EPITAXY FORMATION
- Publication number 20190245087
- Publication date Aug 8, 2019
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Chun Hsiung Tsai
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Under Bump Metallization
- Publication number 20160268221
- Publication date Sep 15, 2016
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Chih-Fei Lee
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Metal-Insensitive Epitaxy Formation
- Publication number 20160056290
- Publication date Feb 25, 2016
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Chun Hsiung Tsai
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Under Bump Metallization
- Publication number 20150228593
- Publication date Aug 13, 2015
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Chih-Fei Lee
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR DEVICE WITH ROBUST POLYSILICON FUSE
- Publication number 20060240363
- Publication date Oct 26, 2006
- Yuan-Pang Lee
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method to avoid alpha-Si damage during wet stripping processes in t...
- Publication number 20060166509
- Publication date Jul 27, 2006
- Fei-Yun Chen
- B81 - MICRO-STRUCTURAL TECHNOLOGY
Information Patent Application
EFFECTIVE PHOTORESIST STRIPPING PROCESS FOR HIGH DOSAGE AND HIGH EN...
- Publication number 20060088784
- Publication date Apr 27, 2006
- Fei-Yun Chen
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Method of fabricating a poly fuse
- Publication number 20040229168
- Publication date Nov 18, 2004
- Taiwan Semiconductor Manufacturing Co.
- Yuan-Pang Lee
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method of forming tiny silicon nitride spacer for flash EPROM by fu...
- Publication number 20040203205
- Publication date Oct 14, 2004
- Taiwan Semicondutor Manufacturing Co.
- Hung-Hsin Liu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method and apparatus for in-situ descum/hot bake/dry etch photoresi...
- Publication number 20020139775
- Publication date Oct 3, 2002
- Taiwan Semiconductor Manufacturing Co. Ltd.
- Kuei-Jen Chang
- H01 - BASIC ELECTRIC ELEMENTS

Yuan Ko Hwang

Person

Patents Grantslast 30 patents

Metal-insensitive epitaxy formation

Metal-insensitive epitaxy formation

Metal-insensitive epitaxy formation

Metal-insensitive epitaxy formation

Under bump metallization

Semiconductor device with robust polysilicon fuse

Method to avoid amorphous-si damage during wet stripping processes...

Effective photoresist stripping process for high dosage and high en...

Method of fabricating a poly fuse

Method of forming tiny silicon nitride spacer for flash EPROM by fu...

Method and apparatus for in-situ descum/hot bake/dry etch photoresi...

Method of forming tiny silicon nitride spacer for flash EPROM by us...

Method of making capacitors

Method of etching a polysilicon layer during the stripping of the p...

Removal of particulate contamination in loadlocks

Method for transporting and electrostatically chucking a semiconduc...

Method to prevent auto-doping induced threshold voltage shift

System for transporting and electrostatically chucking a semiconduc...

Method and system for on-line monitoring plasma chamber condition b...

Real time monitoring of plasma etching process

Apparatus for controlling etch rate when using consumable electrode...

Spin-on-glass etchback uniformity improvement using hot backside he...

Method and apparatus for monitoring plasma chamber condition by obs...

Method for controlling etch rate when using consumable electrodes d...

Removal of particulate contamination in loadlocks

Method of spin-on-glass etchback using hot backside helium

Patents Applicationslast 30 patents

Metal-Insensitive Epitaxy Formation

Metal-Insensitive Epitaxy Formation

METAL-INSENSITIVE EPITAXY FORMATION

Under Bump Metallization

Metal-Insensitive Epitaxy Formation

Under Bump Metallization

SEMICONDUCTOR DEVICE WITH ROBUST POLYSILICON FUSE

Method to avoid alpha-Si damage during wet stripping processes in t...

EFFECTIVE PHOTORESIST STRIPPING PROCESS FOR HIGH DOSAGE AND HIGH EN...

Method of fabricating a poly fuse

Method of forming tiny silicon nitride spacer for flash EPROM by fu...

Method and apparatus for in-situ descum/hot bake/dry etch photoresi...