Yue MA

Person

Escondido, CA, US

People

Patents Grantslast 30 patents

Information Patent Grant
Apparatus for and method of reducing contamination from source mate...
- Patent number 11,874,608
- Issue date Jan 16, 2024
- ASML Netherlands B.V.
- Yue Ma
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Prolonging optical element lifetime in an EUV lithography system
- Patent number 11,846,887
- Issue date Dec 19, 2023
- ASML Netherlands B.V.
- Yue Ma
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Guiding device and associated system
- Patent number 11,822,252
- Issue date Nov 21, 2023
- ASML Netherlands B.V.
- Dzmitry Labetski
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Collector flow ring
- Patent number 11,740,565
- Issue date Aug 29, 2023
- ASML Netherlands B.V.
- Taylor John Hartung
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Cleaning a structure surface in an EUV chamber
- Patent number 11,347,154
- Issue date May 31, 2022
- ASML Netherlands B.V.
- Chunguang Xia
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Prolonging optical element lifetime in an EUV lithography system
- Patent number 11,340,532
- Issue date May 24, 2022
- ASML Netherlands B.V.
- Yue Ma
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Guiding device and associated system
- Patent number 10,955,749
- Issue date Mar 23, 2021
- ASML Netherlands B.V.
- Dzmitry Labetski
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Patents Applicationslast 30 patents

Information Patent Application
PROLONGING OPTICAL ELEMENT LIFETIME IN AN EUV LITHOGRAPHY SYSTEM
- Publication number 20240160109
- Publication date May 16, 2024
- ASML NETHERLANDS B.V.
- Yue Ma
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
APPARATUS FOR AND METHOD OF REDUCING CONTAMINATION FROM SOURCE MATE...
- Publication number 20240103387
- Publication date Mar 28, 2024
- ASML NETHERLANDS B.V.
- Yue Ma
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
GUIDING DEVICE AND ASSOCIATED SYSTEM
- Publication number 20240085796
- Publication date Mar 14, 2024
- ASML NETHERLANDS B.V.
- Dzmitry LABETSKI
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Application
RADIATION SOURCE MODULE AND LITHOGRAPHIC APPARATUS
- Publication number 20230367224
- Publication date Nov 16, 2023
- ASML NETHERLANDS B.V.
- Hrishikesh PATEL
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Application
COLLECTOR FLOW RING
- Publication number 20230010251
- Publication date Jan 12, 2023
- ASML NETHERLANDS B.V.
- Taylor John Hartung
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PROLONGING OPTICAL ELEMENT LIFETIME IN AN EUV LITHOGRAPHY SYSTEM
- Publication number 20220291591
- Publication date Sep 15, 2022
- ASML NETHERLANDS B.V.
- Yue Ma
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
OXYGEN-LOSS RESISTANT TOP COATING FOR OPTICAL ELEMENTS
- Publication number 20220260756
- Publication date Aug 18, 2022
- ASML NETHERLANDS B.V.
- Yue Ma
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
CLEANING A STRUCTURE SURFACE IN AN EUV CHAMBER
- Publication number 20220179328
- Publication date Jun 9, 2022
- ASML NETHERLANDS B.V.
- Chunguang Xia
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
APPARATUS FOR AND METHOD OF REDUCING CONTAMINATION FROM SOURCE MATE...
- Publication number 20210325791
- Publication date Oct 21, 2021
- ASML NETHERLANDS B.V.
- Yue Ma
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Application
GUIDING DEVICE AND ASSOCIATED SYSTEM
- Publication number 20210141311
- Publication date May 13, 2021
- ASML NETHERLANDS B.V.
- Dzmitry LABETSKI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PROLONGING OPTICAL ELEMENT LIFETIME IN AN EUV LITHOGRAPHY SYSTEM
- Publication number 20210109452
- Publication date Apr 15, 2021
- ASML NETHERLANDS B.V.
- Yue Ma
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
CLEANING A STRUCTURE SURFACE IN AN EUV CHAMBER
- Publication number 20210063899
- Publication date Mar 4, 2021
- Chunguang Xia
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Radiation Source Module and Lithographic Apparatus
- Publication number 20200124976
- Publication date Apr 23, 2020
- ASML NETHERLANDS B.V.
- Hrishikesh PATEL
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Application
GUIDING DEVICE AND ASSOCIATED SYSTEM
- Publication number 20200089124
- Publication date Mar 19, 2020
- ASML NETHERLANDS B.V.
- Dzmitry LABETSKI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Person

Patents Grantslast 30 patents

Apparatus for and method of reducing contamination from source mate...

Prolonging optical element lifetime in an EUV lithography system

Guiding device and associated system

Collector flow ring

Cleaning a structure surface in an EUV chamber

Prolonging optical element lifetime in an EUV lithography system

Guiding device and associated system

Patents Applicationslast 30 patents

PROLONGING OPTICAL ELEMENT LIFETIME IN AN EUV LITHOGRAPHY SYSTEM

APPARATUS FOR AND METHOD OF REDUCING CONTAMINATION FROM SOURCE MATE...

GUIDING DEVICE AND ASSOCIATED SYSTEM

RADIATION SOURCE MODULE AND LITHOGRAPHIC APPARATUS

COLLECTOR FLOW RING

PROLONGING OPTICAL ELEMENT LIFETIME IN AN EUV LITHOGRAPHY SYSTEM

OXYGEN-LOSS RESISTANT TOP COATING FOR OPTICAL ELEMENTS

CLEANING A STRUCTURE SURFACE IN AN EUV CHAMBER

APPARATUS FOR AND METHOD OF REDUCING CONTAMINATION FROM SOURCE MATE...

GUIDING DEVICE AND ASSOCIATED SYSTEM

PROLONGING OPTICAL ELEMENT LIFETIME IN AN EUV LITHOGRAPHY SYSTEM

CLEANING A STRUCTURE SURFACE IN AN EUV CHAMBER

Radiation Source Module and Lithographic Apparatus

GUIDING DEVICE AND ASSOCIATED SYSTEM