Yueh-Ching Pai

Person

Taichung City, TW

People

Patents Grantslast 30 patents

Information Patent Grant
Formation and in-situ etching processes for metal layers
- Patent number 12,170,202
- Issue date Dec 17, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd
- Po-Yu Lin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of manufacturing a semiconductor device and a semiconductor...
- Patent number 12,170,325
- Issue date Dec 17, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd
- Cheng-Wei Chang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Gate structure and semiconductor device having the same
- Patent number 12,166,126
- Issue date Dec 10, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd
- Chun-Chieh Wang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods for forming contact plugs with reduced corrosion
- Patent number 12,068,197
- Issue date Aug 20, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd
- Yu-Sheng Wang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor structure with source/drain multi-layer structure and...
- Patent number 11,990,550
- Issue date May 21, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd
- Chun-Chieh Wang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of manufacturing a semiconductor device and a semiconductor...
- Patent number 11,973,124
- Issue date Apr 30, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd
- Cheng-Wei Chang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of manufacturing a semiconductor device and a semiconductor...
- Patent number 11,742,404
- Issue date Aug 29, 2023
- Taiwan Semiconductor Manufacturing Co., Ltd
- Chun Chieh Wang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Silicon intermixing layer for blocking diffusion
- Patent number 11,587,791
- Issue date Feb 21, 2023
- Taiwan Semiconductor Manufacturing Company, Ltd
- Chun-Chieh Wang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Formation and in-situ etching processes for metal layers
- Patent number 11,545,363
- Issue date Jan 3, 2023
- Taiwan Semiconductor Manufacturing Co., Ltd
- Po-Yu Lin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor structure with source/drain multi-layer structure and...
- Patent number 11,527,655
- Issue date Dec 13, 2022
- Taiwan Semiconductor Manufacturing Company, Ltd
- Chun-Chieh Wang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Gate structure, method of forming the same, and semiconductor devic...
- Patent number 11,411,112
- Issue date Aug 9, 2022
- Taiwan Semiconductor Manufacturing Company, Ltd
- Chun-Chieh Wang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor device and manufacturing method thereof
- Patent number 11,410,889
- Issue date Aug 9, 2022
- Taiwan Semiconductor Manufacturing Co., Ltd
- Chun-Chieh Wang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor device and method
- Patent number 11,398,482
- Issue date Jul 26, 2022
- Taiwan Semiconductor Manufacturing Company, Ltd
- Chun-Chieh Wang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods for forming contact plugs with reduced corrosion
- Patent number 10,985,061
- Issue date Apr 20, 2021
- Taiwan Semiconductor Manufacturing Company, Ltd
- Yu-Sheng Wang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
High-k metal gate process and device
- Patent number 10,971,602
- Issue date Apr 6, 2021
- Taiwan Semiconductor Manufacturing Co., Ltd
- Chien-Shun Liao
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Contact metallization process
- Patent number 10,964,590
- Issue date Mar 30, 2021
- Taiwan Semiconductor Manufacturing Co., Ltd
- Tien-Pei Chou
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor structure with source/drain multi-layer structure and...
- Patent number 10,937,910
- Issue date Mar 2, 2021
- Taiwan Semiconductor Manufacturing Co., Ltd
- Chun-Chieh Wang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Formation and in-situ etching processes for metal layers
- Patent number 10,872,769
- Issue date Dec 22, 2020
- Taiwan Semiconductor Manufacturing Co., Ltd
- Po-Yu Lin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Material delivery system and method
- Patent number 10,752,995
- Issue date Aug 25, 2020
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Ke-Chih Liu
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Semiconductor device and method
- Patent number 10,679,995
- Issue date Jun 9, 2020
- Taiwan Semiconductor Manufacturing Company, Ltd
- Chun-Chieh Wang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
High-K metal gate process and device
- Patent number 10,629,700
- Issue date Apr 21, 2020
- Taiwan Semiconductor Manufacturing Co., Ltd
- Chien-Shun Liao
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Formation and in-situ etching processes for metal layers
- Patent number 10,535,523
- Issue date Jan 14, 2020
- Taiwan Semiconductor Manufacturing Co., Ltd
- Po-Yu Lin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods for forming contact plugs with reduced corrosion
- Patent number 10,483,165
- Issue date Nov 19, 2019
- Taiwan Semiconductor Manufacturing Company, Ltd
- Yu-Sheng Wang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor structure with source/drain multi-layer structure and...
- Patent number 10,468,530
- Issue date Nov 5, 2019
- Taiwan Semiconductor Manufacturing Co., Ltd
- Chun-Chieh Wang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor device with TiN adhesion layer for forming a contact...
- Patent number 10,332,789
- Issue date Jun 25, 2019
- Taiwan Semiconductor Manufacturing Co., Ltd
- Tien-Pei Chou
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Methods for forming contact plugs with reduced corrosion
- Patent number 10,186,456
- Issue date Jan 22, 2019
- Taiwan Semiconductor Manufacturing Company, Ltd
- Yu-Sheng Wang
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
CONTACT METALLIZATION PROCESS
- Publication number 20240395611
- Publication date Nov 28, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Tien-Pei CHOU
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR DEVICE AND METHOD
- Publication number 20240387747
- Publication date Nov 21, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Chunchieh Wang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
FORMATION AND IN-SITU ETCHING PROCESSES FOR METAL LAYERS
- Publication number 20240363350
- Publication date Oct 31, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Po-Yu LIN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHODS FOR FORMING CONTACT PLUGS WITH REDUCED CORROSION
- Publication number 20240363409
- Publication date Oct 31, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Yu-Sheng Wang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR STRUCTURE WITH SOURCE/DRAIN MULTI-LAYER STRUCTURE AND...
- Publication number 20240266439
- Publication date Aug 8, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Chun-Chieh WANG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR DEVICES AND METHODS OF FABRICATION THEREOF
- Publication number 20240105787
- Publication date Mar 28, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Cheng-Wei CHANG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Isolation Structures in Semiconductor Devices
- Publication number 20240055476
- Publication date Feb 15, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Cheng-Wei CHANG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR DEVICE WITH BACKSIDE POWER RAIL AND METHODS OF FABRIC...
- Publication number 20240030136
- Publication date Jan 25, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Cheng-Wei CHANG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR DEVICE STRUCTURE AND METHODS OF FORMING THE SAME
- Publication number 20240030318
- Publication date Jan 25, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Cheng-Wei CHANG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Void-Free Conductive Contact Formation
- Publication number 20240021687
- Publication date Jan 18, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Cheng-Wei Chang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR DEVICE AND METHODS OF FORMATION
- Publication number 20230411453
- Publication date Dec 21, 2023
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Cheng-Wei Chang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Epitaxial Structures In Semiconductor Devices
- Publication number 20230402508
- Publication date Dec 14, 2023
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Cheng-Wei CHANG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR DEVICE AND METHOD
- Publication number 20230387328
- Publication date Nov 30, 2023
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Chunchieh Wang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF MANUFACTURING A SEMICONDUCTOR DEVICE AND A SEMICONDUCTOR...
- Publication number 20230378316
- Publication date Nov 23, 2023
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Cheng-Wei CHANG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR DEVICE AND METHODS OF FORMATION
- Publication number 20230369395
- Publication date Nov 16, 2023
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Cheng-Wei CHANG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR DEVICE HAVING IMPROVED GATE STACKS AND METHODS OF FAB...
- Publication number 20230352546
- Publication date Nov 2, 2023
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Cheng-Wei Chang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF MANUFACTURING A SEMICONDUCTOR DEVICE AND A SEMICONDUCTOR...
- Publication number 20230352550
- Publication date Nov 2, 2023
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Chun Chieh WANG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR DEVICE AND METHODS OF FORMATION
- Publication number 20230352564
- Publication date Nov 2, 2023
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Cheng-Wei CHANG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
FORMATION AND IN-SITU ETCHING PROCESSES FOR METAL LAYERS
- Publication number 20230141521
- Publication date May 11, 2023
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Po-Yu LIN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF MANUFACTURING A SEMICONDUCTOR DEVICE AND A SEMICONDUCTOR...
- Publication number 20230138401
- Publication date May 4, 2023
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Cheng-Wei CHANG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Silicon Intermixing Layer for Blocking Diffusion
- Publication number 20230116357
- Publication date Apr 13, 2023
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Chun-Chieh Wang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR STRUCTURE WITH SOURCE/DRAIN MULTI-LAYER STRUCTURE AND...
- Publication number 20230109135
- Publication date Apr 6, 2023
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Chun-Chieh WANG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR DEVICE AND MANUFACTURING METHOD THEREOF
- Publication number 20220352035
- Publication date Nov 3, 2022
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Chun Chieh WANG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
GATE STRUCTURE AND SEMICONDUCTOR DEVICE HAVING THE SAME
- Publication number 20220336653
- Publication date Oct 20, 2022
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Chun-Chieh Wang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Semiconductor Device and Method
- Publication number 20220302116
- Publication date Sep 22, 2022
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Chun-Chieh Wang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR DEVICE AND METHOD
- Publication number 20220278197
- Publication date Sep 1, 2022
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Chunchieh Wang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF MANUFACTURING A SEMICONDUCTOR DEVICE AND A SEMICONDUCTOR...
- Publication number 20210343851
- Publication date Nov 4, 2021
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Chun Chieh WANG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Contact Metallization Process
- Publication number 20210280462
- Publication date Sep 9, 2021
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Tien-Pei CHOU
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Methods for Forming Contact Plugs with Reduced Corrosion
- Publication number 20210257254
- Publication date Aug 19, 2021
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Yu-Sheng Wang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR DEVICE AND MANUFACTURING METHOD THEREOF
- Publication number 20210202327
- Publication date Jul 1, 2021
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Chun-Chieh WANG
- H01 - BASIC ELECTRIC ELEMENTS

Yueh-Ching Pai

Person

Patents Grantslast 30 patents

Formation and in-situ etching processes for metal layers

Method of manufacturing a semiconductor device and a semiconductor...

Gate structure and semiconductor device having the same

Methods for forming contact plugs with reduced corrosion

Semiconductor structure with source/drain multi-layer structure and...

Method of manufacturing a semiconductor device and a semiconductor...

Method of manufacturing a semiconductor device and a semiconductor...

Silicon intermixing layer for blocking diffusion

Formation and in-situ etching processes for metal layers

Semiconductor structure with source/drain multi-layer structure and...

Gate structure, method of forming the same, and semiconductor devic...

Semiconductor device and manufacturing method thereof

Semiconductor device and method

Methods for forming contact plugs with reduced corrosion

High-k metal gate process and device

Contact metallization process

Semiconductor structure with source/drain multi-layer structure and...

Formation and in-situ etching processes for metal layers

Material delivery system and method

Semiconductor device and method

High-K metal gate process and device

Formation and in-situ etching processes for metal layers

Methods for forming contact plugs with reduced corrosion

Semiconductor structure with source/drain multi-layer structure and...

Semiconductor device with TiN adhesion layer for forming a contact...

Methods for forming contact plugs with reduced corrosion

Patents Applicationslast 30 patents

CONTACT METALLIZATION PROCESS

SEMICONDUCTOR DEVICE AND METHOD

FORMATION AND IN-SITU ETCHING PROCESSES FOR METAL LAYERS

METHODS FOR FORMING CONTACT PLUGS WITH REDUCED CORROSION

SEMICONDUCTOR STRUCTURE WITH SOURCE/DRAIN MULTI-LAYER STRUCTURE AND...

SEMICONDUCTOR DEVICES AND METHODS OF FABRICATION THEREOF

Isolation Structures in Semiconductor Devices

SEMICONDUCTOR DEVICE WITH BACKSIDE POWER RAIL AND METHODS OF FABRIC...

SEMICONDUCTOR DEVICE STRUCTURE AND METHODS OF FORMING THE SAME

Void-Free Conductive Contact Formation

SEMICONDUCTOR DEVICE AND METHODS OF FORMATION

Epitaxial Structures In Semiconductor Devices

SEMICONDUCTOR DEVICE AND METHOD

METHOD OF MANUFACTURING A SEMICONDUCTOR DEVICE AND A SEMICONDUCTOR...

SEMICONDUCTOR DEVICE AND METHODS OF FORMATION

SEMICONDUCTOR DEVICE HAVING IMPROVED GATE STACKS AND METHODS OF FAB...

METHOD OF MANUFACTURING A SEMICONDUCTOR DEVICE AND A SEMICONDUCTOR...

SEMICONDUCTOR DEVICE AND METHODS OF FORMATION

FORMATION AND IN-SITU ETCHING PROCESSES FOR METAL LAYERS

METHOD OF MANUFACTURING A SEMICONDUCTOR DEVICE AND A SEMICONDUCTOR...

Silicon Intermixing Layer for Blocking Diffusion

SEMICONDUCTOR STRUCTURE WITH SOURCE/DRAIN MULTI-LAYER STRUCTURE AND...

SEMICONDUCTOR DEVICE AND MANUFACTURING METHOD THEREOF

GATE STRUCTURE AND SEMICONDUCTOR DEVICE HAVING THE SAME

Semiconductor Device and Method

SEMICONDUCTOR DEVICE AND METHOD

METHOD OF MANUFACTURING A SEMICONDUCTOR DEVICE AND A SEMICONDUCTOR...

Contact Metallization Process

Methods for Forming Contact Plugs with Reduced Corrosion

SEMICONDUCTOR DEVICE AND MANUFACTURING METHOD THEREOF