Yuehong Fu

Person

Fremont, CA, US

People

Patents Grantslast 30 patents

Information Patent Grant
Substrate support with improved process uniformity
- Patent number 11,984,296
- Issue date May 14, 2024
- Lam Research Corporation
- Fangli Hao
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate support with improved process uniformity
- Patent number 10,910,195
- Issue date Feb 2, 2021
- Lam Research Corporation
- Fangli Hao
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Helium plug design to reduce arcing
- Patent number 10,741,425
- Issue date Aug 11, 2020
- Lam Research Corporation
- Fangli Hao
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Pin lifter assembly with small gap
- Patent number 10,262,887
- Issue date Apr 16, 2019
- Lam Research Corporation
- Fangli Hao
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma confinement apparatus, and method for confining a plasma
- Patent number 8,608,851
- Issue date Dec 17, 2013
- Advanced Micro-Fabrication Equipment, Inc. Asia
- Tom Ni
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

Patents Applicationslast 30 patents

Information Patent Application
SUBSTRATE SUPPORT WITH IMPROVED PROCESS UNIFORMITY
- Publication number 20240282551
- Publication date Aug 22, 2024
- LAM RESEARCH CORPORATION
- Fangli Hao
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE SUPPORT WITH IMPROVED PROCESS UNIFORMITY
- Publication number 20210166914
- Publication date Jun 3, 2021
- LAM RESEARCH CORPORATION
- Fangli Hao
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
HELIUM PLUG DESIGN TO REDUCE ARCING
- Publication number 20180240688
- Publication date Aug 23, 2018
- Fangli Hao
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE SUPPORT WITH IMPROVED PROCESS UNIFORMITY
- Publication number 20180190526
- Publication date Jul 5, 2018
- LAM RESEARCH CORPORATION
- Fangli Hao
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PIN LIFTER ASSEMBLY WITH SMALL GAP
- Publication number 20180114716
- Publication date Apr 26, 2018
- LAM RESEARCH CORPORATION
- Fangli Hao
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA CONFINEMENT APPARATUS, AND METHOD FOR CONFINING A PLASMA
- Publication number 20140103805
- Publication date Apr 17, 2014
- ADVANCED MICRO-FABRICATION EQUIPMENT, INC. ASIA
- Tom Ni
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Yttria insulator ring for use inside a plasma chamber
- Publication number 20090090695
- Publication date Apr 9, 2009
- LAM RESEARCH CORPORATION
- Babak Kadkhodayan
- C04 - CEMENTS CONCRETE ARTIFICIAL STONE CERAMICS REFRACTORIES
Information Patent Application
Plasma confinement apparatus, and method for confining a plasma
- Publication number 20070085483
- Publication date Apr 19, 2007
- Advanced Micro-Fabrication Equipment, Inc. Asia
- Tom Ni
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Yttria insulator ring for use inside a plasma chamber
- Publication number 20060043067
- Publication date Mar 2, 2006
- Lam Research Corporation
- Babak Kadkhodayan
- C04 - CEMENTS CONCRETE ARTIFICIAL STONE CERAMICS REFRACTORIES

Person

Patents Grantslast 30 patents

Substrate support with improved process uniformity

Substrate support with improved process uniformity

Helium plug design to reduce arcing

Pin lifter assembly with small gap

Plasma confinement apparatus, and method for confining a plasma

Patents Applicationslast 30 patents

SUBSTRATE SUPPORT WITH IMPROVED PROCESS UNIFORMITY

SUBSTRATE SUPPORT WITH IMPROVED PROCESS UNIFORMITY

HELIUM PLUG DESIGN TO REDUCE ARCING

SUBSTRATE SUPPORT WITH IMPROVED PROCESS UNIFORMITY

PIN LIFTER ASSEMBLY WITH SMALL GAP

PLASMA CONFINEMENT APPARATUS, AND METHOD FOR CONFINING A PLASMA

Yttria insulator ring for use inside a plasma chamber

Plasma confinement apparatus, and method for confining a plasma

Yttria insulator ring for use inside a plasma chamber