TREA

Yugang GUO

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  • Tokyo, JP
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Patents Grantslast 30 patents

  • Information Patent Grant

    Electrochemical deposition method
    • Patent number 9,624,596
    • Issue date Apr 18, 2017
    • Ebara Corporation
    • Junichiro Yoshioka
    • C25 - ELECTROLYTIC OR ELECTROPHORETIC PROCESSES APPARATUS THEREFOR
  • Information Patent Grant

    Electrochemical deposition method
    • Patent number 9,593,430
    • Issue date Mar 14, 2017
    • Ebara Corporation
    • Junichiro Yoshioka
    • C25 - ELECTROLYTIC OR ELECTROPHORETIC PROCESSES APPARATUS THEREFOR
  • Information Patent Grant

    Electrochemical deposition method
    • Patent number 9,506,162
    • Issue date Nov 29, 2016
    • Ebara Corporation
    • Junichiro Yoshioka
    • C25 - ELECTROLYTIC OR ELECTROPHORETIC PROCESSES APPARATUS THEREFOR
  • Information Patent Grant

    Electrochemical deposition method
    • Patent number 9,388,505
    • Issue date Jul 12, 2016
    • Ebara Corporation
    • Junichiro Yoshioka
    • C25 - ELECTROLYTIC OR ELECTROPHORETIC PROCESSES APPARATUS THEREFOR
  • Information Patent Grant

    Electrochemical deposition apparatus
    • Patent number 8,936,705
    • Issue date Jan 20, 2015
    • Ebara Corporation
    • Junichiro Yoshioka
    • C25 - ELECTROLYTIC OR ELECTROPHORETIC PROCESSES APPARATUS THEREFOR
  • Information Patent Grant

    Substrate holder and plating apparatus
    • Patent number 8,337,680
    • Issue date Dec 25, 2012
    • Ebara Corporation
    • Junichiro Yoshioka
    • C25 - ELECTROLYTIC OR ELECTROPHORETIC PROCESSES APPARATUS THEREFOR
  • Information Patent Grant

    Plating method and apparatus
    • Patent number 8,317,993
    • Issue date Nov 27, 2012
    • Ebara Corporation
    • Fumio Kuriyama
    • B05 - SPRAYING OR ATOMISING IN GENERAL APPLYING LIQUIDS OR OTHER FLUENT MATER...
  • Information Patent Grant

    Substrate holder, plating apparatus, and plating method
    • Patent number 8,133,376
    • Issue date Mar 13, 2012
    • Ebara Corporation
    • Junichiro Yoshioka
    • C25 - ELECTROLYTIC OR ELECTROPHORETIC PROCESSES APPARATUS THEREFOR
  • Information Patent Grant

    Substrate holder and plating apparatus
    • Patent number 7,901,551
    • Issue date Mar 8, 2011
    • Ebara Corporation
    • Junichiro Yoshioka
    • C25 - ELECTROLYTIC OR ELECTROPHORETIC PROCESSES APPARATUS THEREFOR
  • Information Patent Grant

    Substrate holder, plating apparatus, and plating method
    • Patent number 7,807,027
    • Issue date Oct 5, 2010
    • Ebara Corporation
    • Junichiro Yoshioka
    • C25 - ELECTROLYTIC OR ELECTROPHORETIC PROCESSES APPARATUS THEREFOR
  • Information Patent Grant

    Substrate holder and plating apparatus
    • Patent number 7,601,248
    • Issue date Oct 13, 2009
    • Ebara Corporation
    • Junichiro Yoshioka
    • H01 - BASIC ELECTRIC ELEMENTS
  • Information Patent Grant

    Substrate holder, plating apparatus, and plating method
    • Patent number 6,844,274
    • Issue date Jan 18, 2005
    • Ebara Corporation
    • Junichiro Yoshioka
    • H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

  • Information Patent Application

    ELECTROCHEMICAL DEPOSITION METHOD
    • Publication number 20160319455
    • Publication date Nov 3, 2016
    • EBARA CORPORATION
    • Junichiro YOSHIOKA
    • C25 - ELECTROLYTIC OR ELECTROPHORETIC PROCESSES APPARATUS THEREFOR
  • Information Patent Application

    ELECTROCHEMICAL DEPOSITION METHOD
    • Publication number 20160319454
    • Publication date Nov 3, 2016
    • EBARA CORPORATION
    • Junichiro YOSHIOKA
    • C25 - ELECTROLYTIC OR ELECTROPHORETIC PROCESSES APPARATUS THEREFOR
  • Information Patent Application

    ELECTROCHEMICAL DEPOSITION METHOD
    • Publication number 20160319456
    • Publication date Nov 3, 2016
    • EBARA CORPORATION
    • Junichiro YOSHIOKA
    • C25 - ELECTROLYTIC OR ELECTROPHORETIC PROCESSES APPARATUS THEREFOR
  • Information Patent Application

    ELECTROCHEMICAL DEPOSITION METHOD
    • Publication number 20150136610
    • Publication date May 21, 2015
    • EBARA CORPORATION
    • Junichiro YOSHIOKA
    • C25 - ELECTROLYTIC OR ELECTROPHORETIC PROCESSES APPARATUS THEREFOR
  • Information Patent Application

    Electrochemical deposition apparatus
    • Publication number 20130081941
    • Publication date Apr 4, 2013
    • EBARA CORPORATION
    • Junichiro YOSHIOKA
    • C25 - ELECTROLYTIC OR ELECTROPHORETIC PROCESSES APPARATUS THEREFOR
  • Information Patent Application

    SUBSTRATE HOLDER AND PLATING APPARATUS
    • Publication number 20110127159
    • Publication date Jun 2, 2011
    • Junichiro Yoshioka
    • C25 - ELECTROLYTIC OR ELECTROPHORETIC PROCESSES APPARATUS THEREFOR
  • Information Patent Application

    SUBSTRATE HOLDER, PLATING APPARATUS, AND PLATING METHOD
    • Publication number 20100320090
    • Publication date Dec 23, 2010
    • Junichiro Yoshioka
    • C25 - ELECTROLYTIC OR ELECTROPHORETIC PROCESSES APPARATUS THEREFOR
  • Information Patent Application

    Substrate Holder and Plating Apparatus
    • Publication number 20100000858
    • Publication date Jan 7, 2010
    • Junichiro Yoshioka
    • C25 - ELECTROLYTIC OR ELECTROPHORETIC PROCESSES APPARATUS THEREFOR
  • Information Patent Application

    Plating method and apparatus
    • Publication number 20090311429
    • Publication date Dec 17, 2009
    • Fumio Kuriyama
    • C25 - ELECTROLYTIC OR ELECTROPHORETIC PROCESSES APPARATUS THEREFOR
  • Information Patent Application

    Plating method and apparatus
    • Publication number 20070117365
    • Publication date May 24, 2007
    • EBARA CORPORATION
    • Fumio Kuriyama
    • C25 - ELECTROLYTIC OR ELECTROPHORETIC PROCESSES APPARATUS THEREFOR
  • Information Patent Application

    Substrate holder, plating apparatus, and plating method
    • Publication number 20050092600
    • Publication date May 5, 2005
    • Junichiro Yoshioka
    • C25 - ELECTROLYTIC OR ELECTROPHORETIC PROCESSES APPARATUS THEREFOR
  • Information Patent Application

    Substrate holder and plating apparatus
    • Publication number 20050014368
    • Publication date Jan 20, 2005
    • Junichiro Yoshioka
    • C25 - ELECTROLYTIC OR ELECTROPHORETIC PROCESSES APPARATUS THEREFOR
  • Information Patent Application

    Substrate holder, plating apparatus, and plating method
    • Publication number 20040037682
    • Publication date Feb 26, 2004
    • Junichiro Yoshioka
    • C25 - ELECTROLYTIC OR ELECTROPHORETIC PROCESSES APPARATUS THEREFOR