Yuichi Furuya

Person

Nirasaki City, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Absorbance analysis apparatus for DCR gas, absorbance analysis meth...
- Patent number 11,796,460
- Issue date Oct 24, 2023
- Tokyo Electron Limited
- Yuichi Furuya
- G01 - MEASURING TESTING
Information Patent Grant
Film forming apparatus, source supply apparatus, and film forming m...
- Patent number 11,753,720
- Issue date Sep 12, 2023
- Tokyo Electron Limited
- Yuichi Furuya
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Film-forming apparatus
- Patent number 11,466,365
- Issue date Oct 11, 2022
- Tokyo Electron Limited
- Daisuke Toriya
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method of controlling substrate processing apparatus, and substrate...
- Patent number 11,441,224
- Issue date Sep 13, 2022
- Tokyo Electron Limited
- Daisuke Toriya
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Valve device, processing apparatus, and control method
- Patent number 11,306,847
- Issue date Apr 19, 2022
- Tokyo Electron Limited
- Tomohisa Kimoto
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Source material container
- Patent number 11,193,205
- Issue date Dec 7, 2021
- Tokyo Electron Limited
- Yuichi Furuya
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Gas treatment apparatus and gas treatment method
- Patent number 10,156,014
- Issue date Dec 18, 2018
- Tokyo Electron Limited
- Takashi Kakegawa
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
SUBSTRATE PROCESSING APPARATUS AND METHOD OF SUPPRESSING OXYGEN INC...
- Publication number 20250075319
- Publication date Mar 6, 2025
- TOKYO ELECTRON LIMITED
- Yuichi FURUYA
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
VAPORIZATION DEVICE, SEMICONDUCTOR MANUFACTURING SYSTEM, AND METHOD...
- Publication number 20240124971
- Publication date Apr 18, 2024
- TOKYO ELECTRON LIMITED
- Yuichi FURUYA
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD
- Publication number 20240093362
- Publication date Mar 21, 2024
- TOKYO ELECTRON LIMITED
- Yuichi FURUYA
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
TRAP DEVICE AND SEMICONDUCTOR MANUFACTURING DEVICE
- Publication number 20230360895
- Publication date Nov 9, 2023
- TOKYO ELECTRON LIMITED
- Yuichi FURUYA
- B01 - PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
Information Patent Application
DEPOSITION METHOD AND DEPOSITION APPARATUS
- Publication number 20230272523
- Publication date Aug 31, 2023
- TOKYO ELECTRON LIMITED
- Yuichi FURUYA
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SOURCE GAS SUPPLY METHOD, SOURCE GAS SUPPLY MECHANISM, AND FILM FOR...
- Publication number 20230167555
- Publication date Jun 1, 2023
- TOKYO ELECTRON LIMITED
- Tomoyuki GOMI
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
FILM FORMING APPARATUS, FILM FORMING METHOD, AND FILM FORMING SYSTEM
- Publication number 20230093323
- Publication date Mar 23, 2023
- TOKYO ELECTRON LIMITED
- Tadahiro ISHIZAKA
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Absorbance analysis apparatus for DCR gas, absorbance analysis meth...
- Publication number 20220307977
- Publication date Sep 29, 2022
- TOKYO ELECTRON LIMITED
- Yuichi FURUYA
- G01 - MEASURING TESTING
Information Patent Application
FILM FORMING APPARATUS AND FILM FORMING METHOD
- Publication number 20210388493
- Publication date Dec 16, 2021
- TOKYO ELECTRON LIMITED
- Yuta SORITA
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Method of Controlling Substrate Processing Apparatus, and Substrate...
- Publication number 20200248306
- Publication date Aug 6, 2020
- TOKYO ELECTRON LIMITED
- Daisuke TORIYA
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
VALVE DEVICE, PROCESSING APPARATUS, AND CONTROL METHOD
- Publication number 20200056724
- Publication date Feb 20, 2020
- TOKYO ELECTRON LIMITED
- Tomohisa KIMOTO
- F16 - ENGINEERING ELEMENTS AND UNITS GENERAL MEASURES FOR PRODUCING AND MAINT...
Information Patent Application
FILM FORMING APPARATUS SOURCE SUPPLY APPARATUS, AND FILM FORMING ME...
- Publication number 20200024740
- Publication date Jan 23, 2020
- TOKYO ELECTRON LIMITED
- Yuichi FURUYA
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
FILM-FORMING APPARATUS
- Publication number 20200010956
- Publication date Jan 9, 2020
- TOKYO ELECTRON LIMITED
- Daisuke TORIYA
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SOURCE MATERIAL CONTAINER
- Publication number 20190180988
- Publication date Jun 13, 2019
- TOKYO ELECTRON LIMITED
- Yuichi FURUYA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
GAS SUPPLY APPARATUS AND FILM FORMING APPARATUS
- Publication number 20190078207
- Publication date Mar 14, 2019
- TOKYO ELECTRON LIMITED
- Hironori Yagi
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
GAS TREATMENT APPARATUS AND GAS TREATMENT METHOD
- Publication number 20180171478
- Publication date Jun 21, 2018
- TOKYO ELECTRON LIMITED
- Takashi KAKEGAWA
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SUBSTRATE TRANSFER DEVICE AND SUBSTRATE PROCESSING SYSTEM
- Publication number 20130180448
- Publication date Jul 18, 2013
- TOKYO ELECTRON LIMITED
- Hiromitsu Sakaue
- H01 - BASIC ELECTRIC ELEMENTS

Yuichi Furuya

Person

Patents Grantslast 30 patents

Absorbance analysis apparatus for DCR gas, absorbance analysis meth...

Film forming apparatus, source supply apparatus, and film forming m...

Film-forming apparatus

Method of controlling substrate processing apparatus, and substrate...

Valve device, processing apparatus, and control method

Source material container

Gas treatment apparatus and gas treatment method

Patents Applicationslast 30 patents

SUBSTRATE PROCESSING APPARATUS AND METHOD OF SUPPRESSING OXYGEN INC...

VAPORIZATION DEVICE, SEMICONDUCTOR MANUFACTURING SYSTEM, AND METHOD...

SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD

TRAP DEVICE AND SEMICONDUCTOR MANUFACTURING DEVICE

DEPOSITION METHOD AND DEPOSITION APPARATUS

SOURCE GAS SUPPLY METHOD, SOURCE GAS SUPPLY MECHANISM, AND FILM FOR...

FILM FORMING APPARATUS, FILM FORMING METHOD, AND FILM FORMING SYSTEM

Absorbance analysis apparatus for DCR gas, absorbance analysis meth...

FILM FORMING APPARATUS AND FILM FORMING METHOD

Method of Controlling Substrate Processing Apparatus, and Substrate...

VALVE DEVICE, PROCESSING APPARATUS, AND CONTROL METHOD

FILM FORMING APPARATUS SOURCE SUPPLY APPARATUS, AND FILM FORMING ME...

FILM-FORMING APPARATUS

SOURCE MATERIAL CONTAINER

GAS SUPPLY APPARATUS AND FILM FORMING APPARATUS

GAS TREATMENT APPARATUS AND GAS TREATMENT METHOD

SUBSTRATE TRANSFER DEVICE AND SUBSTRATE PROCESSING SYSTEM