Yuichi MUKAI

Person

Osaka-shi, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Compound, resist composition and method for producing resist pattern
- Patent number 11,681,218
- Issue date Jun 20, 2023
- Sumitomo Chemical Company, Limited
- Tatsuro Masuyama
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Resist composition
- Patent number 10,571,805
- Issue date Feb 25, 2020
- Sumitomo Chemical Company, Limited
- Yuki Suzuki
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Resist composition
- Patent number 10,520,812
- Issue date Dec 31, 2019
- Sumitomo Chemical Company, Limited
- Yuki Suzuki
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Non-ionic compound, resin, resist composition and method for produc...
- Patent number 10,073,343
- Issue date Sep 11, 2018
- Sumitomo Chemical Company, Limited
- Tatsuro Masuyama
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Compound, resin, resist composition and method for producing resist...
- Patent number 9,869,930
- Issue date Jan 16, 2018
- Sumitomo Chemical Company, Limited
- Tatsuro Masuyama
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Resist composition and method for producing resist pattern
- Patent number 9,791,776
- Issue date Oct 17, 2017
- Sumitomo Chemical Company, Limited
- Koji Ichikawa
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Resist composition and method for producing resist pattern
- Patent number 9,563,125
- Issue date Feb 7, 2017
- Sumitomo Chemical Company, Limited
- Tatsuro Masuyama
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Salt, photoresist composition and method for producing photoresist...
- Patent number 9,428,485
- Issue date Aug 30, 2016
- Sumitomo Chemical Company, Limited
- Tatsuro Masuyama
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Resin, resist composition and method for producing resist pattern
- Patent number 9,268,226
- Issue date Feb 23, 2016
- Sumitomo Chemical Company, Limited
- Koji Ichikawa
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Salt, photoresist composition and method for producing photoresist...
- Patent number 9,051,251
- Issue date Jun 9, 2015
- Sumitomo Chemical Company, Limited
- Tatsuro Masuyama
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Resist composition and method for producing resist pattern
- Patent number 8,940,473
- Issue date Jan 27, 2015
- Sumitomo Chemical Company, Limited
- Koji Ichikawa
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Resist composition and method for producing resist pattern
- Patent number 8,835,095
- Issue date Sep 16, 2014
- Sumitomo Chemical Company, Limited
- Koji Ichikawa
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Salt, photoresist composition and method for producing photoresist...
- Patent number 8,802,352
- Issue date Aug 12, 2014
- Sumitomo Chemical Company, Limited
- Koji Ichikawa
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Resist composition and method for producing resist pattern
- Patent number 8,778,594
- Issue date Jul 15, 2014
- Sumitomo Chemical Company, Limited
- Koji Ichikawa
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photoresist composition
- Patent number 8,753,795
- Issue date Jun 17, 2014
- Sumitomo Chemical Company, Limited
- Koji Ichikawa
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Photoresist composition
- Patent number 8,753,796
- Issue date Jun 17, 2014
- Sumitomo Chemical Company, Limited
- Koji Ichikawa
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Salt, photoresist composition and method for producing photoresist...
- Patent number 8,741,544
- Issue date Jun 3, 2014
- Sumitomo Chemical Company, Limited
- Isao Yoshida
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Compound, resin and photoresist composition
- Patent number 8,697,882
- Issue date Apr 15, 2014
- Sumitomo Chemical Company, Limited
- Hyungjoo Kim
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Resist composition and method for producing resist pattern
- Patent number 8,685,619
- Issue date Apr 1, 2014
- Sumitomo Chemcial Company, Limited
- Koji Ichikawa
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Resin, resist composition and method for producing resist pattern
- Patent number 8,592,129
- Issue date Nov 26, 2013
- Sumitomo Chemical Company, Limited
- Koji Ichikawa
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Photoresist composition
- Patent number 8,304,164
- Issue date Nov 6, 2012
- Sumitomo Chemical Company, Limited
- Tatsuro Masuyama
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Patents Applicationslast 30 patents

Information Patent Application
COMPOUND, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN
- Publication number 20190250508
- Publication date Aug 15, 2019
- Sumitomo Chemical Company, Limited
- Tatsuro MASUYAMA
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
RESIST COMPOSITION
- Publication number 20160377978
- Publication date Dec 29, 2016
- Sumitomo Chemical Company, Limited
- Yuki SUZUKI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
NON-IONIC COMPOUND, RESIN, RESIST COMPOSITION AND METHOD FOR PRODUC...
- Publication number 20160145186
- Publication date May 26, 2016
- Sumitomo Chemical Company, Limited
- Tatsuro MASUYAMA
- C07 - ORGANIC CHEMISTRY
Information Patent Application
RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN
- Publication number 20160147146
- Publication date May 26, 2016
- Sumitomo Chemical Company, Limited
- Tatsuro MASUYAMA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
COMPOUND, RESIN, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST...
- Publication number 20160130212
- Publication date May 12, 2016
- Sumitomo Chemical Company, Limited
- Tatsuro MASUYAMA
- C07 - ORGANIC CHEMISTRY
Information Patent Application
RESIN, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN
- Publication number 20140038105
- Publication date Feb 6, 2014
- Sumitomo Chemical Company, Limited
- Koji Ichikawa
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
SALT, PHOTORESIST COMPOSITION AND METHOD FOR PRODUCING PHOTORESIST...
- Publication number 20130052588
- Publication date Feb 28, 2013
- Sumitomo Chemical Company, Limited
- Isao YOSHIDA
- C07 - ORGANIC CHEMISTRY
Information Patent Application
SALT, PHOTORESIST COMPOSITION AND METHOD FOR PRODUCING PHOTORESIST...
- Publication number 20130040239
- Publication date Feb 14, 2013
- Sumitomo Chemical Company, Limited
- Koji ICHIKAWA
- C07 - ORGANIC CHEMISTRY
Information Patent Application
SALT, PHOTORESIST COMPOSITION AND METHOD FOR PRODUCING PHOTORESIST...
- Publication number 20130040237
- Publication date Feb 14, 2013
- Sumitomo Chemical Company, Limited
- Tatsuro MASUYAMA
- C07 - ORGANIC CHEMISTRY
Information Patent Application
RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN
- Publication number 20130022922
- Publication date Jan 24, 2013
- Sumitomo Chemical Company, Limited
- Koji ICHIKAWA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN
- Publication number 20130022915
- Publication date Jan 24, 2013
- Sumitomo Chemical Company, Limited
- Koji ICHIKAWA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
SALT, PHOTORESIST COMPOSITION AND METHOD FOR PRODUCING PHOTORESIST...
- Publication number 20120315580
- Publication date Dec 13, 2012
- Sumitomo Chemical Company, Limited
- Tatsuro MASUYAMA
- C07 - ORGANIC CHEMISTRY
Information Patent Application
PHOTORESIST COMPOSITION
- Publication number 20120264055
- Publication date Oct 18, 2012
- Sumitomo Chemical Company, Limited
- Koji ICHIKAWA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN
- Publication number 20120258401
- Publication date Oct 11, 2012
- Sumitomo Chemical Company, Limited
- Koji ICHIKAWA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PHOTORESIST COMPOSITION
- Publication number 20120251945
- Publication date Oct 4, 2012
- Sumitomo Chemical Company, Limited
- Koji ICHIKAWA
- C07 - ORGANIC CHEMISTRY
Information Patent Application
RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN
- Publication number 20120219904
- Publication date Aug 30, 2012
- Sumitomo Chemical Company, Limited
- Koji ICHIKAWA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN
- Publication number 20120219905
- Publication date Aug 30, 2012
- Sumitomo Chemical Company, Limited
- Koji ICHIKAWA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
COMPOUND, RESIN AND PHOTORESIST COMPOSITION
- Publication number 20120009519
- Publication date Jan 12, 2012
- Sumitomo Chemical Company, Limited
- Hyungjoo KIM
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
PHOTORESIST COMPOSITION
- Publication number 20110171575
- Publication date Jul 14, 2011
- Sumitomo Chemical Company, Limited
- Tatsuro MASUYAMA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RESIN, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN
- Publication number 20110053082
- Publication date Mar 3, 2011
- Sumitomo Chemical Company, Limited
- Koji Ichikawa
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...

Yuichi MUKAI

Person

Patents Grantslast 30 patents

Compound, resist composition and method for producing resist pattern

Resist composition

Resist composition

Non-ionic compound, resin, resist composition and method for produc...

Compound, resin, resist composition and method for producing resist...

Resist composition and method for producing resist pattern

Resist composition and method for producing resist pattern

Salt, photoresist composition and method for producing photoresist...

Resin, resist composition and method for producing resist pattern

Salt, photoresist composition and method for producing photoresist...

Resist composition and method for producing resist pattern

Resist composition and method for producing resist pattern

Salt, photoresist composition and method for producing photoresist...

Resist composition and method for producing resist pattern

Photoresist composition

Photoresist composition

Salt, photoresist composition and method for producing photoresist...

Compound, resin and photoresist composition

Resist composition and method for producing resist pattern

Resin, resist composition and method for producing resist pattern

Photoresist composition

Patents Applicationslast 30 patents

COMPOUND, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN

RESIST COMPOSITION

NON-IONIC COMPOUND, RESIN, RESIST COMPOSITION AND METHOD FOR PRODUC...

RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN

COMPOUND, RESIN, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST...

RESIN, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN

SALT, PHOTORESIST COMPOSITION AND METHOD FOR PRODUCING PHOTORESIST...

SALT, PHOTORESIST COMPOSITION AND METHOD FOR PRODUCING PHOTORESIST...

SALT, PHOTORESIST COMPOSITION AND METHOD FOR PRODUCING PHOTORESIST...

RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN

RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN

SALT, PHOTORESIST COMPOSITION AND METHOD FOR PRODUCING PHOTORESIST...

PHOTORESIST COMPOSITION

RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN

PHOTORESIST COMPOSITION

RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN

RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN

COMPOUND, RESIN AND PHOTORESIST COMPOSITION

PHOTORESIST COMPOSITION

RESIN, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN