Yuichiro Ishizaki

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Kagoshima, JP

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Patents Grantslast 30 patents

Information Patent Grant
Wiring substrate and electronic device
- Patent number 11,395,405
- Issue date Jul 19, 2022
- Kyocera Corporation
- Seiichirou Itou
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma generator and reaction apparatus
- Patent number 8,349,266
- Issue date Jan 8, 2013
- Kyocera Corporation
- Yuichiro Ishizaki
- C01 - INORGANIC CHEMISTRY

Patents Applicationslast 30 patents

Information Patent Application
SiC POLYCRYSTAL MANUFACTURING METHOD
- Publication number 20230357955
- Publication date Nov 9, 2023
- KYOCERA CORPORATION
- Seiichirou ITOU
- C30 - CRYSTAL GROWTH
Information Patent Application
SiC CRYSTAL MANUFACTURING METHOD
- Publication number 20230243063
- Publication date Aug 3, 2023
- KYOCERA CORPORATION
- Seiichirou ITOU
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
WIRING SUBSTRATE, ELECTRONIC DEVICE, AND ELECTRONIC MODULE
- Publication number 20220367183
- Publication date Nov 17, 2022
- KYOCERA CORPORATION
- Seiichirou ITOU
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
WIRING SUBSTRATE AND ELECTRONIC DEVICE
- Publication number 20210243892
- Publication date Aug 5, 2021
- KYOCERA CORPORATION
- Seiichirou ITOU
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Application
Plasma Generator and Reaction Apparatus
- Publication number 20100135867
- Publication date Jun 3, 2010
- KYOCERA CORPORATION
- Yuichiro Ishizaki
- B01 - PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL