Yuichiro Nakamura

Person

Ibaraki, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Nonmagnetic material-dispersed Fe-Pt based sputtering target
- Patent number 12,198,911
- Issue date Jan 14, 2025
- JX Advanced Metals Corporation
- Atsushi Sato
- B22 - CASTING POWDER METALLURGY
Information Patent Grant
Magnetic material sputtering target and manufacturing method thereof
- Patent number 10,325,761
- Issue date Jun 18, 2019
- JX Nippon Mining & Metals Corporation
- Shin-ichi Ogino
- B22 - CASTING POWDER METALLURGY
Information Patent Grant
Sputtering target for magnetic recording medium, and process for pr...
- Patent number 10,266,939
- Issue date Apr 23, 2019
- JX Nippon Mining & Metals Corporation
- Shin-Ichi Ogino
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Sintered compact magnesium oxide target for sputtering, and method...
- Patent number 10,066,290
- Issue date Sep 4, 2018
- JX Nippon Mining & Metals Corporation
- Akira Hisano
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Sintered compact magnesium oxide target for sputtering, and method...
- Patent number 9,988,709
- Issue date Jun 5, 2018
- JX Nippon Mining & Metals Corporation
- Akira Hisano
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Sputtering target for magnetic recording medium, and process for pr...
- Patent number 9,970,099
- Issue date May 15, 2018
- JX Nippon Mining & Metals Corporation
- Shin-Ichi Ogino
- C22 - METALLURGY FERROUS OR NON-FERROUS ALLOYS TREATMENT OF ALLOYS OR NON-FER...
Information Patent Grant
Magnetic material sputtering target and manufacturing method thereof
- Patent number 9,793,099
- Issue date Oct 17, 2017
- JX Nippon Mining & Metals Corporation
- Shin-ichi Ogino
- C22 - METALLURGY FERROUS OR NON-FERROUS ALLOYS TREATMENT OF ALLOYS OR NON-FER...
Information Patent Grant
Magnetic material sputtering target and manufacturing method for same
- Patent number 9,761,422
- Issue date Sep 12, 2017
- JX Nippon Mining & Metals Corporation
- Atsutoshi Arakawa
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Co—Cr—Pt-based sputtering target and method for producing same
- Patent number 9,732,414
- Issue date Aug 15, 2017
- JX Nippon Mining & Metals Corporation
- Atsushi Sato
- C22 - METALLURGY FERROUS OR NON-FERROUS ALLOYS TREATMENT OF ALLOYS OR NON-FER...
Information Patent Grant
Sputtering target for magnetic recording film
- Patent number 9,683,284
- Issue date Jun 20, 2017
- JX Nippon Mining & Metals Corporation
- Shin-ichi Ogino
- C22 - METALLURGY FERROUS OR NON-FERROUS ALLOYS TREATMENT OF ALLOYS OR NON-FER...
Information Patent Grant
Fe—Pt-based ferromagnetic material sputtering target
- Patent number 9,328,412
- Issue date May 3, 2016
- JX Nippon Mining & Metals Corporation
- Shin-ichi Ogino
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Sputtering target of ferromagnetic material with low generation of...
- Patent number 9,181,617
- Issue date Nov 10, 2015
- JX Nippon Mining & Metals Corporation
- Shin-ichi Ogino
- C22 - METALLURGY FERROUS OR NON-FERROUS ALLOYS TREATMENT OF ALLOYS OR NON-FER...
Information Patent Grant
Inorganic-particle-dispersed sputtering target
- Patent number 9,034,155
- Issue date May 19, 2015
- JX Nippon Mining & Metals Corporation
- Atsushi Sato
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Sputtering target and process for producing same
- Patent number 9,034,154
- Issue date May 19, 2015
- JX Nippon Mining & Metals Corporation
- Yuichiro Nakamura
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Sputtering target of ferromagnetic material with low generation of...
- Patent number 8,679,268
- Issue date Mar 25, 2014
- JX Nippon Mining & Metals Corporation
- Shin-ichi Ogino
- C22 - METALLURGY FERROUS OR NON-FERROUS ALLOYS TREATMENT OF ALLOYS OR NON-FER...
Information Patent Grant
Sputtering target with few surface defects, and surface processing...
- Patent number 8,663,402
- Issue date Mar 4, 2014
- JX Nippon Mining & Metals Corporation
- Yuichiro Nakamura
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Co-Cr-Pt-B alloy sputtering target
- Patent number 7,927,434
- Issue date Apr 19, 2011
- JX Nippon Mining & Metals Corporation
- Yuichiro Nakamura
- C22 - METALLURGY FERROUS OR NON-FERROUS ALLOYS TREATMENT OF ALLOYS OR NON-FER...
Information Patent Grant
Sputtering target with few surface defects, and surface processing...
- Patent number 7,909,949
- Issue date Mar 22, 2011
- JX Nippon Mining & Metals Corporation
- Yuichiro Nakamura
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Manganese alloy sputtering target and method for producing the same
- Patent number 7,713,364
- Issue date May 11, 2010
- Nippon Mining & Metals Co., Ltd.
- Yuichiro Nakamura
- C22 - METALLURGY FERROUS OR NON-FERROUS ALLOYS TREATMENT OF ALLOYS OR NON-FER...
Information Patent Grant
Manganese alloy sputtering target and method for producing the same
- Patent number 7,229,510
- Issue date Jun 12, 2007
- Nippon Mining & Metals, Co., Ltd.
- Yuichiro Nakamura
- C22 - METALLURGY FERROUS OR NON-FERROUS ALLOYS TREATMENT OF ALLOYS OR NON-FER...

Patents Applicationslast 30 patents

Information Patent Application
NONMAGNETIC MATERIAL-DISPERSED FE-PT BASED SPUTTERING TARGET
- Publication number 20230125486
- Publication date Apr 27, 2023
- JX NIPPON MINING & METALS CORPORATION
- Atsushi Sato
- B22 - CASTING POWDER METALLURGY
Information Patent Application
NONMAGNETIC MATERIAL-DISPERSED FE-PT BASED SPUTTERING TARGET
- Publication number 20190185987
- Publication date Jun 20, 2019
- JX NIPPON MINING & METALS CORPORATION
- Atsushi Sato
- B22 - CASTING POWDER METALLURGY
Information Patent Application
SINTERED COMPACT MAGNESIUM OXIDE TARGET FOR SPUTTERING, AND METHOD...
- Publication number 20180251889
- Publication date Sep 6, 2018
- JX NIPPON MINING & METALS CORPORATION
- Akira Hisano
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Sputtering Target for Magnetic Recording Medium, and Process for Pr...
- Publication number 20180163294
- Publication date Jun 14, 2018
- JX NIPPON MINING & METALS CORPORATION
- Shin-ichi Ogino
- C22 - METALLURGY FERROUS OR NON-FERROUS ALLOYS TREATMENT OF ALLOYS OR NON-FER...
Information Patent Application
Magnetic Material Sputtering Target and Manufacturing Method Thereof
- Publication number 20180005807
- Publication date Jan 4, 2018
- JX NIPPON MINING & METALS CORPORATION
- Shin-ichi Ogino
- C22 - METALLURGY FERROUS OR NON-FERROUS ALLOYS TREATMENT OF ALLOYS OR NON-FER...
Information Patent Application
Sputtering Target for Magnetic Recording Medium, and Process for Pr...
- Publication number 20150027882
- Publication date Jan 29, 2015
- JX Nippon Minning & Metals Corporation
- Shin-ichi Ogino
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Magnetic Material Sputtering Target and Manufacturing Method for Same
- Publication number 20150021175
- Publication date Jan 22, 2015
- JX NIPPON MINING & METALS CORPORATION
- Atsutoshi Arakawa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Co-Cr-Pt-Based Sputtering Target and Method for Producing Same
- Publication number 20140367254
- Publication date Dec 18, 2014
- Atsushi Sato
- C22 - METALLURGY FERROUS OR NON-FERROUS ALLOYS TREATMENT OF ALLOYS OR NON-FER...
Information Patent Application
Magnetic Material Sputtering Target and Manufacturing Method Thereof
- Publication number 20140311902
- Publication date Oct 23, 2014
- JX NIPPON MINING & METALS CORPORATION
- Shin-ichi Ogino
- C22 - METALLURGY FERROUS OR NON-FERROUS ALLOYS TREATMENT OF ALLOYS OR NON-FER...
Information Patent Application
Sintered Compact Magnesium Oxide Target for Sputtering, and Method...
- Publication number 20140284212
- Publication date Sep 25, 2014
- JX NIPPON MINING & METALS CORPORATION
- Akira Hisano
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
C PARTICLE DISPERSED FE-PT-BASED SPUTTERING TARGET
- Publication number 20140231250
- Publication date Aug 21, 2014
- Shin-ichi Ogino
- C22 - METALLURGY FERROUS OR NON-FERROUS ALLOYS TREATMENT OF ALLOYS OR NON-FER...
Information Patent Application
Ferromagnetic Sputtering Target with Less Particle Generation
- Publication number 20140001038
- Publication date Jan 2, 2014
- JX NIPPON MINING & METALS CORPORATION
- Shin-ichi Ogino
- C22 - METALLURGY FERROUS OR NON-FERROUS ALLOYS TREATMENT OF ALLOYS OR NON-FER...
Information Patent Application
Co-Cr-Pt-B-Based Alloy Sputtering Target and Method for Producing Same
- Publication number 20130341184
- Publication date Dec 26, 2013
- JX NIPPON MINING & METALS CORPORATION
- Yuto Morishita
- C22 - METALLURGY FERROUS OR NON-FERROUS ALLOYS TREATMENT OF ALLOYS OR NON-FER...
Information Patent Application
Sputtering Target for Magnetic Recording Film
- Publication number 20130306470
- Publication date Nov 21, 2013
- JX NIPPON MINING & METALS CORPORATION
- Shin-ichi Ogino
- C22 - METALLURGY FERROUS OR NON-FERROUS ALLOYS TREATMENT OF ALLOYS OR NON-FER...
Information Patent Application
Sintered Compact Sputtering Target
- Publication number 20130213802
- Publication date Aug 22, 2013
- JX NIPPON MINING & METALS CORPORATION
- Atsushi Sato
- C22 - METALLURGY FERROUS OR NON-FERROUS ALLOYS TREATMENT OF ALLOYS OR NON-FER...
Information Patent Application
Sputtering Target for Magnetic Recording Film and Method for Produc...
- Publication number 20130206591
- Publication date Aug 15, 2013
- JX NIPPON MINING & METALS CORPORATION
- Hideo Takami
- C22 - METALLURGY FERROUS OR NON-FERROUS ALLOYS TREATMENT OF ALLOYS OR NON-FER...
Information Patent Application
Fe-Pt-Based Ferromagnetic Material Sputtering Target
- Publication number 20130168240
- Publication date Jul 4, 2013
- JX NIPPON MINING & METALS CORPORATION
- Shin-ichi Ogino
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Sputtering Target of Ferromagnetic Material with Low Generation of...
- Publication number 20130112555
- Publication date May 9, 2013
- JX NIPPON MINING & METALS CORPORATION
- Shin-ichi Ogino
- C22 - METALLURGY FERROUS OR NON-FERROUS ALLOYS TREATMENT OF ALLOYS OR NON-FER...
Information Patent Application
SPUTTERING TARGET-BACKING PLATE ASSEMBLY
- Publication number 20120318669
- Publication date Dec 20, 2012
- JX NIPPON MINING & METALS CORPORATION
- Yuki Ikeda
- C22 - METALLURGY FERROUS OR NON-FERROUS ALLOYS TREATMENT OF ALLOYS OR NON-FER...
Information Patent Application
Sputtering Target Comprising Oxide Phase Dispersed in Co or Co Allo...
- Publication number 20120241317
- Publication date Sep 27, 2012
- JX NIPPON MINING & METALS CORPORATION
- Yuki Ikeda
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Sputtering Target of Ferromagnetic Material with Low Generation of...
- Publication number 20120097535
- Publication date Apr 26, 2012
- JX NIPPON MINING & METALS CORPORATION
- Shin-ichi Ogino
- C22 - METALLURGY FERROUS OR NON-FERROUS ALLOYS TREATMENT OF ALLOYS OR NON-FER...
Information Patent Application
Inorganic-Particle-Dispersed Sputtering Target
- Publication number 20110284373
- Publication date Nov 24, 2011
- JX NIPPON MINING & METALS CORPORATION
- Atsushi Sato
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Sputtering Target and Process for Producing Same
- Publication number 20110162971
- Publication date Jul 7, 2011
- JX NIPPON MINING & METALS CORPORATION
- Yuichiro Nakamura
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Sputtering Target with Few Surface Defects, and Surface Processing...
- Publication number 20110132757
- Publication date Jun 9, 2011
- JX NIPPON MINING & METALS CORPORATION
- Yuichiro Nakamura
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Co-cr-pt-b alloy sputtering target
- Publication number 20070187236
- Publication date Aug 16, 2007
- Nippon Mining & Metals Co., Ltd.
- Yuichiro Nakamura
- C22 - METALLURGY FERROUS OR NON-FERROUS ALLOYS TREATMENT OF ALLOYS OR NON-FER...
Information Patent Application
Manganese Alloy Sputtering Target and Method for Producing the Same
- Publication number 20070163878
- Publication date Jul 19, 2007
- Nippon Mining & Metals Co., Ltd.
- Yuichiro Nakamura
- C22 - METALLURGY FERROUS OR NON-FERROUS ALLOYS TREATMENT OF ALLOYS OR NON-FER...
Information Patent Application
Sputtering target with few surface defects, and surface processing...
- Publication number 20070125645
- Publication date Jun 7, 2007
- Nippon Mining & Metals Co., Ltd.
- Yuichiro Nakamura
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Manganese alloy sputtering target and method for producing the same
- Publication number 20040103750
- Publication date Jun 3, 2004
- Yuichiro Nakamura
- C22 - METALLURGY FERROUS OR NON-FERROUS ALLOYS TREATMENT OF ALLOYS OR NON-FER...

Yuichiro Nakamura

Person

Patents Grantslast 30 patents

Nonmagnetic material-dispersed Fe-Pt based sputtering target

Magnetic material sputtering target and manufacturing method thereof

Sputtering target for magnetic recording medium, and process for pr...

Sintered compact magnesium oxide target for sputtering, and method...

Sintered compact magnesium oxide target for sputtering, and method...

Sputtering target for magnetic recording medium, and process for pr...

Magnetic material sputtering target and manufacturing method thereof

Magnetic material sputtering target and manufacturing method for same

Co—Cr—Pt-based sputtering target and method for producing same

Sputtering target for magnetic recording film

Fe—Pt-based ferromagnetic material sputtering target

Sputtering target of ferromagnetic material with low generation of...

Inorganic-particle-dispersed sputtering target

Sputtering target and process for producing same

Sputtering target of ferromagnetic material with low generation of...

Sputtering target with few surface defects, and surface processing...

Co-Cr-Pt-B alloy sputtering target

Sputtering target with few surface defects, and surface processing...

Manganese alloy sputtering target and method for producing the same

Manganese alloy sputtering target and method for producing the same

Patents Applicationslast 30 patents

NONMAGNETIC MATERIAL-DISPERSED FE-PT BASED SPUTTERING TARGET

NONMAGNETIC MATERIAL-DISPERSED FE-PT BASED SPUTTERING TARGET

SINTERED COMPACT MAGNESIUM OXIDE TARGET FOR SPUTTERING, AND METHOD...

Sputtering Target for Magnetic Recording Medium, and Process for Pr...

Magnetic Material Sputtering Target and Manufacturing Method Thereof

Sputtering Target for Magnetic Recording Medium, and Process for Pr...

Magnetic Material Sputtering Target and Manufacturing Method for Same

Co-Cr-Pt-Based Sputtering Target and Method for Producing Same

Magnetic Material Sputtering Target and Manufacturing Method Thereof

Sintered Compact Magnesium Oxide Target for Sputtering, and Method...

C PARTICLE DISPERSED FE-PT-BASED SPUTTERING TARGET

Ferromagnetic Sputtering Target with Less Particle Generation

Co-Cr-Pt-B-Based Alloy Sputtering Target and Method for Producing Same

Sputtering Target for Magnetic Recording Film

Sintered Compact Sputtering Target

Sputtering Target for Magnetic Recording Film and Method for Produc...

Fe-Pt-Based Ferromagnetic Material Sputtering Target

Sputtering Target of Ferromagnetic Material with Low Generation of...

SPUTTERING TARGET-BACKING PLATE ASSEMBLY

Sputtering Target Comprising Oxide Phase Dispersed in Co or Co Allo...

Sputtering Target of Ferromagnetic Material with Low Generation of...

Inorganic-Particle-Dispersed Sputtering Target

Sputtering Target and Process for Producing Same

Sputtering Target with Few Surface Defects, and Surface Processing...

Co-cr-pt-b alloy sputtering target

Manganese Alloy Sputtering Target and Method for Producing the Same

Sputtering target with few surface defects, and surface processing...

Manganese alloy sputtering target and method for producing the same