Yuji Harada

Person

Joetsu-shi, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Resist underlayer film material, patterning process, and method for...
- Patent number 12,147,160
- Issue date Nov 19, 2024
- Shin-Etsu Chemical Co., Ltd.
- Daisuke Kori
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Silicon-containing compound, urethane resin, stretchable film and m...
- Patent number 11,142,640
- Issue date Oct 12, 2021
- Shin-Etsu Chemical Co., Ltd.
- Jun Hatakeyama
- B01 - PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
Information Patent Grant
Method for producing polyalkylene glycol derivative having amino gr...
- Patent number 11,066,430
- Issue date Jul 20, 2021
- Shin-Etsu Chemical Co., Ltd.
- Yuki Suka
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Method for purifying an amino acid-n-carboxy anhydride
- Patent number 10,975,042
- Issue date Apr 13, 2021
- Shin-Etsu Chemical Co., Ltd.
- Yuki Suka
- B01 - PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
Information Patent Grant
Methods of preparing and purifying polyalkylene glycol derivative
- Patent number 10,836,861
- Issue date Nov 17, 2020
- Shin-Etsu Chemical Co., Ltd.
- Shiori Nonaka
- B01 - PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
Information Patent Grant
Silicon-containing compound, urethane resin, stretchable film, and...
- Patent number 10,717,804
- Issue date Jul 21, 2020
- Shin-Etsu Chemical Co., Ltd.
- Jun Hatakeyama
- H04 - ELECTRIC COMMUNICATION TECHNIQUE
Information Patent Grant
Silicon-containing compound, urethane resin, stretchable film, and...
- Patent number 10,696,779
- Issue date Jun 30, 2020
- Shin-Etsu Chemical Co., Ltd.
- Jun Hatakeyama
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Method for producing polyalkylene glycol derivative having amino gr...
- Patent number 10,550,136
- Issue date Feb 4, 2020
- Shin-Etsu Chemical Co., Ltd.
- Yuki Suka
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Method for producing polyalkylene glycol derivative having amino gr...
- Patent number 10,472,377
- Issue date Nov 12, 2019
- Shin-Etsu Chemical Co., Ltd.
- Yuki Suka
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Method for producing polyalkylene glycol derivative having amino gr...
- Patent number 10,377,775
- Issue date Aug 13, 2019
- Shin-Etsu Chemical Co., Ltd.
- Yuki Suka
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Method for producing polyalkylene glycol derivative having amino gr...
- Patent number 9,708,350
- Issue date Jul 18, 2017
- Shin-Etsu Chemical Co., Ltd.
- Yuki Suka
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Method for producing polyalkylene glycol derivative with narrow mol...
- Patent number 9,284,408
- Issue date Mar 15, 2016
- Shin-Etsu Chemical Co., Ltd.
- Yuki Suka
- A61 - MEDICAL OR VETERINARY SCIENCE HYGIENE
Information Patent Grant
Fluorinated ester monomer, making method, fluorinated ester polymer...
- Patent number 9,261,783
- Issue date Feb 16, 2016
- Shin-Etsu Chemical Co., Ltd.
- Takeshi Kinsho
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Method for producing polyalkylene glycol derivative having amino gr...
- Patent number 9,187,404
- Issue date Nov 17, 2015
- Shin-Etsu Chemical Co., Ltd.
- Yuji Harada
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Resist protective film-forming composition and patterning process
- Patent number 9,086,628
- Issue date Jul 21, 2015
- Shin-Etsu Chemical Co., Ltd.
- Yuuki Suka
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Fluorinated monomer, fluorinated polymer, resist composition, and p...
- Patent number 8,945,809
- Issue date Feb 3, 2015
- Shin-Etsu Chemical Co., Ltd.
- Koji Hasegawa
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Fluorinated monomer of cyclic acetal structure, polymer, resist pro...
- Patent number 8,933,251
- Issue date Jan 13, 2015
- Shin-Etsu Chemical Co., Ltd.
- Takeru Watanabe
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Resist composition and patterning process
- Patent number 8,916,331
- Issue date Dec 23, 2014
- Shin-Etsu Chemical Co., Ltd.
- Koji Hasegawa
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Fluorinated ester monomer, making method, fluorinated ester polymer...
- Patent number 8,697,903
- Issue date Apr 15, 2014
- Shin-Etsu Chemical Co., Ltd.
- Takeshi Kinsho
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Fluorinated monomer of cyclic acetal structure, polymer, resist pro...
- Patent number 8,431,323
- Issue date Apr 30, 2013
- Shin-Etsu Chemical Co., Ltd.
- Takeru Watanabe
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Polymer, resist composition, and patterning process
- Patent number 8,420,292
- Issue date Apr 16, 2013
- Shin-Etsu Chemical Co., Ltd.
- Yuji Harada
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Resist protective coating composition and patterning process
- Patent number 8,361,703
- Issue date Jan 29, 2013
- Shin-Etsu Chemical Co., Ltd.
- Yuji Harada
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Resist protective coating material and patterning process
- Patent number 8,323,872
- Issue date Dec 4, 2012
- Shin-Etsu Chemical Co., Ltd.
- Jun Hatakeyama
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Resist composition and patterning process
- Patent number 8,313,886
- Issue date Nov 20, 2012
- Shin-Etsu Chemical Co., Ltd.
- Yuji Harada
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Resist composition and patterning process
- Patent number 8,268,528
- Issue date Sep 18, 2012
- Shin-Etsu Chemical Co., Ltd.
- Yuji Harada
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Polymer, resist composition, and patterning process
- Patent number 8,252,504
- Issue date Aug 28, 2012
- Shin-Etsu Chemical Co., Ltd.
- Yuji Harada
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Resist protective coating composition and patterning process
- Patent number 8,158,330
- Issue date Apr 17, 2012
- Shin-Etsu Chemical Co., Ltd.
- Yuji Harada
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Resist composition and patterning process
- Patent number 8,101,335
- Issue date Jan 24, 2012
- Shin-Etsu Chemical Co., Ltd.
- Yuji Harada
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Resist top coat composition and patterning process
- Patent number 8,088,537
- Issue date Jan 3, 2012
- Shin-Etsu Chemical Co., Ltd.
- Jun Hatakeyama
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Resist composition, resist protective coating composition, and patt...
- Patent number 8,057,981
- Issue date Nov 15, 2011
- Shin-Etsu Chemical Co., Ltd.
- Yuji Harada
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC

Patents Applicationslast 30 patents

Information Patent Application
Resist Underlayer Film Material, Patterning Process, And Method For...
- Publication number 20230400770
- Publication date Dec 14, 2023
- Shin-Etsu Chemical Co., Ltd.
- Takayoshi NAKAHARA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
MATERIAL FOR FORMING ADHESIVE FILM, PATTERNING PROCESS, AND METHOD...
- Publication number 20230203354
- Publication date Jun 29, 2023
- Shin-Etsu Chemical Co., Ltd.
- Mamoru WATABE
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
MATERIAL FOR FORMING ADHESIVE FILM, METHOD FOR FORMING ADHESIVE FIL...
- Publication number 20230059089
- Publication date Feb 23, 2023
- Shin-Etsu Chemical Co., Ltd.
- Takayoshi NAKAHARA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RESIST UNDERLAYER FILM MATERIAL, PATTERNING PROCESS, AND METHOD FOR...
- Publication number 20220163890
- Publication date May 26, 2022
- Shin-Etsu Chemical Co., Ltd.
- Daisuke KORI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD FOR PURIFYING AN AMINO ACID-N-CARBOXY ANHYDRIDE
- Publication number 20190359579
- Publication date Nov 28, 2019
- Shin-Etsu Chemical Co., Ltd.
- Yuki SUKA
- B01 - PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
Information Patent Application
METHOD FOR PRODUCING POLYALKYLENE GLYCOL DERIVATIVE HAVING AMINO GR...
- Publication number 20190322688
- Publication date Oct 24, 2019
- Shin-Etsu Chemical Co., Ltd.
- Yuki Suka
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
METHOD FOR PRODUCING POLYALKYLENE GLYCOL DERIVATIVE HAVING AMINO GR...
- Publication number 20190315777
- Publication date Oct 17, 2019
- Shin-Etsu Chemical Co., Ltd.
- Yuki Suka
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
SILICON-CONTAINING COMPOUND, URETHANE RESIN, STRETCHABLE FILM AND M...
- Publication number 20190264028
- Publication date Aug 29, 2019
- Shin-Etsu Chemical Co., Ltd.
- Jun HATAKEYAMA
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
SILICON-CONTAINING COMPOUND, URETHANE RESIN, STRETCHABLE FILM, AND...
- Publication number 20190112413
- Publication date Apr 18, 2019
- Shin-Etsu Chemical Co., Ltd.
- Jun HATAKEYAMA
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
SILICON-CONTAINING COMPOUND, URETHANE RESIN, STRETCHABLE FILM, AND...
- Publication number 20190106528
- Publication date Apr 11, 2019
- Shin-Etsu Chemical Co., Ltd.
- Jun HATAKEYAMA
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
METHODS OF PREPARING AND PURIFYING POLYALKYLENE GLYCOL DERIVATIVE
- Publication number 20190023841
- Publication date Jan 24, 2019
- Shin-Etsu Chemical Co., Ltd.
- Shiori NONAKA
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
METHOD FOR PRODUCING POLYALKYLENE GLYCOL DERIVATIVE HAVING AMINO GR...
- Publication number 20170275305
- Publication date Sep 28, 2017
- Shin-Etsu Chemical Co., Ltd.
- Yuki Suka
- C07 - ORGANIC CHEMISTRY
Information Patent Application
METHOD FOR PRODUCING POLYALKYLENE GLYCOL DERIVATIVE HAVING AMINO GR...
- Publication number 20160159979
- Publication date Jun 9, 2016
- Shin-Etsu Chemical Co., Ltd.
- Yuki Suka
- C07 - ORGANIC CHEMISTRY
Information Patent Application
METHOD FOR PRODUCING POLYALKYLENE GLYCOL DERIVATIVE HAVING AMINO GR...
- Publication number 20160159831
- Publication date Jun 9, 2016
- Shin-Etsu Chemical Co., Ltd.
- Yuki Suka
- C07 - ORGANIC CHEMISTRY
Information Patent Application
METHOD FOR PRODUCING POLYALKYLENE GLYCOL DERIVATIVE WITH NARROW MOL...
- Publication number 20150197601
- Publication date Jul 16, 2015
- Shin-Etsu Chemical Co., Ltd.
- Yuki Suka
- C07 - ORGANIC CHEMISTRY
Information Patent Application
METHOD FOR PRODUCING POLYALKYLENE GLYCOL DERIVATIVE HAVING AMINO GR...
- Publication number 20150197482
- Publication date Jul 16, 2015
- Shin-Etsu Chemical Co., Ltd.
- Yuji Harada
- C07 - ORGANIC CHEMISTRY
Information Patent Application
FLUORINATED ESTER MONOMER, MAKING METHOD, FLUORINATED ESTER POLYMER...
- Publication number 20140051024
- Publication date Feb 20, 2014
- Shin-Etsu Chemical Co., Ltd.
- Takeshi KINSHO
- C07 - ORGANIC CHEMISTRY
Information Patent Application
FLUORINATED MONOMER OF CYCLIC ACETAL STRUCTURE, POLYMER, RESIST PRO...
- Publication number 20130231491
- Publication date Sep 5, 2013
- Shin-Etsu Chemical Co., Ltd.
- Takeru WATANABE
- C07 - ORGANIC CHEMISTRY
Information Patent Application
RESIST PROTECTIVE FILM-FORMING COMPOSITION AND PATTERNING PROCESS
- Publication number 20130084517
- Publication date Apr 4, 2013
- Shin-Etsu Chemical Co., Ltd.
- Yuuki Suka
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
PATTERNING PROCESS AND RESIST COMPOSITION
- Publication number 20130065183
- Publication date Mar 14, 2013
- Shin-Etsu Chemical Co., Ltd.
- Tomohiro Kobayashi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RESIST PROTECTIVE FILM MATERIAL AND PATTERN FORMATION METHOD
- Publication number 20120249995
- Publication date Oct 4, 2012
- Shin-Etsu Chemical Co. Ltd.
- Jun Hatakeyama
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RESIST COMPOSITION AND PATTERNING PROCESS USING THE SAME
- Publication number 20120214100
- Publication date Aug 23, 2012
- Shin-Etsu Chemical Co., Ltd.
- Tomohiro Kobayashi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RESIST COMPOSITION AND PATTERNING PROCESS
- Publication number 20120148945
- Publication date Jun 14, 2012
- Shin-Etsu Chemical Co., Ltd.
- Koji Hasegawa
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
FLUORINATED ESTER MONOMER, MAKING METHOD, FLUORINATED ESTER POLYMER...
- Publication number 20120083580
- Publication date Apr 5, 2012
- Takeshi KINSHO
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
RESIST TOP COAT COMPOSITION AND PATTERNING PROCESS
- Publication number 20110305979
- Publication date Dec 15, 2011
- Shin-Etsu Chemical Co., Ltd.
- Yuji HARADA
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
POLYMER, RESIST COMPOSITION, AND PATTERNING PROCESS
- Publication number 20110177455
- Publication date Jul 21, 2011
- Yuji HARADA
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
FLUORINATED MONOMER, FLUORINATED POLYMER, RESIST COMPOSITION, AND P...
- Publication number 20110151381
- Publication date Jun 23, 2011
- Koji HASEGAWA
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
RESIST COMPOSITION AND PATTERNING PROCESS
- Publication number 20100266957
- Publication date Oct 21, 2010
- Yuji HARADA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RESIST COMPOSITION AND PATTERNING PROCESS
- Publication number 20100136482
- Publication date Jun 3, 2010
- Yuji Harada
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RESIST PROTECTIVE COATING COMPOSITON AND PATTERNING PROCESS
- Publication number 20100136486
- Publication date Jun 3, 2010
- Yuji HARADA
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...

Yuji Harada

Person

Patents Grantslast 30 patents

Resist underlayer film material, patterning process, and method for...

Silicon-containing compound, urethane resin, stretchable film and m...

Method for producing polyalkylene glycol derivative having amino gr...

Method for purifying an amino acid-n-carboxy anhydride

Methods of preparing and purifying polyalkylene glycol derivative

Silicon-containing compound, urethane resin, stretchable film, and...

Silicon-containing compound, urethane resin, stretchable film, and...

Method for producing polyalkylene glycol derivative having amino gr...

Method for producing polyalkylene glycol derivative having amino gr...

Method for producing polyalkylene glycol derivative having amino gr...

Method for producing polyalkylene glycol derivative having amino gr...

Method for producing polyalkylene glycol derivative with narrow mol...

Fluorinated ester monomer, making method, fluorinated ester polymer...

Method for producing polyalkylene glycol derivative having amino gr...

Resist protective film-forming composition and patterning process

Fluorinated monomer, fluorinated polymer, resist composition, and p...

Fluorinated monomer of cyclic acetal structure, polymer, resist pro...

Resist composition and patterning process

Fluorinated ester monomer, making method, fluorinated ester polymer...

Fluorinated monomer of cyclic acetal structure, polymer, resist pro...

Polymer, resist composition, and patterning process

Resist protective coating composition and patterning process

Resist protective coating material and patterning process

Resist composition and patterning process

Resist composition and patterning process

Polymer, resist composition, and patterning process

Resist protective coating composition and patterning process

Resist composition and patterning process

Resist top coat composition and patterning process

Resist composition, resist protective coating composition, and patt...

Patents Applicationslast 30 patents

Resist Underlayer Film Material, Patterning Process, And Method For...

MATERIAL FOR FORMING ADHESIVE FILM, PATTERNING PROCESS, AND METHOD...

MATERIAL FOR FORMING ADHESIVE FILM, METHOD FOR FORMING ADHESIVE FIL...

RESIST UNDERLAYER FILM MATERIAL, PATTERNING PROCESS, AND METHOD FOR...

METHOD FOR PURIFYING AN AMINO ACID-N-CARBOXY ANHYDRIDE

METHOD FOR PRODUCING POLYALKYLENE GLYCOL DERIVATIVE HAVING AMINO GR...

METHOD FOR PRODUCING POLYALKYLENE GLYCOL DERIVATIVE HAVING AMINO GR...

SILICON-CONTAINING COMPOUND, URETHANE RESIN, STRETCHABLE FILM AND M...

SILICON-CONTAINING COMPOUND, URETHANE RESIN, STRETCHABLE FILM, AND...

SILICON-CONTAINING COMPOUND, URETHANE RESIN, STRETCHABLE FILM, AND...

METHODS OF PREPARING AND PURIFYING POLYALKYLENE GLYCOL DERIVATIVE

METHOD FOR PRODUCING POLYALKYLENE GLYCOL DERIVATIVE HAVING AMINO GR...

METHOD FOR PRODUCING POLYALKYLENE GLYCOL DERIVATIVE HAVING AMINO GR...

METHOD FOR PRODUCING POLYALKYLENE GLYCOL DERIVATIVE HAVING AMINO GR...

METHOD FOR PRODUCING POLYALKYLENE GLYCOL DERIVATIVE WITH NARROW MOL...

METHOD FOR PRODUCING POLYALKYLENE GLYCOL DERIVATIVE HAVING AMINO GR...

FLUORINATED ESTER MONOMER, MAKING METHOD, FLUORINATED ESTER POLYMER...

FLUORINATED MONOMER OF CYCLIC ACETAL STRUCTURE, POLYMER, RESIST PRO...

RESIST PROTECTIVE FILM-FORMING COMPOSITION AND PATTERNING PROCESS

PATTERNING PROCESS AND RESIST COMPOSITION

RESIST PROTECTIVE FILM MATERIAL AND PATTERN FORMATION METHOD

RESIST COMPOSITION AND PATTERNING PROCESS USING THE SAME

RESIST COMPOSITION AND PATTERNING PROCESS

FLUORINATED ESTER MONOMER, MAKING METHOD, FLUORINATED ESTER POLYMER...

RESIST TOP COAT COMPOSITION AND PATTERNING PROCESS

POLYMER, RESIST COMPOSITION, AND PATTERNING PROCESS

FLUORINATED MONOMER, FLUORINATED POLYMER, RESIST COMPOSITION, AND P...

RESIST COMPOSITION AND PATTERNING PROCESS

RESIST COMPOSITION AND PATTERNING PROCESS

RESIST PROTECTIVE COATING COMPOSITON AND PATTERNING PROCESS