Yuji Maeda

Person

Inba-gun, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Silicon nitride film with stress control
- Patent number 7,488,690
- Issue date Feb 10, 2009
- Applied Materials, Inc.
- R. Suryanarayanan Iyer
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for silicon based dielectric chemical vapor deposition
- Patent number 7,473,655
- Issue date Jan 6, 2009
- Applied Materials, Inc.
- Yaxin Wang
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method of fabricating a silicon nitride stack
- Patent number 7,465,669
- Issue date Dec 16, 2008
- Applied Materials, Inc.
- R. Suryanarayanan Iyer
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Semiconductor-manufacturing apparatus
- Patent number 7,393,417
- Issue date Jul 1, 2008
- Applied Materials, Inc.
- Yuji Maeda
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Methods for forming silicon comprising films using hexachlorodisila...
- Patent number 6,884,464
- Issue date Apr 26, 2005
- Applied Materials, Inc.
- Lee Luo
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method and system for forming film, semiconductor device and fabric...
- Patent number 6,566,199
- Issue date May 20, 2003
- Applied Materials, Inc.
- Nobuo Tokai
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Chemical vapor deposition process for depositing tungsten
- Patent number 6,156,382
- Issue date Dec 5, 2000
- Applied Materials, Inc.
- Ravi Rajagopalan
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Suppression of tungsten film deposition on a semiconductor wafer be...
- Patent number 5,953,630
- Issue date Sep 14, 1999
- Applied Materials, Inc.
- Yuji Maeda
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

Patents Applicationslast 30 patents

Information Patent Application
METHOD FOR SILICON BASED DIELECTRIC CHEMICAL VAPOR DEPOSITION
- Publication number 20090111284
- Publication date Apr 30, 2009
- Yaxin Wang
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
LOW THERMAL BUDGET CHEMICAL VAPOR DEPOSITION PROCESSING
- Publication number 20080119059
- Publication date May 22, 2008
- Jacob W. Smith
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Method of fabricating a silicon nitride stack
- Publication number 20070111538
- Publication date May 17, 2007
- APPLIED MATERIALS, INC.
- R. Suryanarayanan Iyer
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Method for silicon based dielectric chemical vapor deposition
- Publication number 20060286818
- Publication date Dec 21, 2006
- Yaxin Wang
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Silicon nitride film with stress control
- Publication number 20060009041
- Publication date Jan 12, 2006
- R. Suryanarayanan Iyer
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Methods for forming silicon comprising films using hexachlorodisila...
- Publication number 20040086640
- Publication date May 6, 2004
- APPLIED MATERIALS, INC.
- Lee Luo
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Method and system for forming film, semiconductor device and fabric...
- Publication number 20020014700
- Publication date Feb 7, 2002
- Nobuo Tokai
- H01 - BASIC ELECTRIC ELEMENTS

Person

Patents Grantslast 30 patents

Silicon nitride film with stress control

Method for silicon based dielectric chemical vapor deposition

Method of fabricating a silicon nitride stack

Semiconductor-manufacturing apparatus

Methods for forming silicon comprising films using hexachlorodisila...

Method and system for forming film, semiconductor device and fabric...

Chemical vapor deposition process for depositing tungsten

Suppression of tungsten film deposition on a semiconductor wafer be...

Patents Applicationslast 30 patents

METHOD FOR SILICON BASED DIELECTRIC CHEMICAL VAPOR DEPOSITION

LOW THERMAL BUDGET CHEMICAL VAPOR DEPOSITION PROCESSING

Method of fabricating a silicon nitride stack

Method for silicon based dielectric chemical vapor deposition

Silicon nitride film with stress control

Methods for forming silicon comprising films using hexachlorodisila...

Method and system for forming film, semiconductor device and fabric...