Yuji Matsuyama

Person

Kikuchi-Gun, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Method and apparatus for heat processing of substrate
- Patent number 7,517,217
- Issue date Apr 14, 2009
- Tokyo Electron Limited
- Masatoshi Deguchi
- B05 - SPRAYING OR ATOMISING IN GENERAL APPLYING LIQUIDS OR OTHER FLUENT MATER...
Information Patent Grant
Substrate processing apparatus and substrate processing method
- Patent number 7,208,066
- Issue date Apr 24, 2007
- Tokyo Electron Limited
- Junichi Kitano
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate coating unit and substrate coating method
- Patent number 7,022,190
- Issue date Apr 4, 2006
- Tokyo Electron Limited
- Yuji Matsuyama
- B05 - SPRAYING OR ATOMISING IN GENERAL APPLYING LIQUIDS OR OTHER FLUENT MATER...
Information Patent Grant
Heat treatment method, heat treatment apparatus and treatment system
- Patent number 6,979,474
- Issue date Dec 27, 2005
- Tokyo Electron Limited
- Yuji Matsuyama
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for heat processing of substrate
- Patent number 6,969,538
- Issue date Nov 29, 2005
- Tokyo Electron Limited
- Masatoshi Deguchi
- B05 - SPRAYING OR ATOMISING IN GENERAL APPLYING LIQUIDS OR OTHER FLUENT MATER...
Information Patent Grant
Method and system for coating and developing
- Patent number 6,884,298
- Issue date Apr 26, 2005
- Tokyo Electron Limited
- Junichi Kitano
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method and system for coating and developing
- Patent number 6,875,281
- Issue date Apr 5, 2005
- Tokyo Electron Limited
- Junichi Kitano
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate processing apparatus and substrate processing method
- Patent number 6,672,779
- Issue date Jan 6, 2004
- Tokyo Electron Limited
- Issei Ueda
- G08 - SIGNALLING
Information Patent Grant
Substrate treatment system, substrate transfer system, and substrat...
- Patent number 6,655,891
- Issue date Dec 2, 2003
- Tokyo Electron Limited
- Issei Ueda
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate processing apparatus and substrate processing method
- Patent number 6,632,281
- Issue date Oct 14, 2003
- Tokyo Electron Limited
- Junichi Kitano
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate processing apparatus and substrate processing method
- Patent number 6,633,022
- Issue date Oct 14, 2003
- Tokyo Electron Limited
- Takahiro Kitano
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Coating apparatus and mixing apparatus
- Patent number 6,620,248
- Issue date Sep 16, 2003
- Toyko Electron Limited
- Takahiro Kitano
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Solution processing apparatus
- Patent number 6,602,382
- Issue date Aug 5, 2003
- Tokyo Electron Limited
- Yuji Matsuyama
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
System and method for coating and developing
- Patent number 6,585,430
- Issue date Jul 1, 2003
- Tokyo Electron Limited
- Yuji Matsuyama
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Solution processing apparatus and method
- Patent number 6,533,864
- Issue date Mar 18, 2003
- Tokyo Electron Limited
- Yuji Matsuyama
- B05 - SPRAYING OR ATOMISING IN GENERAL APPLYING LIQUIDS OR OTHER FLUENT MATER...
Information Patent Grant
Method and system for coating and developing
- Patent number 6,518,199
- Issue date Feb 11, 2003
- Tokyo Electron Limited
- Junichi Kitano
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Solution processing apparatus and method
- Patent number 6,514,570
- Issue date Feb 4, 2003
- Tokyo Electron Limited
- Yuji Matsuyama
- B05 - SPRAYING OR ATOMISING IN GENERAL APPLYING LIQUIDS OR OTHER FLUENT MATER...
Information Patent Grant
Resist pattern forming method and film forming method
- Patent number 6,485,893
- Issue date Nov 26, 2002
- Tokyo Electron Limited
- Yuji Matsuyama
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Substrate processing apparatus and substrate processing method
- Patent number 6,471,422
- Issue date Oct 29, 2002
- Tokyo Electron Limited
- Issei Ueda
- G07 - CHECKING-DEVICES
Information Patent Grant
Coating and developing system
- Patent number 6,467,976
- Issue date Oct 22, 2002
- Tokyo Electron Limited
- Yuji Matsuyama
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate treatment system, substrate transfer system, and substrat...
- Patent number 6,425,722
- Issue date Jul 30, 2002
- Tokyo Electron Limited
- Issei Ueda
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Filter unit and solution treatment unit
- Patent number 6,402,821
- Issue date Jun 11, 2002
- Tokyo Electron Limited
- Yuji Matsuyama
- B01 - PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
Information Patent Grant
Substrate processing apparatus and substrate processing method
- Patent number 6,402,401
- Issue date Jun 11, 2002
- Tokyo Electron Limited
- Issei Ueda
- G07 - CHECKING-DEVICES
Information Patent Grant
Developing method and developing unit
- Patent number 6,384,894
- Issue date May 7, 2002
- Tokyo Electron Limited
- Yuji Matsuyama
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Solution processing apparatus
- Patent number 6,364,547
- Issue date Apr 2, 2002
- Tokyo Electron Limited
- Yuji Matsuyama
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Substrate processing apparatus and method
- Patent number 6,332,723
- Issue date Dec 25, 2001
- Tokyo Electron Limited
- Yuji Matsuyama
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Developing apparatus and method thereof
- Patent number 6,312,171
- Issue date Nov 6, 2001
- Tokyo Electron Limited
- Yuji Matsuyama
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Substrate process apparatus
- Patent number 6,292,250
- Issue date Sep 18, 2001
- Tokyo Electron Limited
- Yuji Matsuyama
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Substrate processing apparatus
- Patent number 6,287,025
- Issue date Sep 11, 2001
- Tokyo Electron Limited
- Yuji Matsuyama
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Heat treatment method, heat treatment apparatus and treatment system
- Patent number 6,261,365
- Issue date Jul 17, 2001
- Tokyo Electron Limited
- Yuji Matsuyama
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD
- Publication number 20070127916
- Publication date Jun 7, 2007
- TOKYO ELECTRON LIMITED
- Junichi Kitano
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD
- Publication number 20070128356
- Publication date Jun 7, 2007
- TOKYO ELECTRON LIMITED
- Yuji Matsuyama
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Substrate coating unit and substrate coating method
- Publication number 20060127575
- Publication date Jun 15, 2006
- TOKYO ELECTRON LIMITED
- Yuji Matsuyama
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method and apparatus for heat processing of substrate
- Publication number 20060005420
- Publication date Jan 12, 2006
- TOKYO ELECTRON LIMITED
- Masatoshi Deguchi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method and system for coating and developing
- Publication number 20050048421
- Publication date Mar 3, 2005
- TOKYO ELECTRON LIMITED
- Junichi Kitano
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Substrate processing apparatus and substrate processing method
- Publication number 20040050321
- Publication date Mar 18, 2004
- TOKYO ELECTRON LIMITED
- Junichi Kitano
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Substrate processing apparatus and substrate processing method
- Publication number 20030205196
- Publication date Nov 6, 2003
- TOKYO ELECTRON LIMITED
- Takahiro Kitano
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Method and system for coating and developing
- Publication number 20030119333
- Publication date Jun 26, 2003
- TOKYO ELECTRON LIMITED
- Junichi Kitano
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Method and system for coating and developing
- Publication number 20030079687
- Publication date May 1, 2003
- TOKYO ELECTRON LIMITED
- Junichi Kitano
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Substrate processing apparatus and substrate processing method
- Publication number 20030012575
- Publication date Jan 16, 2003
- Issei Ueda
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Substrate coating unit and substrate coating method
- Publication number 20020176936
- Publication date Nov 28, 2002
- TOKYO ELECTRON LIMITED
- Yuji Matsuyama
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
COATING AND DEVELOPING SYSTEM
- Publication number 20020127879
- Publication date Sep 12, 2002
- TOKYO ELECTRON LIMITED
- Yuji Matsuyama
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method and system for coating and developing
- Publication number 20020127340
- Publication date Sep 12, 2002
- TOKYO ELECTRON LIMITED
- Junichi Kitano
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Substrate processing apparatus and substrate processing method
- Publication number 20020118973
- Publication date Aug 29, 2002
- Issei Ueda
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Substrate treatment system, substrate transfer system, and substrat...
- Publication number 20020106268
- Publication date Aug 8, 2002
- Issei Ueda
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method and apparatus for heat processing of substrate
- Publication number 20020034714
- Publication date Mar 21, 2002
- Masatoshi Deguchi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method and system for coating and developing
- Publication number 20020006737
- Publication date Jan 17, 2002
- TOKYO ELECTRON LIMITED
- Junichi Kitano
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
System and method for coating and developing
- Publication number 20020001679
- Publication date Jan 3, 2002
- TOKYO ELECTRON LIMITED
- Yuji Matsuyama
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Coating apparatus and mixing apparatus
- Publication number 20020000193
- Publication date Jan 3, 2002
- TOKYO ELECTRON LIMITED
- Takahiro Kitano
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Film forming method and film forming apparatus
- Publication number 20010033895
- Publication date Oct 25, 2001
- TOKYO ELECTRON LIMITED
- Tomohide Minami
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Heat treatment method, heat treatment apparatus and treatment system
- Publication number 20010029890
- Publication date Oct 18, 2001
- TOKYO ELECTRON LIMITED
- Yuji Matsuyama
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Substrate processing apparatus and substrate processing method
- Publication number 20010025431
- Publication date Oct 4, 2001
- TOKYO ELECTRON LIMITED
- Takahiro Kitano
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Substrate processing apparatus and substrate processing method
- Publication number 20010013161
- Publication date Aug 16, 2001
- TOKYO ELECTRON LIMITED
- Junichi Kitano
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Developing method and developing unit
- Publication number 20010009452
- Publication date Jul 26, 2001
- TOKYO ELECTRON LIMITED
- Yuji Matsuyama
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Yuji Matsuyama

Person

Patents Grantslast 30 patents

Method and apparatus for heat processing of substrate

Substrate processing apparatus and substrate processing method

Substrate coating unit and substrate coating method

Heat treatment method, heat treatment apparatus and treatment system

Method for heat processing of substrate

Method and system for coating and developing

Method and system for coating and developing

Substrate processing apparatus and substrate processing method

Substrate treatment system, substrate transfer system, and substrat...

Substrate processing apparatus and substrate processing method

Substrate processing apparatus and substrate processing method

Coating apparatus and mixing apparatus

Solution processing apparatus

System and method for coating and developing

Solution processing apparatus and method

Method and system for coating and developing

Solution processing apparatus and method

Resist pattern forming method and film forming method

Substrate processing apparatus and substrate processing method

Coating and developing system

Substrate treatment system, substrate transfer system, and substrat...

Filter unit and solution treatment unit

Substrate processing apparatus and substrate processing method

Developing method and developing unit

Solution processing apparatus

Substrate processing apparatus and method

Developing apparatus and method thereof

Substrate process apparatus

Substrate processing apparatus

Heat treatment method, heat treatment apparatus and treatment system

Patents Applicationslast 30 patents

SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD

SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD

Substrate coating unit and substrate coating method

Method and apparatus for heat processing of substrate

Method and system for coating and developing

Substrate processing apparatus and substrate processing method

Substrate processing apparatus and substrate processing method

Method and system for coating and developing

Method and system for coating and developing

Substrate processing apparatus and substrate processing method

Substrate coating unit and substrate coating method

COATING AND DEVELOPING SYSTEM

Method and system for coating and developing

Substrate processing apparatus and substrate processing method

Substrate treatment system, substrate transfer system, and substrat...

Method and apparatus for heat processing of substrate

Method and system for coating and developing

System and method for coating and developing

Coating apparatus and mixing apparatus

Film forming method and film forming apparatus

Heat treatment method, heat treatment apparatus and treatment system

Substrate processing apparatus and substrate processing method

Substrate processing apparatus and substrate processing method

Developing method and developing unit