Yuji SESHIMO

Person

Nirasaki City, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Film deposition apparatus and film deposition method
- Patent number 11,905,595
- Issue date Feb 20, 2024
- Tokyo Electron Limited
- Hitoshi Kato
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method of manufacturing semiconductor device and method of forming...
- Patent number 10,734,221
- Issue date Aug 4, 2020
- Tokyo Electron Limited
- Taiki Kato
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
GAS MANAGEMENT METHOD AND SUBSTRATE PROCESSING SYSTEM
- Publication number 20230096797
- Publication date Mar 30, 2023
- TOKYO ELECTRON LIMITED
- Koji SASAKI
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SUBSTRATE PROCESSING METHOD AND SUBSTRATE PROCESSING APPARATUS
- Publication number 20230081958
- Publication date Mar 16, 2023
- TOKYO ELECTRON LIMITED
- Koji SASAKI
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHOD FOR DEPOSITING FILM AND FILM DEPOSITION SYSTEM
- Publication number 20220223408
- Publication date Jul 14, 2022
- TOKYO ELECTRON LIMITED
- Hitoshi KATO
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
FILM DEPOSITION APPARATUS AND FILM DEPOSITION METHOD
- Publication number 20210246550
- Publication date Aug 12, 2021
- TOKYO ELECTRON LIMITED
- Hitoshi KATO
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE AND METHOD OF FORMING...
- Publication number 20190013195
- Publication date Jan 10, 2019
- TOKYO ELECTRON LIMITED
- Taiki KATO
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SUBSTRATE PROCESSING APPARATUS, SUBSTRATE PROCESSING METHOD, AND SU...
- Publication number 20180182652
- Publication date Jun 28, 2018
- TOKYO ELECTRON LIMITED
- Yuji SESHIMO
- G05 - CONTROLLING REGULATING

Yuji SESHIMO

Person

Patents Grantslast 30 patents

Film deposition apparatus and film deposition method

Method of manufacturing semiconductor device and method of forming...

Patents Applicationslast 30 patents

GAS MANAGEMENT METHOD AND SUBSTRATE PROCESSING SYSTEM

SUBSTRATE PROCESSING METHOD AND SUBSTRATE PROCESSING APPARATUS

METHOD FOR DEPOSITING FILM AND FILM DEPOSITION SYSTEM

FILM DEPOSITION APPARATUS AND FILM DEPOSITION METHOD

METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE AND METHOD OF FORMING...

SUBSTRATE PROCESSING APPARATUS, SUBSTRATE PROCESSING METHOD, AND SU...