Yuji Yada

Person

Yokkaichi, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Resist pattern-forming method, substrate-processing method, and pho...
- Patent number 9,817,311
- Issue date Nov 14, 2017
- JSR Corporation
- Yuichiro Katsura
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Resist pattern-forming method, substrate-processing method, and pho...
- Patent number 9,417,527
- Issue date Aug 16, 2016
- JSR Corporation
- Yuichiro Katsura
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Radiation-sensitive composition
- Patent number 9,140,984
- Issue date Sep 22, 2015
- JSR Corporation
- Yuji Yada
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Radiation-sensitive resin composition
- Patent number 7,202,016
- Issue date Apr 10, 2007
- JSR Corporation
- Masaaki Miyaji
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Radiation-sensitive resin composition
- Patent number 6,933,094
- Issue date Aug 23, 2005
- JSR Corporation
- Masaaki Miyaji
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC

Patents Applicationslast 30 patents

Information Patent Application
RESIST PATTERN-FORMING METHOD, SUBSTRATE-PROCESSING METHOD, AND PHO...
- Publication number 20160266489
- Publication date Sep 15, 2016
- JSR Corporation
- Yuichiro KATSURA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RESIST PATTERN-FORMING METHOD, SUBSTRATE-PROCESSING METHOD, AND PHO...
- Publication number 20150048051
- Publication date Feb 19, 2015
- JSR Corporation
- Yuichiro KATSURA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RADIATION-SENSITIVE COMPOSITION
- Publication number 20130108965
- Publication date May 2, 2013
- JSR CORPORATION
- Masayuki MIYAKE
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
RADIATION-SENSITIVE COMPOSITION
- Publication number 20120282550
- Publication date Nov 8, 2012
- JSR Corportion
- Yuji YADA
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
RESIST PATTERN COATING AGENT AND RESIST PATTERN FORMING METHOD USIN...
- Publication number 20110223544
- Publication date Sep 15, 2011
- JSR Corporation
- Yuji YADA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Radiation-sensitive resin composition
- Publication number 20050214680
- Publication date Sep 29, 2005
- Masaaki Miyaji
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Radiation-sensitive resin composition
- Publication number 20020058201
- Publication date May 16, 2002
- Masaaki Miyaji
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC

Person

Patents Grantslast 30 patents

Resist pattern-forming method, substrate-processing method, and pho...

Resist pattern-forming method, substrate-processing method, and pho...

Radiation-sensitive composition

Radiation-sensitive resin composition

Radiation-sensitive resin composition

Patents Applicationslast 30 patents

RESIST PATTERN-FORMING METHOD, SUBSTRATE-PROCESSING METHOD, AND PHO...

RESIST PATTERN-FORMING METHOD, SUBSTRATE-PROCESSING METHOD, AND PHO...

RADIATION-SENSITIVE COMPOSITION

RADIATION-SENSITIVE COMPOSITION

RESIST PATTERN COATING AGENT AND RESIST PATTERN FORMING METHOD USIN...

Radiation-sensitive resin composition

Radiation-sensitive resin composition