Yuki SUZUKI

Person

Osaka-shi, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Sizing agent composition, method for producing carbon fibers, and c...
- Patent number 11,692,302
- Issue date Jul 4, 2023
- Teijin Limited
- Takuya Murakami
- D06 - TREATMENT OF TEXTILES OR THE LIKE LAUNDERING FLEXIBLE MATERIALS NOT OTH...
Information Patent Grant
Resist composition
- Patent number 10,571,805
- Issue date Feb 25, 2020
- Sumitomo Chemical Company, Limited
- Yuki Suzuki
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Resist composition
- Patent number 10,520,812
- Issue date Dec 31, 2019
- Sumitomo Chemical Company, Limited
- Yuki Suzuki
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Resin, resist composition and method for producing resist pattern
- Patent number 9,983,478
- Issue date May 29, 2018
- Sumitomo Chemical Company, Limited
- Masahiko Shimada
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Compound, resin, resist composition and method for producing resist...
- Patent number 9,971,241
- Issue date May 15, 2018
- Sumitomo Chemical Company, Limited
- Tatsuro Masuyama
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Resin, resist composition and method for producing resist pattern
- Patent number 9,869,929
- Issue date Jan 16, 2018
- Sumitomo Chemical Company, Limited
- Tatsuro Masuyama
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Resin, resist composition and method for producing resist pattern
- Patent number 9,671,691
- Issue date Jun 6, 2017
- Sumitomo Chemical Company, Limited
- Masahiko Shimada
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Compound, resin and photoresist composition
- Patent number 9,644,056
- Issue date May 9, 2017
- Sumitomo Chemical Company, Limited
- Tatsuro Masuyama
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Resin, resist composition and method for producing resist pattern
- Patent number 9,405,191
- Issue date Aug 2, 2016
- Sumitomo Chemical Company, Limited
- Masahiko Shimada
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Resist composition and method for producing resist pattern
- Patent number 8,741,543
- Issue date Jun 3, 2014
- Sumitomo Chemical Company, Limited
- Koji Ichikawa
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Salt, photoresist composition and process for producing photoresist...
- Patent number 8,685,617
- Issue date Apr 1, 2014
- Sumitomo Chemical Company, Limited
- Koji Ichikawa
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Resist composition and method for producing resist pattern
- Patent number 8,592,132
- Issue date Nov 26, 2013
- Sumitomo Chemical Company, Limited
- Koji Ichikawa
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Method for producing ε-caprolactam and method for producing pentasi...
- Patent number 8,212,028
- Issue date Jul 3, 2012
- Sumitomo Chemical Company, Limited
- Tatsuya Okubo
- C07 - ORGANIC CHEMISTRY

Patents Applicationslast 30 patents

Information Patent Application
COMPOSITION CONTAINING FLUORINE-CONTAINING MONOMER, METHOD FOR STAB...
- Publication number 20240391893
- Publication date Nov 28, 2024
- DAIKIN INDUSTRIES, LTD.
- Daichi Mari
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
FLUORINE-CONTAINING COMPOSITION AND PRODUCTION METHOD THEREFOR
- Publication number 20240301194
- Publication date Sep 12, 2024
- DAIKIN INDUSTRIES., LTD.
- Yuki SUZUKI
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
SIZING AGENT COMPOSITION, METHOD FOR PRODUCING CARBON FIBERS, AND C...
- Publication number 20210071356
- Publication date Mar 11, 2021
- TEIJIN LIMITED
- Takuya MURAKAMI
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
RESIST COMPOSITION
- Publication number 20160377978
- Publication date Dec 29, 2016
- Sumitomo Chemical Company, Limited
- Yuki SUZUKI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
COMPOUND, RESIN AND PHOTORESIST COMPOSITION
- Publication number 20160237190
- Publication date Aug 18, 2016
- Sumitomo Chemical Company, Limited
- Tatsuro MASUYAMA
- C07 - ORGANIC CHEMISTRY
Information Patent Application
COMPOUND, RESIN, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST...
- Publication number 20160139508
- Publication date May 19, 2016
- Sumitomo Chemical Company, Limited
- Tatsuro MASUYAMA
- C07 - ORGANIC CHEMISTRY
Information Patent Application
RESIN, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN
- Publication number 20160077429
- Publication date Mar 17, 2016
- Sumitomo Chemical Company, Limited
- Tatsuro MASUYAMA
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
RESIN, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN
- Publication number 20160075806
- Publication date Mar 17, 2016
- Sumitomo Chemical Company, Limited
- Masahiko SHIMADA
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
RESIN, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN
- Publication number 20160077433
- Publication date Mar 17, 2016
- Sumitomo Chemical Company, Limited
- Masahiko SHIMADA
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
RESIN, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN
- Publication number 20160077432
- Publication date Mar 17, 2016
- Sumitomo Chemical Company, Limited
- Masahiko SHIMADA
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN
- Publication number 20130022928
- Publication date Jan 24, 2013
- Sumitomo Chemical Company, Limited
- Koji ICHIKAWA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN
- Publication number 20120219912
- Publication date Aug 30, 2012
- Sumitomo Chemical Company, Limited
- Koji ICHIKAWA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
SALT, PHOTORESIST COMPOSITION AND PROCESS FOR PRODUCING PHOTORESIST...
- Publication number 20120164579
- Publication date Jun 28, 2012
- Sumitomo Chemical Company, Limited
- Koji ICHIKAWA
- C07 - ORGANIC CHEMISTRY
Information Patent Application
METHOD FOR PRODUCING epsilon-CAPROLACTAM AND METHOD FOR PRODUCING P...
- Publication number 20100105893
- Publication date Apr 29, 2010
- Sumitomo Chemical Company, Limited
- Tatsuya OKUBO
- C07 - ORGANIC CHEMISTRY

Yuki SUZUKI

Person

Patents Grantslast 30 patents

Sizing agent composition, method for producing carbon fibers, and c...

Resist composition

Resist composition

Resin, resist composition and method for producing resist pattern

Compound, resin, resist composition and method for producing resist...

Resin, resist composition and method for producing resist pattern

Resin, resist composition and method for producing resist pattern

Compound, resin and photoresist composition

Resin, resist composition and method for producing resist pattern

Resist composition and method for producing resist pattern

Salt, photoresist composition and process for producing photoresist...

Resist composition and method for producing resist pattern

Method for producing ε-caprolactam and method for producing pentasi...

Patents Applicationslast 30 patents

COMPOSITION CONTAINING FLUORINE-CONTAINING MONOMER, METHOD FOR STAB...

FLUORINE-CONTAINING COMPOSITION AND PRODUCTION METHOD THEREFOR

SIZING AGENT COMPOSITION, METHOD FOR PRODUCING CARBON FIBERS, AND C...

RESIST COMPOSITION

COMPOUND, RESIN AND PHOTORESIST COMPOSITION

COMPOUND, RESIN, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST...

RESIN, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN

RESIN, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN

RESIN, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN

RESIN, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN

RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN

RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN

SALT, PHOTORESIST COMPOSITION AND PROCESS FOR PRODUCING PHOTORESIST...

METHOD FOR PRODUCING epsilon-CAPROLACTAM AND METHOD FOR PRODUCING P...