Yukiharu Okubo

Person

Kumagaya-shi, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Reticle protection member, reticle carrying device, exposure device...
- Patent number 8,921,812
- Issue date Dec 30, 2014
- Nikon Corporation
- Motoko Suzuki
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Reticle protection member, reticle carrying device, exposure device...
- Patent number 8,168,959
- Issue date May 1, 2012
- Nikon Corporation
- Motoko Suzuki
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Reticle protection member, reticle carrying device, exposure device...
- Patent number 7,453,549
- Issue date Nov 18, 2008
- Nikon Corporation
- Motoko Suzuki
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Electron beam apparatus and device production method using the elec...
- Patent number 7,439,502
- Issue date Oct 21, 2008
- Ebara Corporation
- Mamoru Nakasuji
- G01 - MEASURING TESTING
Information Patent Grant
Electron beam apparatus and device fabrication method using the ele...
- Patent number 7,244,932
- Issue date Jul 17, 2007
- Ebara Corporation
- Mamoru Nakasuji
- G01 - MEASURING TESTING
Information Patent Grant
Charged particle beam control element, method of fabricating charge...
- Patent number 6,977,377
- Issue date Dec 20, 2005
- Nikon Corporation
- Yukiharu Okubo
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Scanning device and method including electric charge movement
- Patent number 6,953,944
- Issue date Oct 11, 2005
- Nikon Corporation
- Yoshiaki Kohama
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Reticle-holding pods and methods for holding thin, circular reticle...
- Patent number 6,900,878
- Issue date May 31, 2005
- Nikon Corporation
- Yukiharu Okubo
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Charged particle beam control element, method of fabricating charge...
- Patent number 6,781,123
- Issue date Aug 24, 2004
- Nikon Corporation
- Yukiharu Okubo
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of making a static pressure air bearing
- Patent number 6,735,867
- Issue date May 18, 2004
- Nikon Corporation
- Takuma Tsuda
- B23 - MACHINE TOOLS METAL-WORKING NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Scanning device and scanning method
- Patent number 6,670,602
- Issue date Dec 30, 2003
- Nikon Corporation
- Yoshiaki Kohama
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Stage apparatus including non-containing gas bearings and microlith...
- Patent number 6,583,597
- Issue date Jun 24, 2003
- Nikon Corporation
- Keiichi Tanaka
- F16 - ENGINEERING ELEMENTS AND UNITS GENERAL MEASURES FOR PRODUCING AND MAINT...
Information Patent Grant
Charged particle beam control element, method of fabricating charge...
- Patent number 6,566,658
- Issue date May 20, 2003
- Nikon Corporation
- Yukiharu Okubo
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Static pressure air bearing
- Patent number 6,499,880
- Issue date Dec 31, 2002
- Nikon Corporation
- Takuma Tsuda
- B23 - MACHINE TOOLS METAL-WORKING NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Stage apparatus and inspection apparatus having stage apparatus
- Patent number 6,351,041
- Issue date Feb 26, 2002
- Nikon Corporation
- Yukiharu Okubo
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Static air-bearing and stage apparatus using the bearing and optica...
- Patent number 6,328,473
- Issue date Dec 11, 2001
- Nikon Corporation
- Shinobu Tokushima
- F16 - ENGINEERING ELEMENTS AND UNITS GENERAL MEASURES FOR PRODUCING AND MAINT...
Information Patent Grant
Method of controlling pressure in a chamber, apparatus for the same...
- Patent number 6,267,131
- Issue date Jul 31, 2001
- Nikon Corporation
- Mutsuo Masada
- G05 - CONTROLLING REGULATING
Information Patent Grant
Projection apparatus and method
- Patent number 5,633,755
- Issue date May 27, 1997
- Nikon Corporation
- Yuji Manabe
- H04 - ELECTRIC COMMUNICATION TECHNIQUE

Patents Applicationslast 30 patents

Information Patent Application
RETICLE PROTECTION MEMBER, RETICLE CARRYING DEVICE, EXPOSURE DEVICE...
- Publication number 20120200835
- Publication date Aug 9, 2012
- Motoko Suzuki
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Reticle Protection Member, Reticle Carrying Device, Exposure Device...
- Publication number 20090103061
- Publication date Apr 23, 2009
- NIKON CORPORATION
- Motoko Suzuki
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Electron beam apparatus and device production method using the elec...
- Publication number 20080173815
- Publication date Jul 24, 2008
- EBARA CORPORATION
- Mamoru Nakasuji
- G01 - MEASURING TESTING
Information Patent Application
Electron beam apparatus and device production method using the elec...
- Publication number 20070272859
- Publication date Nov 29, 2007
- EBARA CORPORATION
- Mamoru Nakasuji
- G01 - MEASURING TESTING
Information Patent Application
Reticle protection member, reticle carrying device, exposure device...
- Publication number 20070206173
- Publication date Sep 6, 2007
- Motoko Suzuki
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Charged particle beam control element, method of fabricating charge...
- Publication number 20050006604
- Publication date Jan 13, 2005
- Nikon Corporation
- Yukiharu Okubo
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Scanning device and method including electric charge movement
- Publication number 20040238740
- Publication date Dec 2, 2004
- Nikon Corporation
- Yoshiaki Kohama
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Reticle-holding pods and methods for holding thin, circular reticle...
- Publication number 20040057030
- Publication date Mar 25, 2004
- NIKON CORPORATION
- Yukiharu Okubo
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Charged particle beam control element, method of fabricating charge...
- Publication number 20030205668
- Publication date Nov 6, 2003
- NIKON CORPORATION
- Yukiharu Okubo
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Stage devices exhibiting reduced deformation, and microlithography...
- Publication number 20030178579
- Publication date Sep 25, 2003
- NIKON CORPORATION
- Keiichi Tanaka
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Static pressure air bearing
- Publication number 20020181808
- Publication date Dec 5, 2002
- Nikon Corporation
- Takuma Tsuda
- F16 - ENGINEERING ELEMENTS AND UNITS GENERAL MEASURES FOR PRODUCING AND MAINT...
Information Patent Application
Charged particle beam apparatus
- Publication number 20020158198
- Publication date Oct 31, 2002
- NIKON CORPORATION
- Yoshiaki Kohama
- G01 - MEASURING TESTING
Information Patent Application
Electron beam apparatus and device production method using the elec...
- Publication number 20020148961
- Publication date Oct 17, 2002
- Mamoru Nakasuji
- G01 - MEASURING TESTING
Information Patent Application
Stage devices configured for use in a vacuum environment of a charg...
- Publication number 20020089657
- Publication date Jul 11, 2002
- NIKON CORPORATION
- Yukiharu Okubo
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Charged particle beam apparatus
- Publication number 20020074939
- Publication date Jun 20, 2002
- NIKON CORPORATION
- Yukiharu Okubo
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Stage apparatus including non-containing gas bearings and microlith...
- Publication number 20020070699
- Publication date Jun 13, 2002
- NIKON CORPORATION
- Keiichi Tanaka
- F16 - ENGINEERING ELEMENTS AND UNITS GENERAL MEASURES FOR PRODUCING AND MAINT...
Information Patent Application
Static pressure air bearing
- Publication number 20020034345
- Publication date Mar 21, 2002
- Nikon Corporation
- Takuma Tsuda
- F16 - ENGINEERING ELEMENTS AND UNITS GENERAL MEASURES FOR PRODUCING AND MAINT...
Information Patent Application
Charged-particle-beam microlithography stage including actuators fo...
- Publication number 20020021428
- Publication date Feb 21, 2002
- Katsushi Nakano
- H01 - BASIC ELECTRIC ELEMENTS

Yukiharu Okubo

Person

Patents Grantslast 30 patents

Reticle protection member, reticle carrying device, exposure device...

Reticle protection member, reticle carrying device, exposure device...

Reticle protection member, reticle carrying device, exposure device...

Electron beam apparatus and device production method using the elec...

Electron beam apparatus and device fabrication method using the ele...

Charged particle beam control element, method of fabricating charge...

Scanning device and method including electric charge movement

Reticle-holding pods and methods for holding thin, circular reticle...

Charged particle beam control element, method of fabricating charge...

Method of making a static pressure air bearing

Scanning device and scanning method

Stage apparatus including non-containing gas bearings and microlith...

Charged particle beam control element, method of fabricating charge...

Static pressure air bearing

Stage apparatus and inspection apparatus having stage apparatus

Static air-bearing and stage apparatus using the bearing and optica...

Method of controlling pressure in a chamber, apparatus for the same...

Projection apparatus and method

Patents Applicationslast 30 patents

RETICLE PROTECTION MEMBER, RETICLE CARRYING DEVICE, EXPOSURE DEVICE...

Reticle Protection Member, Reticle Carrying Device, Exposure Device...

Electron beam apparatus and device production method using the elec...

Electron beam apparatus and device production method using the elec...

Reticle protection member, reticle carrying device, exposure device...

Charged particle beam control element, method of fabricating charge...

Scanning device and method including electric charge movement

Reticle-holding pods and methods for holding thin, circular reticle...

Charged particle beam control element, method of fabricating charge...

Stage devices exhibiting reduced deformation, and microlithography...

Static pressure air bearing

Charged particle beam apparatus

Electron beam apparatus and device production method using the elec...

Stage devices configured for use in a vacuum environment of a charg...

Charged particle beam apparatus

Stage apparatus including non-containing gas bearings and microlith...

Static pressure air bearing

Charged-particle-beam microlithography stage including actuators fo...