Yukimasa Saito

Person

Tokyo, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Gas cluster processing device and gas cluster processing method
- Patent number 12,172,198
- Issue date Dec 24, 2024
- Tokyo Electron Limited
- Kazuya Dobashi
- B08 - CLEANING
Information Patent Grant
Substrate cleaning apparatus
- Patent number 11,761,075
- Issue date Sep 19, 2023
- Tokyo Electron Limited
- Yukimasa Saito
- B08 - CLEANING
Information Patent Grant
Gas cluster processing device and gas cluster processing method
- Patent number 11,267,021
- Issue date Mar 8, 2022
- Tokyo Electron Limited
- Kazuya Dobashi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for cleaning chamber of substrate processing apparatus
- Patent number 10,786,837
- Issue date Sep 29, 2020
- Tokyo Electron Limited
- Yukimasa Saito
- B08 - CLEANING
Information Patent Grant
Thermal processing unit
- Patent number 7,479,619
- Issue date Jan 20, 2009
- Tokyo Electron Limited
- Takanori Saito
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Thermal treatment apparatus
- Patent number 7,144,823
- Issue date Dec 5, 2006
- Tokyo Electron Limited
- Takanori Saito
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Heat treatment apparatus
- Patent number 7,044,731
- Issue date May 16, 2006
- Tokyo Electron Limited
- Yukimasa Saito
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Heat treatment device
- Patent number 6,936,108
- Issue date Aug 30, 2005
- Tokyo Electron Limited
- Yukimasa Saito
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Heat treatment apparatus and cleaning method of the same
- Patent number 6,807,971
- Issue date Oct 26, 2004
- Tokyo Electron Ltd.
- Yukimasa Saito
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Members for semiconductor manufacturing apparatus and method for pr...
- Patent number 6,805,968
- Issue date Oct 19, 2004
- Tocalo Co., Ltd.
- Yukimasa Saito
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Thermal processor with gas supply
- Patent number 6,736,636
- Issue date May 18, 2004
- Tokyo Electron Limited
- Yukimasa Saito
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Heat treatment apparatus and cleaning method of the same
- Patent number 6,383,300
- Issue date May 7, 2002
- Tokyo Electron Ltd.
- Yukimasa Saito
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Oxidation treatment method and apparatus
- Patent number 6,171,104
- Issue date Jan 9, 2001
- Tokyo Electron Limited
- Yukimasa Saito
- C30 - CRYSTAL GROWTH
Information Patent Grant
Thermal processing system
- Patent number 6,159,298
- Issue date Dec 12, 2000
- Tokyo Electron Limited
- Yukimasa Saito
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

Patents Applicationslast 30 patents

Information Patent Application
GAS CLUSTER PROCESSING DEVICE AND GAS CLUSTER PROCESSING METHOD
- Publication number 20220143655
- Publication date May 12, 2022
- TOKYO ELECTRON LIMITED
- Kazuya DOBASHI
- B08 - CLEANING
Information Patent Application
Gas Cluster Processing Device and Gas Cluster Processing Method
- Publication number 20210107041
- Publication date Apr 15, 2021
- TOKYO ELECTRON LIMITED
- Kazuya DOBASHI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD FOR CLEANING CHAMBER OF SUBSTRATE PROCESSING APPARATUS
- Publication number 20180369881
- Publication date Dec 27, 2018
- TOKYO ELECTRON LIMITED
- Yukimasa SAITO
- B08 - CLEANING
Information Patent Application
SUBSTRATE CLEANING APPARATUS
- Publication number 20180355465
- Publication date Dec 13, 2018
- TOKYO ELECTRON LIMITED
- Yukimasa SAITO
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Thermal processing unit
- Publication number 20060258170
- Publication date Nov 16, 2006
- Takanori Saito
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Thermal treating apparatus
- Publication number 20050028738
- Publication date Feb 10, 2005
- Takanori Saito
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Heat treatment apparatus
- Publication number 20040175666
- Publication date Sep 9, 2004
- Yukimasa Saito
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Heat-treating device
- Publication number 20040007186
- Publication date Jan 15, 2004
- Yukimasa Saito
- G05 - CONTROLLING REGULATING
Information Patent Application
Members for semiconductor manufacturing apparatus and method for pr...
- Publication number 20020192480
- Publication date Dec 19, 2002
- Tokyo, Electron Co.
- Yukimasa Saito
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Heat treatment apparatus and cleaning method of the same
- Publication number 20020073923
- Publication date Jun 20, 2002
- Yukimasa Saito
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

Yukimasa Saito

Person

Patents Grantslast 30 patents

Gas cluster processing device and gas cluster processing method

Substrate cleaning apparatus

Gas cluster processing device and gas cluster processing method

Method for cleaning chamber of substrate processing apparatus

Thermal processing unit

Thermal treatment apparatus

Heat treatment apparatus

Heat treatment device

Heat treatment apparatus and cleaning method of the same

Members for semiconductor manufacturing apparatus and method for pr...

Thermal processor with gas supply

Heat treatment apparatus and cleaning method of the same

Oxidation treatment method and apparatus

Thermal processing system

Patents Applicationslast 30 patents

GAS CLUSTER PROCESSING DEVICE AND GAS CLUSTER PROCESSING METHOD

Gas Cluster Processing Device and Gas Cluster Processing Method

METHOD FOR CLEANING CHAMBER OF SUBSTRATE PROCESSING APPARATUS

SUBSTRATE CLEANING APPARATUS

Thermal processing unit

Thermal treating apparatus

Heat treatment apparatus

Heat-treating device

Members for semiconductor manufacturing apparatus and method for pr...

Heat treatment apparatus and cleaning method of the same