Yukimasa Yoshida

Person

Yokohama-shi, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Plasma processing method
- Patent number 6,642,149
- Issue date Nov 4, 2003
- Tokyo Electron Limited
- Tomoki Suemasa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor device manufacturing method
- Patent number 6,368,977
- Issue date Apr 9, 2002
- Kabushiki Kaisha Toshiba
- Masaki Narita
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor device manufacturing method using electrostatic chuck...
- Patent number 6,333,246
- Issue date Dec 25, 2001
- Kabushiki Kaisha Toshiba
- Masaki Narita
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Plasma processing apparatus and method
- Patent number 6,274,507
- Issue date Aug 14, 2001
- Kabushiki Kaisha Toshiba
- Masaki Narita
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Magnetron plasma processing apparatus and processing method
- Patent number 5,888,338
- Issue date Mar 30, 1999
- Tokyo Electron Limited
- Hiromi Harada
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Etching method and apparatus
- Patent number 5,766,494
- Issue date Jun 16, 1998
- Kabushiki Kaisha Toshiba
- Haruki Mori
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma process apparatus
- Patent number 5,717,294
- Issue date Feb 10, 1998
- Kabushiki Kaisha Toshiba
- Itsuko Sakai
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Magnetron plasma processing apparatus and processing method
- Patent number 5,660,671
- Issue date Aug 26, 1997
- Tokyo Electron Limited
- Hiromi Harada
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Magnetron plasma processing apparatus and processing method
- Patent number 5,376,211
- Issue date Dec 27, 1994
- Tokyo Electron Limited
- Hiromi Harada
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma etching apparatus
- Patent number 5,320,704
- Issue date Jun 14, 1994
- Tokyo Electron Limited
- Keiji Horioka
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of removing electric charge accumulated on a semiconductor s...
- Patent number 5,286,978
- Issue date Feb 15, 1994
- Kabushiki Kaisha Toshiba
- Yukimasa Yoshida
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Liquid level detecting device and a processing apparatus
- Patent number 5,234,527
- Issue date Aug 10, 1993
- Tokyo Electron Limited
- Toshihisa Nozawa
- B01 - PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
Information Patent Grant
Apparatus for forming reduced pressure and for processing object
- Patent number 5,223,113
- Issue date Jun 29, 1993
- Tokyo Electron Limited
- Satoshi Kaneko
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma etching apparatus and transporting device used in the same
- Patent number 5,211,795
- Issue date May 18, 1993
- Tokyo Electron Limited
- Yukimasa Yoshida
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Pressure-reduced chamber system having a filter means
- Patent number 5,178,638
- Issue date Jan 12, 1993
- Tokyo Electron Limited
- Satoshi Kaneko
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma apparatus, and method and system for extracting electrical s...
- Patent number 5,147,497
- Issue date Sep 15, 1992
- Tokyo Electron Limited
- Toshihisa Nozawa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of forming fine patterns
- Patent number 5,100,508
- Issue date Mar 31, 1992
- Kabushiki Kaisha Toshiba
- Yukimasa Yoshida
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Reactive ion etching method
- Patent number 4,566,941
- Issue date Jan 28, 1986
- Kabushiki Kaisha Toshiba
- Yukimasa Yoshida
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

Patents Applicationslast 30 patents

Information Patent Application
Plasma processing method
- Publication number 20030054647
- Publication date Mar 20, 2003
- Tomoki Suemasa
- H01 - BASIC ELECTRIC ELEMENTS

Yukimasa Yoshida

Person

Patents Grantslast 30 patents

Plasma processing method

Semiconductor device manufacturing method

Semiconductor device manufacturing method using electrostatic chuck...

Plasma processing apparatus and method

Magnetron plasma processing apparatus and processing method

Etching method and apparatus

Plasma process apparatus

Magnetron plasma processing apparatus and processing method

Magnetron plasma processing apparatus and processing method

Plasma etching apparatus

Method of removing electric charge accumulated on a semiconductor s...

Liquid level detecting device and a processing apparatus

Apparatus for forming reduced pressure and for processing object

Plasma etching apparatus and transporting device used in the same

Pressure-reduced chamber system having a filter means

Plasma apparatus, and method and system for extracting electrical s...

Method of forming fine patterns

Reactive ion etching method

Patents Applicationslast 30 patents

Plasma processing method