Yukio INAZUKI

Person

Jyoetsu, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Reflective mask blank, method of manufacturing thereof, and reflect...
- Patent number 12,050,396
- Issue date Jul 30, 2024
- Shin-Etsu Chemical Co., Ltd.
- Takuro Kosaka
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Substrate with multilayer reflection film for EUV mask blank, manuf...
- Patent number 11,860,529
- Issue date Jan 2, 2024
- Shin-Etsu Chemical Co., Ltd.
- Yukio Inazuki
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Substrate with multilayer reflection film for EUV mask blank, manuf...
- Patent number 11,835,851
- Issue date Dec 5, 2023
- Shin-Etsu Chemical Co., Ltd.
- Yukio Inazuki
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method of manufacturing reflective mask blank, and reflective mask...
- Patent number 11,789,357
- Issue date Oct 17, 2023
- Shin-Etsu Chemical Co., Ltd.
- Yukio Inazuki
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Substrate defect inspection method and substrate defect inspection...
- Patent number 11,624,712
- Issue date Apr 11, 2023
- Shin-Etsu Chemical Co., Ltd.
- Tsuneo Terasawa
- G01 - MEASURING TESTING
Information Patent Grant
Method of manufacturing reflective mask blank, reflective mask blan...
- Patent number 11,415,874
- Issue date Aug 16, 2022
- Shin-Etsu Chemical Co., Ltd.
- Tsuneo Terasawa
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photomask blank and method for preparing photomask
- Patent number 11,327,393
- Issue date May 10, 2022
- Shin-Etsu Chemical Co., Ltd.
- Takuro Kosaka
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Photomask blank, method of manufacturing photomask, and photomask
- Patent number 11,143,949
- Issue date Oct 12, 2021
- Shin-Etsu Chemical Co., Ltd.
- Yukio Inazuki
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Photomask blank, and method of manufacturing photomask
- Patent number 11,131,920
- Issue date Sep 28, 2021
- Shin-Etsu Chemical Co., Ltd.
- Yukio Inazuki
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Halftone phase shift mask blank and halftone phase shift mask
- Patent number 10,989,999
- Issue date Apr 27, 2021
- Shin-Etsu Chemical Co., Ltd.
- Yukio Inazuki
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Halftone phase shift photomask blank, making method, and halftone p...
- Patent number 10,859,904
- Issue date Dec 8, 2020
- Shin-Etsu Chemical Co., Ltd.
- Takuro Kosaka
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method for preparing halftone phase shift mask blank, halftone phas...
- Patent number 10,809,611
- Issue date Oct 20, 2020
- Shin-Etsu Chemical Co., Ltd.
- Yukio Inazuki
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Photomask blank and method for producing photomask
- Patent number 10,788,747
- Issue date Sep 29, 2020
- Shin-Etsu Chemical Co., Ltd.
- Yukio Inazuki
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photomask blank and photomask
- Patent number 10,782,609
- Issue date Sep 22, 2020
- Shin-Etsu Chemical Co., Ltd.
- Ryoken Ozawa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for preparing photomask blank, photomask blank, method for p...
- Patent number 10,782,608
- Issue date Sep 22, 2020
- Shin-Etsu Chemical Co., Ltd.
- Yukio Inazuki
- C22 - METALLURGY FERROUS OR NON-FERROUS ALLOYS TREATMENT OF ALLOYS OR NON-FER...
Information Patent Grant
Halftone phase shift photomask blank
- Patent number 10,747,098
- Issue date Aug 18, 2020
- Shin-Etsu Chemical Co., Ltd.
- Yukio Inazuki
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photomask blank
- Patent number 10,712,654
- Issue date Jul 14, 2020
- Shin-Etsu Chemical Co., Ltd.
- Souichi Fukaya
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photomask blank and method for preparing photomask
- Patent number 10,678,125
- Issue date Jun 9, 2020
- Shin-Etsu Chemical Co., Ltd.
- Takuro Kosaka
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Halftone phase shift photomask blank, making method, and halftone p...
- Patent number 10,670,957
- Issue date Jun 2, 2020
- Shin-Etsu Chemical Co., Ltd.
- Takuro Kosaka
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Photomask blank, and preparation method thereof
- Patent number 10,656,516
- Issue date May 19, 2020
- Shin-Etsu Chemical Co., Ltd.
- Takuro Kosaka
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photomask blank, method for manufacturing photomask, and mask patte...
- Patent number 10,585,345
- Issue date Mar 10, 2020
- Shin-Etsu Chemical Co., Ltd.
- Shigeo Irie
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photomask blank, and preparation method thereof
- Patent number 10,564,537
- Issue date Feb 18, 2020
- Shin-Etsu Chemical Co., Ltd.
- Takuro Kosaka
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Phase shift mask blank, phase shift mask, and blank preparing method
- Patent number 10,545,401
- Issue date Jan 28, 2020
- Shin-Etsu Chemical Co., Ltd.
- Yukio Inazuki
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Mask blank and making method
- Patent number 10,488,750
- Issue date Nov 26, 2019
- Shin-Etsu Chemical Co., Ltd.
- Yukio Inazuki
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Halftone phase shift mask blank and halftone phase shift mask
- Patent number 10,466,583
- Issue date Nov 5, 2019
- Shin-Etsu Chemical Co., Ltd.
- Yukio Inazuki
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method for preparing halftone phase shift mask blank, halftone phas...
- Patent number 10,466,582
- Issue date Nov 5, 2019
- Shin-Etsu Chemical Co., Ltd.
- Yukio Inazuki
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Halftone phase shift photomask blank and making method
- Patent number 10,459,333
- Issue date Oct 29, 2019
- Shin-Etsu Chemical Co., Ltd.
- Takuro Kosaka
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Halftone phase shift mask blank and halftone phase shift mask
- Patent number 10,372,030
- Issue date Aug 6, 2019
- Shin-Etsu Chemical Co., Ltd.
- Kouhei Sasamoto
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Halftone phase shift photomask blank and making method
- Patent number 10,146,122
- Issue date Dec 4, 2018
- Shin-Etsu Chemical Co., Ltd.
- Takuro Kosaka
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method of manufacturing photomask blank and photomask blank
- Patent number 10,120,274
- Issue date Nov 6, 2018
- Shin-Etsu Chemical Co., Ltd.
- Souichi Fukaya
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Patents Applicationslast 30 patents

Information Patent Application
Substrate with Film for Reflective Mask Blank, and Reflective Mask...
- Publication number 20240248388
- Publication date Jul 25, 2024
- Shin-Etsu Chemical Co., Ltd.
- Tsuneo TERASAWA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Reflective Mask Blank, Reflective Mask, and Manufacturing Method Th...
- Publication number 20240210813
- Publication date Jun 27, 2024
- Shin-Etsu Chemical Co., Ltd.
- Taiga OGOSE
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
REFLECTIVE MASK BLANK, AND METHOD FOR MANUFACTURING REFLECTIVE MASK
- Publication number 20220404694
- Publication date Dec 22, 2022
- Shin-Etsu Chemical Co., Ltd.
- Takuro KOSAKA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
SUBSTRATE WITH MULTILAYER REFLECTION FILM FOR EUV MASK BLANK, MANUF...
- Publication number 20220075254
- Publication date Mar 10, 2022
- Shin-Etsu Chemical Co., Ltd.
- Yukio INAZUKI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
SUBSTRATE WITH MULTILAYER REFLECTION FILM FOR EUV MASK BLANK, MANUF...
- Publication number 20220075255
- Publication date Mar 10, 2022
- Shin-Etsu Chemical Co., Ltd.
- Yukio INAZUKI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
SUBSTRATE DEFECT INSPECTION METHOD AND SUBSTRATE DEFECT INSPECTION...
- Publication number 20220065797
- Publication date Mar 3, 2022
- Shin-Etsu Chemical Co., Ltd.
- Tsuneo TERASAWA
- G01 - MEASURING TESTING
Information Patent Application
Substrate with Film for Reflective Mask Blank, and Reflective Mask...
- Publication number 20210333702
- Publication date Oct 28, 2021
- Shin-Etsu Chemical Co., Ltd.
- Tsuneo TERASAWA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
REFLECTIVE MASK BLANK, METHOD OF MANUFACTURING THEREOF, AND REFLECT...
- Publication number 20210318607
- Publication date Oct 14, 2021
- Shin-Etsu Chemical Co., Ltd.
- Takuro KOSAKA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD OF MANUFACTURING REFLECTIVE MASK BLANK, AND REFLECTIVE MASK...
- Publication number 20210278759
- Publication date Sep 9, 2021
- Shin-Etsu Chemical Co., Ltd.
- Yukio INAZUKI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF MANUFACTURING REFLECTIVE MASK BLANK, REFLECTIVE MASK BLAN...
- Publication number 20210080819
- Publication date Mar 18, 2021
- Shin-Etsu Chemical Co., Ltd.
- Tsuneo TERASAWA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PHOTOMASK BLANK AND METHOD FOR PREPARING PHOTOMASK
- Publication number 20200264502
- Publication date Aug 20, 2020
- Shin-Etsu Chemical Co., Ltd.
- Takuro KOSAKA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
HALFTONE PHASE SHIFT PHOTOMASK BLANK, MAKING METHOD, AND HALFTONE P...
- Publication number 20200249561
- Publication date Aug 6, 2020
- Shin-Etsu Chemical Co., Ltd.
- Takuro KOSAKA
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
PHOTOMASK BLANK, AND METHOD OF MANUFACTURING PHOTOMASK
- Publication number 20200192215
- Publication date Jun 18, 2020
- Shin-Etsu Chemical Co., Ltd.
- Yukio INAZUKI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD FOR PREPARING HALFTONE PHASE SHIFT MASK BLANK, HALFTONE PHAS...
- Publication number 20200026180
- Publication date Jan 23, 2020
- Shin-Etsu Chemical Co., Ltd.
- Yukio INAZUKI
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
HALFTONE PHASE SHIFT MASK BLANK AND HALFTONE PHASE SHIFT MASK
- Publication number 20200026181
- Publication date Jan 23, 2020
- Shin-Etsu Chemical Co., Ltd.
- Yukio INAZUKI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PHOTOMASK BLANK, METHOD OF MANUFACTURING PHOTOMASK, AND PHOTOMASK
- Publication number 20190369482
- Publication date Dec 5, 2019
- Shin-Etsu Chemical Co., Ltd.
- Yukio INAZUKI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PHOTOMASK BLANK AND METHOD FOR PRODUCING PHOTOMASK
- Publication number 20190146329
- Publication date May 16, 2019
- Shin-Etsu Chemical Co., Ltd.
- Yukio INAZUKI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
HALFTONE PHASE SHIFT PHOTOMASK BLANK AND MAKING METHOD
- Publication number 20190064650
- Publication date Feb 28, 2019
- Shin-Etsu Chemical Co., Ltd.
- Takuro KOSAKA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PHOTOMASK BLANK AND PHOTOMASK
- Publication number 20190004420
- Publication date Jan 3, 2019
- Shin-Etsu Chemical Co., Ltd.
- Ryoken OZAWA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PHASE SHIFT MASK BLANK, PHASE SHIFT MASK, AND BLANK PREPARING METHOD
- Publication number 20180356720
- Publication date Dec 13, 2018
- Shin-Etsu Chemical Co., Ltd.
- Yukio INAZUKI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PHOTOMASK BLANK, METHOD FOR MANUFACTURING PHOTOMASK, AND MASK PATTE...
- Publication number 20180267398
- Publication date Sep 20, 2018
- Shin-Etsu Chemical Co., Ltd.
- Shigeo IRIE
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
HALFTONE PHASE SHIFT PHOTOMASK BLANK
- Publication number 20180259842
- Publication date Sep 13, 2018
- Shin-Etsu Chemical Co., Ltd.
- Yukio INAZUKI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PHOTOMASK BLANK
- Publication number 20180259843
- Publication date Sep 13, 2018
- Shin-Etsu Chemical Co., Ltd.
- Souichi FUKAYA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD FOR PREPARING PHOTOMASK BLANK, PHOTOMASK BLANK, METHOD FOR P...
- Publication number 20180224737
- Publication date Aug 9, 2018
- Shin-Etsu Chemical Co., Ltd.
- Yukio INAZUKI
- C01 - INORGANIC CHEMISTRY
Information Patent Application
PHOTOMASK BLANK, AND PREPARATION METHOD THEREOF
- Publication number 20180180985
- Publication date Jun 28, 2018
- Shin-Etsu Chemical Co., Ltd.
- Takuro KOSAKA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PHOTOMASK BLANK, AND PREPARATION METHOD THEREOF
- Publication number 20180180986
- Publication date Jun 28, 2018
- Shin-Etsu Chemical Co., Ltd.
- Takuro KOSAKA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
HALFTONE PHASE SHIFT MASK BLANK AND HALFTONE PHASE SHIFT MASK
- Publication number 20180088457
- Publication date Mar 29, 2018
- Shin-Etsu Chemical Co., Ltd.
- Yukio INAZUKI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
HALFTONE PHASE SHIFT PHOTOMASK BLANK, MAKING METHOD, AND HALFTONE P...
- Publication number 20180088456
- Publication date Mar 29, 2018
- Shin-Etsu Chemical Co., Ltd.
- Takuro KOSAKA
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHOD FOR PREPARING HALFTONE PHASE SHIFT MASK BLANK, HALFTONE PHAS...
- Publication number 20180059532
- Publication date Mar 1, 2018
- Shin-Etsu Chemical Co., Ltd.
- Yukio INAZUKI
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
PHOTOMASK BLANK AND METHOD FOR PREPARING PHOTOMASK
- Publication number 20170255095
- Publication date Sep 7, 2017
- Shin-Etsu Chemical Co., Ltd.
- Takuro KOSAKA
- H01 - BASIC ELECTRIC ELEMENTS

Yukio INAZUKI

Person

Patents Grantslast 30 patents

Reflective mask blank, method of manufacturing thereof, and reflect...

Substrate with multilayer reflection film for EUV mask blank, manuf...

Substrate with multilayer reflection film for EUV mask blank, manuf...

Method of manufacturing reflective mask blank, and reflective mask...

Substrate defect inspection method and substrate defect inspection...

Method of manufacturing reflective mask blank, reflective mask blan...

Photomask blank and method for preparing photomask

Photomask blank, method of manufacturing photomask, and photomask

Photomask blank, and method of manufacturing photomask

Halftone phase shift mask blank and halftone phase shift mask

Halftone phase shift photomask blank, making method, and halftone p...

Method for preparing halftone phase shift mask blank, halftone phas...

Photomask blank and method for producing photomask

Photomask blank and photomask

Method for preparing photomask blank, photomask blank, method for p...

Halftone phase shift photomask blank

Photomask blank

Photomask blank and method for preparing photomask

Halftone phase shift photomask blank, making method, and halftone p...

Photomask blank, and preparation method thereof

Photomask blank, method for manufacturing photomask, and mask patte...

Photomask blank, and preparation method thereof

Phase shift mask blank, phase shift mask, and blank preparing method

Mask blank and making method

Halftone phase shift mask blank and halftone phase shift mask

Method for preparing halftone phase shift mask blank, halftone phas...

Halftone phase shift photomask blank and making method

Halftone phase shift mask blank and halftone phase shift mask

Halftone phase shift photomask blank and making method

Method of manufacturing photomask blank and photomask blank

Patents Applicationslast 30 patents

Substrate with Film for Reflective Mask Blank, and Reflective Mask...

Reflective Mask Blank, Reflective Mask, and Manufacturing Method Th...

REFLECTIVE MASK BLANK, AND METHOD FOR MANUFACTURING REFLECTIVE MASK

SUBSTRATE WITH MULTILAYER REFLECTION FILM FOR EUV MASK BLANK, MANUF...

SUBSTRATE WITH MULTILAYER REFLECTION FILM FOR EUV MASK BLANK, MANUF...

SUBSTRATE DEFECT INSPECTION METHOD AND SUBSTRATE DEFECT INSPECTION...

Substrate with Film for Reflective Mask Blank, and Reflective Mask...

REFLECTIVE MASK BLANK, METHOD OF MANUFACTURING THEREOF, AND REFLECT...

METHOD OF MANUFACTURING REFLECTIVE MASK BLANK, AND REFLECTIVE MASK...

METHOD OF MANUFACTURING REFLECTIVE MASK BLANK, REFLECTIVE MASK BLAN...

PHOTOMASK BLANK AND METHOD FOR PREPARING PHOTOMASK

HALFTONE PHASE SHIFT PHOTOMASK BLANK, MAKING METHOD, AND HALFTONE P...

PHOTOMASK BLANK, AND METHOD OF MANUFACTURING PHOTOMASK

METHOD FOR PREPARING HALFTONE PHASE SHIFT MASK BLANK, HALFTONE PHAS...

HALFTONE PHASE SHIFT MASK BLANK AND HALFTONE PHASE SHIFT MASK

PHOTOMASK BLANK, METHOD OF MANUFACTURING PHOTOMASK, AND PHOTOMASK

PHOTOMASK BLANK AND METHOD FOR PRODUCING PHOTOMASK

HALFTONE PHASE SHIFT PHOTOMASK BLANK AND MAKING METHOD

PHOTOMASK BLANK AND PHOTOMASK

PHASE SHIFT MASK BLANK, PHASE SHIFT MASK, AND BLANK PREPARING METHOD

PHOTOMASK BLANK, METHOD FOR MANUFACTURING PHOTOMASK, AND MASK PATTE...

HALFTONE PHASE SHIFT PHOTOMASK BLANK

PHOTOMASK BLANK

METHOD FOR PREPARING PHOTOMASK BLANK, PHOTOMASK BLANK, METHOD FOR P...

PHOTOMASK BLANK, AND PREPARATION METHOD THEREOF

PHOTOMASK BLANK, AND PREPARATION METHOD THEREOF

HALFTONE PHASE SHIFT MASK BLANK AND HALFTONE PHASE SHIFT MASK

HALFTONE PHASE SHIFT PHOTOMASK BLANK, MAKING METHOD, AND HALFTONE P...

METHOD FOR PREPARING HALFTONE PHASE SHIFT MASK BLANK, HALFTONE PHAS...

PHOTOMASK BLANK AND METHOD FOR PREPARING PHOTOMASK