Yukio Nishimura

Person

Yokkaichi, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Fluorine-containing polymer, purification method, and radiation-sen...
- Patent number 11,681,222
- Issue date Jun 20, 2023
- JSR Corporation
- Hiroki Nakagawa
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Fluorine-containing polymer, purification method, and radiation-sen...
- Patent number 11,036,133
- Issue date Jun 15, 2021
- JSR Corporation
- Hiroki Nakagawa
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Fluorine-containing polymer, purification method, and radiation-sen...
- Patent number 10,620,534
- Issue date Apr 14, 2020
- JSR Corporation
- Hiroki Nakagawa
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Magnetic resonance measurement apparatus with improved instruction...
- Patent number 10,302,721
- Issue date May 28, 2019
- Jeol Ltd.
- Kenichi Hachitani
- G01 - MEASURING TESTING
Information Patent Grant
Fluorine-containing polymer, purification method, and radiation-sen...
- Patent number 10,082,733
- Issue date Sep 25, 2018
- JSR Corporation
- Hiroki Nakagawa
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Radiation-sensitive resin composition, polymer and method for formi...
- Patent number 9,598,520
- Issue date Mar 21, 2017
- JSR Corporation
- Yuko Kiridoshi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Fluorine-containing polymer, purification method, and radiation-sen...
- Patent number 9,500,950
- Issue date Nov 22, 2016
- JSR Corporation
- Hiroki Nakagawa
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Liquid immersion lithography upper-layer film-forming composition a...
- Patent number 9,261,789
- Issue date Feb 16, 2016
- JSR Corporation
- Takahiro Hayama
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Fluorine-containing polymer, purification method, and radiation-sen...
- Patent number 9,213,236
- Issue date Dec 15, 2015
- JSR Corporation
- Hiroki Nakagawa
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Immersion upper layer film forming composition and method of formin...
- Patent number 9,182,674
- Issue date Nov 10, 2015
- JSR Corporation
- Toru Kimura
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Composition for formation of upper layer film, and method for forma...
- Patent number 8,895,229
- Issue date Nov 25, 2014
- JSR Corporation
- Yukio Nishimura
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method for forming pattern
- Patent number 8,808,974
- Issue date Aug 19, 2014
- JSR Corporation
- Yukio Nishimura
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Radiation-sensitive resin composition
- Patent number 8,802,348
- Issue date Aug 12, 2014
- JSR Corporation
- Noboru Otsuka
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Silicon-containing film, resin composition, and pattern formation m...
- Patent number 8,791,020
- Issue date Jul 29, 2014
- JSR Corporation
- Takashi Mori
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Compound, polymer, and radiation-sensitive composition
- Patent number 8,697,331
- Issue date Apr 15, 2014
- JSR Corporation
- Hirokazu Sakakibara
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Composition for forming upper layer film for immersion exposure, up...
- Patent number 8,697,344
- Issue date Apr 15, 2014
- JSR Corporation
- Daita Kouno
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Fluorine-containing polymer, purification method, and radiation-sen...
- Patent number 8,697,343
- Issue date Apr 15, 2014
- JSR Corporation
- Hiroki Nakagawa
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Compound, fluorine-containing polymer, radiation-sensitive resin co...
- Patent number 8,530,692
- Issue date Sep 10, 2013
- JSR Corporation
- Nobuji Matsumura
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Radiation-sensitive resin composition, polymer, and compound
- Patent number 8,507,575
- Issue date Aug 13, 2013
- JSR Corporation
- Nobuji Matsumura
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Upper layer film forming composition and method of forming photores...
- Patent number 8,507,189
- Issue date Aug 13, 2013
- JSR Corporation
- Daita Kouno
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Upper layer-forming composition and photoresist patterning method
- Patent number 8,435,718
- Issue date May 7, 2013
- JSR Corporation
- Atsushi Nakamura
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Composition for forming upper layer film for immersion exposure, up...
- Patent number 8,431,332
- Issue date Apr 30, 2013
- JSR Corporation
- Daita Kouno
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Upper layer film forming composition for liquid immersion and metho...
- Patent number 8,247,165
- Issue date Aug 21, 2012
- JSR Corporation
- Toru Kimura
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Radiation-sensitive composition
- Patent number 8,124,314
- Issue date Feb 28, 2012
- JSR Corporation
- Yukio Nishimura
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Upper layer-forming composition and photoresist patterning method
- Patent number 8,076,053
- Issue date Dec 13, 2011
- JSR Corporation
- Atsushi Nakamura
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Self-topcoating photoresist for photolithography
- Patent number 7,951,524
- Issue date May 31, 2011
- International Business Machines Corporation
- Robert Allen
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Use of step and flash imprint lithography for direct imprinting of...
- Patent number 7,691,275
- Issue date Apr 6, 2010
- Board of Regents, The University of Texas System
- C. Grant Willson
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Radiation-sensitive resin composition
- Patent number 7,638,261
- Issue date Dec 29, 2009
- JSR Corporation
- Yukio Nishimura
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Radiation-sensitive resin composition
- Patent number 7,531,286
- Issue date May 12, 2009
- JSR Corporation
- Yukio Nishimura
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Radiation-sensitive resin composition
- Patent number 7,521,169
- Issue date Apr 21, 2009
- JSR Corporation
- Yukio Nishimura
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC

Patents Applicationslast 30 patents

Information Patent Application
FLUORINE-CONTAINING POLYMER, PURIFICATION METHOD, AND RADIATION-SEN...
- Publication number 20220137508
- Publication date May 5, 2022
- JSR Corporation
- Hiroki NAKAGAWA
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
FLUORINE-CONTAINING POLYMER, PURIFICATION METHOD, AND RADIATION-SEN...
- Publication number 20210278764
- Publication date Sep 9, 2021
- JSR Corporation
- Hiroki NAKAGAWA
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
FLUORINE-CONTAINING POLYMER, PURIFICATION METHOD, AND RADIATION-SEN...
- Publication number 20200124961
- Publication date Apr 23, 2020
- JSR Corporation
- Hiroki NAKAGAWA
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
FLUORINE-CONTAINING POLYMER, PURIFICATION METHOD, AND RADIATION-SEN...
- Publication number 20190278175
- Publication date Sep 12, 2019
- JSR Corporation
- Hiroki NAKAGAWA
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
FLUORINE-CONTAINING POLYMER, PURIFICATION METHOD, AND RADIATION-SEN...
- Publication number 20190025695
- Publication date Jan 24, 2019
- JSR Corporation
- Hiroki NAKAGAWA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
FLUORINE-CONTAINING POLYMER, PURIFICATION METHOD, AND RADIATION-SEN...
- Publication number 20170199453
- Publication date Jul 13, 2017
- JSR Corporation
- Hiroki NAKAGAWA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
UPPER LAYER-FORMING COMPOSITION AND RESIST PATTERNING METHOD
- Publication number 20170160637
- Publication date Jun 8, 2017
- JSR Corporation
- Takahiro Hayama
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Magnetic Resonance Measurement Apparatus with Improved Instruction...
- Publication number 20160187440
- Publication date Jun 30, 2016
- JEOL RESONANCE INC.
- Kenichi Hachitani
- G01 - MEASURING TESTING
Information Patent Application
UPPER LAYER-FORMING COMPOSITION AND RESIST PATTERNING METHOD
- Publication number 20160109801
- Publication date Apr 21, 2016
- JSR Corporation
- Takahiro Hayama
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
FLUORINE-CONTAINING POLYMER, PURIFICATION METHOD, AND RADIATION-SEN...
- Publication number 20160062237
- Publication date Mar 3, 2016
- JSR Corporation
- Hiroki NAKAGAWA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
FLUORINE-CONTAINING POLYMER, PURIFICATION METHOD, AND RADIATION-SEN...
- Publication number 20140162190
- Publication date Jun 12, 2014
- JSR Corporation
- Hiroki NAKAGAWA
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
COMPOSITION FOR FORMING UPPER LAYER FILM FOR IMMERSION EXPOSURE, UP...
- Publication number 20130216961
- Publication date Aug 22, 2013
- JSR Corporation
- Daita Kouno
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD FOR FORMING PATTERN
- Publication number 20130164695
- Publication date Jun 27, 2013
- JSR Corporation
- Yukio NISHIMURA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RADIATION-SENSITIVE RESIN COMPOSITION, POLYMER AND METHOD FOR FORMI...
- Publication number 20120295197
- Publication date Nov 22, 2012
- JSR Corporation
- Yuko KIRIDOSHI
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
IMMERSION UPPER LAYER FILM FORMING COMPOSITION AND METHOD OF FORMIN...
- Publication number 20120282553
- Publication date Nov 8, 2012
- JSR Corporation
- Toru KIMURA
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
PATERN FORMING METHOD
- Publication number 20120164586
- Publication date Jun 28, 2012
- JSR Corporation
- Yukio Nishimura
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
SILICON-CONTAINING FILM, RESIN COMPOSITION, AND PATTERN FORMATION M...
- Publication number 20120129352
- Publication date May 24, 2012
- JSR Corporation
- Takashi MORI
- B82 - NANO-TECHNOLOGY
Information Patent Application
COMPOUND, FLUORINE-CONTAINING POLYMER, RADIATION-SENSITIVE RESIN CO...
- Publication number 20120100480
- Publication date Apr 26, 2012
- JSR Corporation
- Nobuji MATSUMURA
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
RADIATION-SENSITIVE RESIN COMPOSITION, POLYMER, AND COMPOUND
- Publication number 20120065291
- Publication date Mar 15, 2012
- JSR Corporation
- Nobuji Matsumura
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
UPPER LAYER-FORMING COMPOSITION AND PHOTORESIST PATTERNING METHOD
- Publication number 20120028198
- Publication date Feb 2, 2012
- JSR Corporation
- Atsushi NAKAMURA
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
UPPER LAYER-FORMING COMPOSITION AND RESIST PATTERNING METHOD
- Publication number 20120021359
- Publication date Jan 26, 2012
- JSR Corporation
- Takahiro HAYAMA
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
RADIATION-SENSITIVE RESIN COMPOSITION AND POLYMER
- Publication number 20110262865
- Publication date Oct 27, 2011
- JSR Corporation
- Yukio NISHIMURA
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
RADIATION-SENSITIVE RESIN COMPOSITION, AND RESIST PATTERN FORMATION...
- Publication number 20110212401
- Publication date Sep 1, 2011
- JSR Corporation
- Yukio NISHIMURA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RADIATION-SENSITIVE RESIN COMPOSITION FOR LIQUID IMMERSION LITHOGRA...
- Publication number 20110151378
- Publication date Jun 23, 2011
- JSR Corporation
- Nobuji MATSUMURA
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
NOVEL COMPOUND, POLYMER, AND RADIATION-SENSITIVE COMPOSITION
- Publication number 20110104611
- Publication date May 5, 2011
- JSR Corporation
- Hirokazu Sakakibara
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
COMPOSITION FOR FORMING UPPER LAYER FILM FOR IMMERSION EXPOSURE, UP...
- Publication number 20100255416
- Publication date Oct 7, 2010
- JSR Corporation
- Daita Kouno
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RADIATION-SENSITIVE COMPOSITION
- Publication number 20100221664
- Publication date Sep 2, 2010
- JSR Corporation
- Yukio NISHIMURA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RADIATION-SENSITIVE COMPOSITION
- Publication number 20100203452
- Publication date Aug 12, 2010
- JSR Corporation
- Yukio Nishimura
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RADIATION-SENSITIVE RESIN COMPOSITION
- Publication number 20100203447
- Publication date Aug 12, 2010
- JSR Corporation
- Noboru Otsuka
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
POSITIVE-WORKING RADIATION-SENSITIVE COMPOSITION AND METHOD FOR RES...
- Publication number 20100068650
- Publication date Mar 18, 2010
- Yukio Nishimura
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Yukio Nishimura

Person

Patents Grantslast 30 patents

Fluorine-containing polymer, purification method, and radiation-sen...

Fluorine-containing polymer, purification method, and radiation-sen...

Fluorine-containing polymer, purification method, and radiation-sen...

Magnetic resonance measurement apparatus with improved instruction...

Fluorine-containing polymer, purification method, and radiation-sen...

Radiation-sensitive resin composition, polymer and method for formi...

Fluorine-containing polymer, purification method, and radiation-sen...

Liquid immersion lithography upper-layer film-forming composition a...

Fluorine-containing polymer, purification method, and radiation-sen...

Immersion upper layer film forming composition and method of formin...

Composition for formation of upper layer film, and method for forma...

Method for forming pattern

Radiation-sensitive resin composition

Silicon-containing film, resin composition, and pattern formation m...

Compound, polymer, and radiation-sensitive composition

Composition for forming upper layer film for immersion exposure, up...

Fluorine-containing polymer, purification method, and radiation-sen...

Compound, fluorine-containing polymer, radiation-sensitive resin co...

Radiation-sensitive resin composition, polymer, and compound

Upper layer film forming composition and method of forming photores...

Upper layer-forming composition and photoresist patterning method

Composition for forming upper layer film for immersion exposure, up...

Upper layer film forming composition for liquid immersion and metho...

Radiation-sensitive composition

Upper layer-forming composition and photoresist patterning method

Self-topcoating photoresist for photolithography

Use of step and flash imprint lithography for direct imprinting of...

Radiation-sensitive resin composition

Radiation-sensitive resin composition

Radiation-sensitive resin composition

Patents Applicationslast 30 patents

FLUORINE-CONTAINING POLYMER, PURIFICATION METHOD, AND RADIATION-SEN...

FLUORINE-CONTAINING POLYMER, PURIFICATION METHOD, AND RADIATION-SEN...

FLUORINE-CONTAINING POLYMER, PURIFICATION METHOD, AND RADIATION-SEN...

FLUORINE-CONTAINING POLYMER, PURIFICATION METHOD, AND RADIATION-SEN...

FLUORINE-CONTAINING POLYMER, PURIFICATION METHOD, AND RADIATION-SEN...

FLUORINE-CONTAINING POLYMER, PURIFICATION METHOD, AND RADIATION-SEN...

UPPER LAYER-FORMING COMPOSITION AND RESIST PATTERNING METHOD

Magnetic Resonance Measurement Apparatus with Improved Instruction...

UPPER LAYER-FORMING COMPOSITION AND RESIST PATTERNING METHOD

FLUORINE-CONTAINING POLYMER, PURIFICATION METHOD, AND RADIATION-SEN...

FLUORINE-CONTAINING POLYMER, PURIFICATION METHOD, AND RADIATION-SEN...

COMPOSITION FOR FORMING UPPER LAYER FILM FOR IMMERSION EXPOSURE, UP...

METHOD FOR FORMING PATTERN

RADIATION-SENSITIVE RESIN COMPOSITION, POLYMER AND METHOD FOR FORMI...

IMMERSION UPPER LAYER FILM FORMING COMPOSITION AND METHOD OF FORMIN...

PATERN FORMING METHOD

SILICON-CONTAINING FILM, RESIN COMPOSITION, AND PATTERN FORMATION M...

COMPOUND, FLUORINE-CONTAINING POLYMER, RADIATION-SENSITIVE RESIN CO...

RADIATION-SENSITIVE RESIN COMPOSITION, POLYMER, AND COMPOUND

UPPER LAYER-FORMING COMPOSITION AND PHOTORESIST PATTERNING METHOD

UPPER LAYER-FORMING COMPOSITION AND RESIST PATTERNING METHOD

RADIATION-SENSITIVE RESIN COMPOSITION AND POLYMER

RADIATION-SENSITIVE RESIN COMPOSITION, AND RESIST PATTERN FORMATION...

RADIATION-SENSITIVE RESIN COMPOSITION FOR LIQUID IMMERSION LITHOGRA...

NOVEL COMPOUND, POLYMER, AND RADIATION-SENSITIVE COMPOSITION

COMPOSITION FOR FORMING UPPER LAYER FILM FOR IMMERSION EXPOSURE, UP...

RADIATION-SENSITIVE COMPOSITION

RADIATION-SENSITIVE COMPOSITION

RADIATION-SENSITIVE RESIN COMPOSITION

POSITIVE-WORKING RADIATION-SENSITIVE COMPOSITION AND METHOD FOR RES...