Yukio Shibano

Person

Niigata-ken, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Photomask-forming glass substrate and making method
- Patent number 9,316,902
- Issue date Apr 19, 2016
- Shin-Etsu Chemical Co., Ltd.
- Daijitsu Harada
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Photomask-forming glass substrate and making method
- Patent number 8,551,346
- Issue date Oct 8, 2013
- Shin-Etsu Chemcial Co., Ltd.
- Daijitsu Harada
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Method for producing large-size synthetic quartz glass substrate
- Patent number 8,460,061
- Issue date Jun 11, 2013
- Shin-Etsu Chemical Co., Ltd.
- Yukio Shibano
- C03 - GLASS MINERAL OR SLAG WOOL
Information Patent Grant
Large-size substrate
- Patent number 8,012,563
- Issue date Sep 6, 2011
- Shin-Etsu Chemical Co., Ltd.
- Daisuke Kusabiraki
- B24 - GRINDING POLISHING
Information Patent Grant
Recycling of large-size photomask substrate
- Patent number 7,906,256
- Issue date Mar 15, 2011
- Shin-Etsu Chemical Co., Ltd.
- Shuhei Ueda
- Y02 - TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMA...
Information Patent Grant
Large-sized glass substrate
- Patent number 7,745,071
- Issue date Jun 29, 2010
- Shin-Etsu Chemical Co., Ltd.
- Yukio Shibano
- B24 - GRINDING POLISHING
Information Patent Grant
Large-size glass substrate for photomask and making method, compute...
- Patent number 7,608,542
- Issue date Oct 27, 2009
- Shin-Etsu Chemical Co., Ltd.
- Shuhei Ueda
- G11 - INFORMATION STORAGE
Information Patent Grant
Wafer polishing method and polished wafer
- Patent number 7,588,481
- Issue date Sep 15, 2009
- Shin-Etsu Chemical Co., Ltd.
- Toshinari Murai
- B24 - GRINDING POLISHING
Information Patent Grant
Large-sized substrate and method of producing the same
- Patent number 7,191,618
- Issue date Mar 20, 2007
- Shin-Etsu Chemical Co., Ltd.
- Yukio Shibano
- B24 - GRINDING POLISHING
Information Patent Grant
Method for preparing large-size substrate
- Patent number 7,183,210
- Issue date Feb 27, 2007
- Shin-Etsu Chemical Co., Ltd.
- Yukio Shibano
- B24 - GRINDING POLISHING
Information Patent Grant
Silica glass substrates and their selection
- Patent number 6,928,837
- Issue date Aug 16, 2005
- Shin-Etsu Chemical Co., Ltd.
- Masaki Takeuchi
- C03 - GLASS MINERAL OR SLAG WOOL
Information Patent Grant
Glass substrate for photomasks and preparation method
- Patent number 6,869,732
- Issue date Mar 22, 2005
- Shin-Etsu Chemical Co., Ltd.
- Masaki Takeuchi
- C03 - GLASS MINERAL OR SLAG WOOL
Information Patent Grant
Glass substrate and leveling thereof
- Patent number 6,855,908
- Issue date Feb 15, 2005
- Shin-Etsu Chemical Co., Ltd.
- Masaki Takeuchi
- C03 - GLASS MINERAL OR SLAG WOOL
Information Patent Grant
Synthetic quartz glass substrate for photomask and making method
- Patent number 6,413,682
- Issue date Jul 2, 2002
- Shin-Etsu Chemical Co., Ltd.
- Yukio Shibano
- C03 - GLASS MINERAL OR SLAG WOOL

Patents Applicationslast 30 patents

Information Patent Application
POLISHING AGENT FOR SYNTHETIC QUARTZ GLASS SUBSTRATE
- Publication number 20150021292
- Publication date Jan 22, 2015
- Shin-Etsu Chemical Co., Ltd.
- Daijitsu HARADA
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
PHOTOMASK-FORMING GLASS SUBSTRATE AND MAKING METHOD
- Publication number 20140004309
- Publication date Jan 2, 2014
- SHIN-ETSI CHEMICAL CO., LTD.
- Daijitsu HARADA
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Application
PHOTOMASK-FORMING GLASS SUBSTRATE AND MAKING METHOD
- Publication number 20110143267
- Publication date Jun 16, 2011
- Daijitsu Harada
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD FOR PRODUCING LARGE-SIZE SYNTHETIC QUARTZ GLASS SUBSTRATE
- Publication number 20100255761
- Publication date Oct 7, 2010
- Yukio SHIBANO
- C03 - GLASS MINERAL OR SLAG WOOL
Information Patent Application
POLISHING AGENT FOR SYNTHETIC QUARTZ GLASS SUBSTRATE
- Publication number 20100243950
- Publication date Sep 30, 2010
- Daijitsu Harada
- B24 - GRINDING POLISHING
Information Patent Application
Large-Size Glass Substrate For Photomask and Making Method, Compute...
- Publication number 20080261119
- Publication date Oct 23, 2008
- Shuhei Ueda
- G11 - INFORMATION STORAGE
Information Patent Application
Recycling of large-size photomask substrate
- Publication number 20080145770
- Publication date Jun 19, 2008
- Shin-Etsu Chemical Co., Ltd.
- Shuhei Ueda
- Y02 - TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMA...
Information Patent Application
LARGE-SIZED SUBSTRATE AND METHOD OF PRODUCING THE SAME
- Publication number 20070132068
- Publication date Jun 14, 2007
- Yukio Shibano
- B24 - GRINDING POLISHING
Information Patent Application
WAFER POLISHING METHOD AND POLISHED WAFER
- Publication number 20070045232
- Publication date Mar 1, 2007
- Shin-Etsu Chemical Co., Ltd.
- Toshinari MURAI
- B24 - GRINDING POLISHING
Information Patent Application
Method for preparing large-size substrate
- Publication number 20050181611
- Publication date Aug 18, 2005
- Shin-Etsu Chemical Co., Ltd.
- Yukio Shibano
- B24 - GRINDING POLISHING
Information Patent Application
Large-size substrate
- Publication number 20050013972
- Publication date Jan 20, 2005
- Daisuke Kusabiraki
- B24 - GRINDING POLISHING
Information Patent Application
Large-sized substrate and method of producing the same
- Publication number 20030143403
- Publication date Jul 31, 2003
- Yukio Shibano
- B24 - GRINDING POLISHING
Information Patent Application
Glass substrate and leveling thereof
- Publication number 20020179576
- Publication date Dec 5, 2002
- Shin-Etsu Chemical Co., Ltd.
- Masaki Takeuchi
- C03 - GLASS MINERAL OR SLAG WOOL
Information Patent Application
Glass substrate for photomasks and preparation method
- Publication number 20020155361
- Publication date Oct 24, 2002
- Shin-Etsu Chemical Co., Ltd.
- Masaki Takeuchi
- C03 - GLASS MINERAL OR SLAG WOOL
Information Patent Application
Silica glass substrates and their selection
- Publication number 20020078710
- Publication date Jun 27, 2002
- Shin-Etsu Chemical Co., Ltd.
- Masaki Takeuchi
- C03 - GLASS MINERAL OR SLAG WOOL

Yukio Shibano

Person

Patents Grantslast 30 patents

Photomask-forming glass substrate and making method

Photomask-forming glass substrate and making method

Method for producing large-size synthetic quartz glass substrate

Large-size substrate

Recycling of large-size photomask substrate

Large-sized glass substrate

Large-size glass substrate for photomask and making method, compute...

Wafer polishing method and polished wafer

Large-sized substrate and method of producing the same

Method for preparing large-size substrate

Silica glass substrates and their selection

Glass substrate for photomasks and preparation method

Glass substrate and leveling thereof

Synthetic quartz glass substrate for photomask and making method

Patents Applicationslast 30 patents

POLISHING AGENT FOR SYNTHETIC QUARTZ GLASS SUBSTRATE

PHOTOMASK-FORMING GLASS SUBSTRATE AND MAKING METHOD

PHOTOMASK-FORMING GLASS SUBSTRATE AND MAKING METHOD

METHOD FOR PRODUCING LARGE-SIZE SYNTHETIC QUARTZ GLASS SUBSTRATE

POLISHING AGENT FOR SYNTHETIC QUARTZ GLASS SUBSTRATE

Large-Size Glass Substrate For Photomask and Making Method, Compute...

Recycling of large-size photomask substrate

LARGE-SIZED SUBSTRATE AND METHOD OF PRODUCING THE SAME

WAFER POLISHING METHOD AND POLISHED WAFER

Method for preparing large-size substrate

Large-size substrate

Large-sized substrate and method of producing the same

Glass substrate and leveling thereof

Glass substrate for photomasks and preparation method

Silica glass substrates and their selection