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Hino, JP
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last 30 patents
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Photosensitive polymer and photosensitive material for photomechani...
Patent number
4,413,091
Issue date
Nov 1, 1983
Tokyo Ohka Kogyo Kabushiki Kaisha
Hidenori Iwasaki
C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...