Yukito Nakagawa

Person

Kawasaki, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Method for manufacturing semiconductor device, ion beam etching dev...
- Patent number 10,026,591
- Issue date Jul 17, 2018
- Canon Anelva Corporation
- Yoshimitsu Kodaira
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for manufacturing semiconductor device, ion beam etching dev...
- Patent number 9,734,989
- Issue date Aug 15, 2017
- Canon Anelva Corporation
- Yoshimitsu Kodaira
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Grid, method of manufacturing the same, and ion beam processing app...
- Patent number 9,721,747
- Issue date Aug 1, 2017
- Canon Anelva Corporation
- Masashi Tsujiyama
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate processing apparatus, etching method of metal film, and m...
- Patent number 9,685,299
- Issue date Jun 20, 2017
- Canon Anelva Corporation
- Yukito Nakagawa
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Process for producing magnetoresistive effect element
- Patent number 9,640,754
- Issue date May 2, 2017
- Canon Anelva Corporation
- Yukito Nakagawa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of fabricating fin FET and method of fabricating device
- Patent number 9,190,287
- Issue date Nov 17, 2015
- Canon Anelva Corporation
- Takashi Nakagawa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing device, plasma processing method and method of ma...
- Patent number 8,475,672
- Issue date Jul 2, 2013
- Canon Anelva Corporation
- Kazuyuki Iori
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Surface processing apparatus
- Patent number 8,007,633
- Issue date Aug 30, 2011
- Canon Anelva Corporation
- Akihiro Egami
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Plasma processing system
- Patent number 6,664,496
- Issue date Dec 16, 2003
- Anelva Corporation
- Yoshimi Watabe
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing system for sputter deposition applications
- Patent number 6,462,482
- Issue date Oct 8, 2002
- Anelva Corporation
- Sunil Wickramanayaka
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Plasma processing system
- Patent number 6,376,796
- Issue date Apr 23, 2002
- Anelva Corporation
- Noriyoshi Sato
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus
- Patent number 6,339,997
- Issue date Jan 22, 2002
- Anelva Corporation
- Yukito Nakagawa
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Plasma processing apparatus
- Patent number 6,043,608
- Issue date Mar 28, 2000
- NEC Corporation
- Seiji Samukawa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Surface processing apparatus
- Patent number 5,961,776
- Issue date Oct 5, 1999
- Anelva Corporation
- Hisaaki Sato
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus for producing plasma at low electron te...
- Patent number 5,936,352
- Issue date Aug 10, 1999
- NEC Corporation
- Seiji Samukawa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma generator with a shield interposing the antenna
- Patent number 5,900,699
- Issue date May 4, 1999
- NEC Corporation
- Seiji Samukawa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus which uses a uniquely shaped antenna to...
- Patent number 5,565,738
- Issue date Oct 15, 1996
- NEC Corporation
- Seiji Samukawa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Apparatus for processing an object by gas plasma with a reduced damage
- Patent number 4,919,783
- Issue date Apr 24, 1990
- Anelva Corporation
- Tatsuo Asamaki
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE, ION BEAM ETCHING DEV...
- Publication number 20170316918
- Publication date Nov 2, 2017
- Canon ANELVA Corporation
- Yoshimitsu KODAIRA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
GRID, METHOD OF MANUFACTURING THE SAME, AND ION BEAM PROCESSING APP...
- Publication number 20170084419
- Publication date Mar 23, 2017
- Canon ANELVA Corporation
- Masashi Tsujiyama
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE, ION BEAM ETCHING DEV...
- Publication number 20150318185
- Publication date Nov 5, 2015
- CANON ANELVA CORPORATION
- Yoshimitsu KODAIRA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PROCESS FOR PRODUCING MAGNETORESISTIVE EFFECT ELEMENT
- Publication number 20150311432
- Publication date Oct 29, 2015
- Canon ANELVA Corporation
- Yukito NAKAGAWA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING APPARATUS, ETCHING METHOD OF METAL FILM, AND M...
- Publication number 20140353142
- Publication date Dec 4, 2014
- Yukito Nakagawa
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHOD OF FABRICATING FIN FET AND METHOD OF FABRICATING DEVICE
- Publication number 20140206197
- Publication date Jul 24, 2014
- Canon ANELVA Corporation
- Takashi NAKAGAWA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING DEVICE, PLASMA PROCESSING METHOD AND METHOD OF MA...
- Publication number 20110309050
- Publication date Dec 22, 2011
- Canon ANELVA Corporation
- Kazuyuki Iori
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Application
Surface processing apparatus
- Publication number 20110174221
- Publication date Jul 21, 2011
- CANON ANELVA CORPORATION
- Akihiro Egami
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Surface processing apparatus
- Publication number 20080113149
- Publication date May 15, 2008
- ANELVA CORPORATION
- Akihiro Egami
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Surface processing apparatus
- Publication number 20030024478
- Publication date Feb 6, 2003
- ANELVA CORPORATION
- Akihiro Egami
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Plasma processing system
- Publication number 20020144980
- Publication date Oct 10, 2002
- ANELVA CORPORATION
- Yoshimi Watabe
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Plasma processing system
- Publication number 20010026575
- Publication date Oct 4, 2001
- Noriyoshi Sato
- H01 - BASIC ELECTRIC ELEMENTS

Yukito Nakagawa

Person

Patents Grantslast 30 patents

Method for manufacturing semiconductor device, ion beam etching dev...

Method for manufacturing semiconductor device, ion beam etching dev...

Grid, method of manufacturing the same, and ion beam processing app...

Substrate processing apparatus, etching method of metal film, and m...

Process for producing magnetoresistive effect element

Method of fabricating fin FET and method of fabricating device

Plasma processing device, plasma processing method and method of ma...

Surface processing apparatus

Plasma processing system

Plasma processing system for sputter deposition applications

Plasma processing system

Plasma processing apparatus

Plasma processing apparatus

Surface processing apparatus

Plasma processing apparatus for producing plasma at low electron te...

Plasma generator with a shield interposing the antenna

Plasma processing apparatus which uses a uniquely shaped antenna to...

Apparatus for processing an object by gas plasma with a reduced damage

Patents Applicationslast 30 patents

METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE, ION BEAM ETCHING DEV...

GRID, METHOD OF MANUFACTURING THE SAME, AND ION BEAM PROCESSING APP...

METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE, ION BEAM ETCHING DEV...

PROCESS FOR PRODUCING MAGNETORESISTIVE EFFECT ELEMENT

SUBSTRATE PROCESSING APPARATUS, ETCHING METHOD OF METAL FILM, AND M...

METHOD OF FABRICATING FIN FET AND METHOD OF FABRICATING DEVICE

PLASMA PROCESSING DEVICE, PLASMA PROCESSING METHOD AND METHOD OF MA...

Surface processing apparatus

Surface processing apparatus

Surface processing apparatus

Plasma processing system

Plasma processing system