Yuli Vladimirsky

Person

Weston, CT, US

People

Patents Grantslast 30 patents

Information Patent Grant
Invariable magnification multilevel optical device with telecentric...
- Patent number 11,960,216
- Issue date Apr 16, 2024
- ASML Holding N.V.
- Lev Ryzhikov
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Lithographic patterning device multichannel position and level gauge
- Patent number 11,754,935
- Issue date Sep 12, 2023
- ASML Holding N.V.
- Yuli Vladimirsky
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Compact two-sided reticle inspection system
- Patent number 10,156,527
- Issue date Dec 18, 2018
- ASML Holding N.V.
- Stanley G. Janik
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Lithographic apparatus and device manufacturing method
- Patent number 9,594,030
- Issue date Mar 14, 2017
- ASML Holding N.V.
- Yuli Vladimirsky
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Optical system, inspection system and manufacturing method
- Patent number 9,411,244
- Issue date Aug 9, 2016
- ASML Holding N.V.
- Lev Ryzhikov
- G01 - MEASURING TESTING
Information Patent Grant
Optical system, inspection system and manufacturing method
- Patent number 8,692,977
- Issue date Apr 8, 2014
- ASML Holding N.V.
- Lev Ryzhikov
- G01 - MEASURING TESTING
Information Patent Grant
Diffraction elements for alignment targets
- Patent number 8,681,313
- Issue date Mar 25, 2014
- ASML Holding N.V.
- Yuli Vladimirsky
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Particle detection on an object surface
- Patent number 8,634,054
- Issue date Jan 21, 2014
- ASML Holding N.V.
- Yuli Vladimirsky
- G01 - MEASURING TESTING
Information Patent Grant
Thin film continuous spatially modulated grey attenuators and filters
- Patent number 8,558,988
- Issue date Oct 15, 2013
- ASML Holding N.V.
- Yuli Vladimirsky
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Systems and methods for minimizing scattered light in multi-SLM mas...
- Patent number 7,859,735
- Issue date Dec 28, 2010
- ASML Holding N.V.
- Wenceslao A. Cebuhar
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Optical system for transforming numerical aperture
- Patent number 7,859,756
- Issue date Dec 28, 2010
- ASML Holding N.V.
- Lev Ryzhikov
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Methods and systems to compensate for a stitching disturbance of a...
- Patent number 7,773,199
- Issue date Aug 10, 2010
- ASML Holding N.V.
- Arno Bleeker
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method and system for wavefront measurements of an optical system
- Patent number 7,768,653
- Issue date Aug 3, 2010
- ASML Hodling N.V.
- Azat Latypov
- G01 - MEASURING TESTING
Information Patent Grant
Methods and systems to compensate for a stitching disturbance of a...
- Patent number 7,630,054
- Issue date Dec 8, 2009
- ASML Holding N.V.
- Arno Bleeker
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Systems and methods for minimizing scattered light in multi-SLM mas...
- Patent number 7,567,368
- Issue date Jul 28, 2009
- ASML Holding N.V.
- Wenceslao A. Cebuhar
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Optical system for transforming numerical aperture
- Patent number 7,532,403
- Issue date May 12, 2009
- ASML Holding N.V.
- Lev Ryzhikov
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Speckle reduction method and system for EUV interferometry
- Patent number 7,411,687
- Issue date Aug 12, 2008
- ASML Holding N.V.
- Richard A. Gontin
- G01 - MEASURING TESTING
Information Patent Grant
System and method utilizing a lithography tool having modular illum...
- Patent number 7,242,456
- Issue date Jul 10, 2007
- ASML Holdings N.V.
- Lev Ryzhikov
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Lithographic apparatus having double telecentric illumination
- Patent number 7,227,613
- Issue date Jun 5, 2007
- ASML Holding N.V.
- Lev Ryzhikov
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Methods and systems to compensate for a stitching disturbance of a...
- Patent number 7,133,121
- Issue date Nov 7, 2006
- ASML Holding, N.V.
- Arno Bleeker
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
METHODS AND SYSTEMS TO COMPENSATE FOR A STITCHING DISTURBANCE OF A...
- Patent number 6,876,440
- Issue date Apr 5, 2005
- ASML Holding N.V.
- Arno Bleeker
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Patents Applicationslast 30 patents

Information Patent Application
INVARIABLE MAGNIFICATION MULTILEVEL OPTICAL DEVICE WITH TELECENTRIC...
- Publication number 20240053688
- Publication date Feb 15, 2024
- ASML Holding N.V.
- Lev Ryzhikov
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
LITHOGRAPHIC PRE-ALIGNMENT IMAGING SENSOR WITH BUILD-IN COAXIAL ILL...
- Publication number 20230236519
- Publication date Jul 27, 2023
- ASML Holding N.V.
- Yuli Vladimirsky
- G02 - OPTICS
Information Patent Application
LITHOGRAPHIC PATTERNING DEVICE MULTICHANNEL POSITION AND LEVEL GAUGE
- Publication number 20220299893
- Publication date Sep 22, 2022
- ASML Holding N.V.
- Yuli Vladimirsky
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Compact Two-Sided Reticle Inspection System
- Publication number 20170212057
- Publication date Jul 27, 2017
- ASML Holding N.V.
- Stanley G. JANIK
- G01 - MEASURING TESTING
Information Patent Application
Compact Self-Contained Holographic and Interferometric Apparatus
- Publication number 20150085291
- Publication date Mar 26, 2015
- ASML Holding N.V.
- Yuli Vladimirsky
- G01 - MEASURING TESTING
Information Patent Application
LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD
- Publication number 20140264054
- Publication date Sep 18, 2014
- ASML Holding N.V.
- Yuli Vladimirsky
- G01 - MEASURING TESTING
Information Patent Application
OPTICAL SYSTEM, INSPECTION SYSTEM AND MANUFACTURING METHOD
- Publication number 20140098356
- Publication date Apr 10, 2014
- ASML Holding N.V.
- Lev RYZHIKOV
- G02 - OPTICS
Information Patent Application
Surface Inspection System with Advanced Illumination
- Publication number 20120086800
- Publication date Apr 12, 2012
- ASML Holding N.V.
- Yuli VLADIMIRSKY
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
Object Inspection Systems and Methods
- Publication number 20120081684
- Publication date Apr 5, 2012
- ASML NETHERLANDS B.V.
- Arie Jeffrey Den Oef
- G01 - MEASURING TESTING
Information Patent Application
Inspection Apparatus Employing Wide Angle Objective Lens With Optic...
- Publication number 20110317136
- Publication date Dec 29, 2011
- ASML NETHERLANDS B.V.
- Lev Ryzhikov
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
OPTICAL SYSTEM, INSPECTION SYSTEM AND MANUFACTURING METHOD
- Publication number 20110279805
- Publication date Nov 17, 2011
- ASML Holding N.V.
- Lev Ryzhikov
- G02 - OPTICS
Information Patent Application
Diffraction Elements for Alignment Targets
- Publication number 20110019173
- Publication date Jan 27, 2011
- ASML Holding N.V.
- Yuli Vladimirsky
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Particle Detection on an Object Surface
- Publication number 20100045955
- Publication date Feb 25, 2010
- ASML Holding N.V.
- Yuli VLADIMIRSKY
- G01 - MEASURING TESTING
Information Patent Application
Systems and Methods for Minimizing Scattered Light in Multi-SLM Mas...
- Publication number 20100002221
- Publication date Jan 7, 2010
- ASML Holding N.V.
- Wenceslao A. CEBUHAR
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Optical System for Transforming Numerical Aperture
- Publication number 20090251786
- Publication date Oct 8, 2009
- ASML Holding N.V.
- Lev Ryzhikov
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Thin Film Continuous Spatially Modulated Grey Attenuators and Filters
- Publication number 20090122289
- Publication date May 14, 2009
- ASML Holding N.V.
- Yuli VLADIMIRSKY
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Method and system for wavefront measurements of an optical system
- Publication number 20090021748
- Publication date Jan 22, 2009
- ASML Holding N.V.
- Azat M. Latypov
- G01 - MEASURING TESTING
Information Patent Application
Methods and systems to compensate for a stitching disturbance of a...
- Publication number 20080094595
- Publication date Apr 24, 2008
- ASML Holding N.V.
- Arno Bleeker
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Methods and systems to compensate for a stitching disturbance of a...
- Publication number 20080094596
- Publication date Apr 24, 2008
- ASML Holding N.V.
- Arno Bleeker
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
System and Method for Reducing Disturbances Caused by Movement in a...
- Publication number 20070165200
- Publication date Jul 19, 2007
- ASML Holding N.V.
- Lev Ryzhikov
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
System and Method for Reducing Disturbances Caused by Movement in a...
- Publication number 20070165201
- Publication date Jul 19, 2007
- ASML Holding N.V.
- Lev Ryzhikov
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Methods and systems to compensate for a stitching disturbance of a...
- Publication number 20070146672
- Publication date Jun 28, 2007
- ASML Holding N.V.
- Arno Bleeker
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Speckle reduction method and system for EUV interferometry
- Publication number 20060256349
- Publication date Nov 16, 2006
- ASML Holding N.V.
- Richard A. Gontin
- G02 - OPTICS
Information Patent Application
Systems and methods for minimizing scattered light in multi-SLM mas...
- Publication number 20060146308
- Publication date Jul 6, 2006
- ASML Holding N.V.
- Wenceslao A. Cebuhar
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
System and method for reducing disturbances caused by movement in a...
- Publication number 20060044533
- Publication date Mar 2, 2006
- ASMLHolding N.V.
- Lev Ryzhikov
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Lithographic apparatus having double telecentric illumination
- Publication number 20060017902
- Publication date Jan 26, 2006
- ASML Holding N.V.
- Lev Rhyzhikov
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
System and method utilizing a lithography tool having modular illum...
- Publication number 20050264782
- Publication date Dec 1, 2005
- ASML Holding N.V.
- Lev Ryzhikov
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Shearing interferometer with dynamic pupil fill
- Publication number 20050259269
- Publication date Nov 24, 2005
- ASML Holding N.V.
- Azat M. Latypov
- G01 - MEASURING TESTING
Information Patent Application
Methods and systems to compensate for a stitching disturbance of a...
- Publication number 20050170267
- Publication date Aug 4, 2005
- ASML Holding N.V.
- Arno Bleeker
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHODS AND SYSTEMS TO COMPENSATE FOR A STITCHING DISTURBANCE OF A...
- Publication number 20050068514
- Publication date Mar 31, 2005
- Arno Bleeker
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Yuli Vladimirsky

Person

Patents Grantslast 30 patents

Invariable magnification multilevel optical device with telecentric...

Lithographic patterning device multichannel position and level gauge

Compact two-sided reticle inspection system

Lithographic apparatus and device manufacturing method

Optical system, inspection system and manufacturing method

Optical system, inspection system and manufacturing method

Diffraction elements for alignment targets

Particle detection on an object surface

Thin film continuous spatially modulated grey attenuators and filters

Systems and methods for minimizing scattered light in multi-SLM mas...

Optical system for transforming numerical aperture

Methods and systems to compensate for a stitching disturbance of a...

Method and system for wavefront measurements of an optical system

Methods and systems to compensate for a stitching disturbance of a...

Systems and methods for minimizing scattered light in multi-SLM mas...

Optical system for transforming numerical aperture

Speckle reduction method and system for EUV interferometry

System and method utilizing a lithography tool having modular illum...

Lithographic apparatus having double telecentric illumination

Methods and systems to compensate for a stitching disturbance of a...

METHODS AND SYSTEMS TO COMPENSATE FOR A STITCHING DISTURBANCE OF A...

Patents Applicationslast 30 patents

INVARIABLE MAGNIFICATION MULTILEVEL OPTICAL DEVICE WITH TELECENTRIC...

LITHOGRAPHIC PRE-ALIGNMENT IMAGING SENSOR WITH BUILD-IN COAXIAL ILL...

LITHOGRAPHIC PATTERNING DEVICE MULTICHANNEL POSITION AND LEVEL GAUGE

Compact Two-Sided Reticle Inspection System

Compact Self-Contained Holographic and Interferometric Apparatus

LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD

OPTICAL SYSTEM, INSPECTION SYSTEM AND MANUFACTURING METHOD

Surface Inspection System with Advanced Illumination

Object Inspection Systems and Methods

Inspection Apparatus Employing Wide Angle Objective Lens With Optic...

OPTICAL SYSTEM, INSPECTION SYSTEM AND MANUFACTURING METHOD

Diffraction Elements for Alignment Targets

Particle Detection on an Object Surface

Systems and Methods for Minimizing Scattered Light in Multi-SLM Mas...

Optical System for Transforming Numerical Aperture

Thin Film Continuous Spatially Modulated Grey Attenuators and Filters

Method and system for wavefront measurements of an optical system

Methods and systems to compensate for a stitching disturbance of a...

Methods and systems to compensate for a stitching disturbance of a...

System and Method for Reducing Disturbances Caused by Movement in a...

System and Method for Reducing Disturbances Caused by Movement in a...

Methods and systems to compensate for a stitching disturbance of a...

Speckle reduction method and system for EUV interferometry

Systems and methods for minimizing scattered light in multi-SLM mas...

System and method for reducing disturbances caused by movement in a...

Lithographic apparatus having double telecentric illumination

System and method utilizing a lithography tool having modular illum...

Shearing interferometer with dynamic pupil fill

Methods and systems to compensate for a stitching disturbance of a...

METHODS AND SYSTEMS TO COMPENSATE FOR A STITCHING DISTURBANCE OF A...