YUMIKO OHSAKI

Person

UTSUNOMIYA-SHI, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Measuring apparatus and exposure apparatus having the same
- Patent number 8,223,315
- Issue date Jul 17, 2012
- Canon Kabushiki Kaisha
- Yumiko Ohsaki
- G01 - MEASURING TESTING
Information Patent Grant
Measurement apparatus, exposure apparatus, and device manufacturing...
- Patent number 7,956,987
- Issue date Jun 7, 2011
- Canon Kabushiki Kaisha
- Yumiko Ohsaki
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Measurement apparatus, exposure apparatus, and device fabrication m...
- Patent number 7,688,424
- Issue date Mar 30, 2010
- Canon Kabushiki Kaisha
- Yumiko Ohsaki
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Exposure apparatus and device manufacturing method using a common p...
- Patent number 7,675,629
- Issue date Mar 9, 2010
- Canon Kabushiki Kaisha
- Yumiko Ohsaki
- G02 - OPTICS
Information Patent Grant
Measuring apparatus and exposure apparatus having the same
- Patent number 7,538,854
- Issue date May 26, 2009
- Canon Kabushiki Kaisha
- Yumiko Ohsaki
- G01 - MEASURING TESTING
Information Patent Grant
Exposure apparatus and device manufacturing method
- Patent number 7,508,493
- Issue date Mar 24, 2009
- Canon Kabushiki Kaisha
- Seiji Takeuchi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Exposure apparatus and device manufacturing method using the apparatus
- Patent number 7,466,395
- Issue date Dec 16, 2008
- Canon Kabushiki Kaisha
- Yumiko Ohsaki
- G01 - MEASURING TESTING
Information Patent Grant
Image processing apparatus and method for converting data dependent...
- Patent number 7,158,144
- Issue date Jan 2, 2007
- Canon Kabushiki Kaisha
- Yoshinobu Shiraiwa
- H04 - ELECTRIC COMMUNICATION TECHNIQUE
Information Patent Grant
Projection optical system and exposure apparatus
- Patent number 6,975,385
- Issue date Dec 13, 2005
- Canon Kabushiki Kaisha
- Yumiko Ohsaki
- G02 - OPTICS
Information Patent Grant
Interferometer and interferance measurement method
- Patent number 6,842,255
- Issue date Jan 11, 2005
- Canon Kabushiki Kaisha
- Yumiko Ohsaki
- G01 - MEASURING TESTING
Information Patent Grant
Exposure method based on multiple exposure process
- Patent number 6,709,794
- Issue date Mar 23, 2004
- Canon Kabushiki Kaisha
- Yumiko Ohsaki
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Mask for multiple exposure
- Patent number 6,620,556
- Issue date Sep 16, 2003
- Canon Kabushiki Kaisha
- Yumiko Ohsaki
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Exposure method based on multiple exposure process
- Patent number 6,586,168
- Issue date Jul 1, 2003
- Canon Kabushiki Kaisha
- Yumiko Ohsaki
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Multiple exposure method
- Patent number 6,351,304
- Issue date Feb 26, 2002
- Canon Kabushiki Kaisha
- Miyoko Kawashima
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Patents Applicationslast 30 patents

Information Patent Application
MEASURING APPARATUS AND EXPOSURE APPARATUS HAVING THE SAME
- Publication number 20090274964
- Publication date Nov 5, 2009
- Canon Kabushiki Kaisha
- Yumiko Ohsaki
- G02 - OPTICS
Information Patent Application
MEASUREMENT APPARATUS, EXPOSURE APPARATUS, AND DEVICE FABRICATION M...
- Publication number 20090066925
- Publication date Mar 12, 2009
- Canon Kabushiki Kaisha
- Yumiko Ohsaki
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
MEASUREMENT APPARATUS, EXPOSURE APPARATUS, AND DEVICE MANUFACTURING...
- Publication number 20080316448
- Publication date Dec 25, 2008
- Canon Kabushiki Kaisha
- Yumiko Ohsaki
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
EXPOSURE APPARATUS AND DEVICE MANUFACTURING METHOD
- Publication number 20080062427
- Publication date Mar 13, 2008
- Canon Kabushiki Kaisha
- Yumiko Ohsaki
- G02 - OPTICS
Information Patent Application
EXPOSURE APPARATUS AND DEVICE MANUFACTURING METHOD
- Publication number 20070188730
- Publication date Aug 16, 2007
- Seiji Takeuchi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
EXPOSURE APPARATUS AND DEVICE MANUFACTURING METHOD USING THE APPARATUS
- Publication number 20070019175
- Publication date Jan 25, 2007
- Canon Kabushiki Kaisha
- Yumiko Ohsaki
- G01 - MEASURING TESTING
Information Patent Application
MEASURING APPARATUS AND EXPOSURE APPARATUS HAVING THE SAME
- Publication number 20060187435
- Publication date Aug 24, 2006
- Canon Kabushiki Kaisha
- Yumiko Ohsaki
- G02 - OPTICS
Information Patent Application
Projection optical system and exposure apparatus
- Publication number 20040095567
- Publication date May 20, 2004
- Yumiko Ohsaki
- G02 - OPTICS
Information Patent Application
Exposure method based on multiple exposure process
- Publication number 20030203318
- Publication date Oct 30, 2003
- Canon Kabushiki Kaisha
- Yumiko Ohsaki
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Interferometer and interferance measurement method
- Publication number 20020176090
- Publication date Nov 28, 2002
- Yumiko Ohsaki
- G01 - MEASURING TESTING
Information Patent Application
IMAGE PROCESSING APPARATUS, METHOD AND RECORDING MEDIUM THEREFOR
- Publication number 20010040588
- Publication date Nov 15, 2001
- YOSHINOBU SHIRAIWA
- H04 - ELECTRIC COMMUNICATION TECHNIQUE

YUMIKO OHSAKI

Person

Patents Grantslast 30 patents

Measuring apparatus and exposure apparatus having the same

Measurement apparatus, exposure apparatus, and device manufacturing...

Measurement apparatus, exposure apparatus, and device fabrication m...

Exposure apparatus and device manufacturing method using a common p...

Measuring apparatus and exposure apparatus having the same

Exposure apparatus and device manufacturing method

Exposure apparatus and device manufacturing method using the apparatus

Image processing apparatus and method for converting data dependent...

Projection optical system and exposure apparatus

Interferometer and interferance measurement method

Exposure method based on multiple exposure process

Mask for multiple exposure

Exposure method based on multiple exposure process

Multiple exposure method

Patents Applicationslast 30 patents

MEASURING APPARATUS AND EXPOSURE APPARATUS HAVING THE SAME

MEASUREMENT APPARATUS, EXPOSURE APPARATUS, AND DEVICE FABRICATION M...

MEASUREMENT APPARATUS, EXPOSURE APPARATUS, AND DEVICE MANUFACTURING...

EXPOSURE APPARATUS AND DEVICE MANUFACTURING METHOD

EXPOSURE APPARATUS AND DEVICE MANUFACTURING METHOD

EXPOSURE APPARATUS AND DEVICE MANUFACTURING METHOD USING THE APPARATUS

MEASURING APPARATUS AND EXPOSURE APPARATUS HAVING THE SAME

Projection optical system and exposure apparatus

Exposure method based on multiple exposure process

Interferometer and interferance measurement method

IMAGE PROCESSING APPARATUS, METHOD AND RECORDING MEDIUM THEREFOR