Yun-Cheng Lu

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Taipei, TW

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Patents Grantslast 30 patents

Information Patent Grant
Two step post-deposition treatment of ILD layer for a lower dielect...
- Patent number 8,158,521
- Issue date Apr 17, 2012
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Hui-Lin Chang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Two step post-deposition treatment of ILD layer for a lower dielect...
- Patent number 7,250,370
- Issue date Jul 31, 2007
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Hui-Lin Chang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Interconnect structure with dielectric barrier and fabrication meth...
- Patent number 7,196,423
- Issue date Mar 27, 2007
- Taiwan Semiconductor Manufacturing Co., Ltd
- Zhen-Cheng Wu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of reducing visible light induced arcing in a semiconductor...
- Patent number 6,787,484
- Issue date Sep 7, 2004
- Taiwan Semiconductor Manufacturing Co., Ltd
- Chih-Hsiang Yao
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
Two Step Post-Deposition Treatment of ILD Layer for a Lower Dielect...
- Publication number 20080014369
- Publication date Jan 17, 2008
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Hui-Lin Chang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Interconnect structure with dielectric barrier and fabrication meth...
- Publication number 20050212135
- Publication date Sep 29, 2005
- Zhen-Cheng Wu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Two step post-deposition treatment of ILD layer for a lower dielect...
- Publication number 20050064698
- Publication date Mar 24, 2005
- Hui-Lin Chang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method of reducing visible light induced arcing in a semiconductor...
- Publication number 20040115943
- Publication date Jun 17, 2004
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Chih-Hsiang Yao
- H01 - BASIC ELECTRIC ELEMENTS