Yun-Yi LIN

Person

Taichung, TW

People

Patents Grantslast 30 patents

Information Patent Grant
Photomask pellicle including network of nanowires and method of for...
- Patent number 12,266,525
- Issue date Apr 1, 2025
- Taiwan Semiconductor Manufacturing Company Ltd.
- Yun-Yue Lin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Pellicle design for mask application
- Patent number 12,253,797
- Issue date Mar 18, 2025
- Taiwan Semiconductor Manufacturing Co., Ltd
- Yun-Yue Lin
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Extreme ultraviolet mask and method for forming the same
- Patent number 12,253,796
- Issue date Mar 18, 2025
- Taiwan Semiconductor Manufacturing Co., Ltd
- Yun-Yue Lin
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Extreme ultraviolet mask and method of manufacturing the same
- Patent number 12,222,639
- Issue date Feb 11, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd
- Yun-Yue Lin
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
EUV photo masks and manufacturing method thereof
- Patent number 12,210,280
- Issue date Jan 28, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd
- Yun-Yue Lin
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Pellicle for an EUV lithography mask and a method of manufacturing...
- Patent number 12,174,527
- Issue date Dec 24, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd
- Yun-Yue Lin
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Receiver detection system and receiver detection device
- Patent number 12,147,283
- Issue date Nov 19, 2024
- Realtek Semiconductor Corporation
- Yun-Hsien Lin
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Pellicle for an EUV lithography mask and a method of manufacturing...
- Patent number 12,117,725
- Issue date Oct 15, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd
- Yun-Yue Lin
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Pellicle for an EUV lithography mask and a method of manufacturing...
- Patent number 12,066,755
- Issue date Aug 20, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd
- Yun-Yue Lin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Extreme ultraviolet lithography method using robust, high transmiss...
- Patent number 12,055,855
- Issue date Aug 6, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd
- Yun-Yue Lin
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Pellicle having vent hole
- Patent number 12,013,632
- Issue date Jun 18, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd
- Chue San Yoo
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method for forming structure of pellicle-mask structure with vent s...
- Patent number 12,007,685
- Issue date Jun 11, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd
- Yun-Yue Lin
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Circuit check method and electronic apparatus
- Patent number 11,959,956
- Issue date Apr 16, 2024
- Realtek Semiconductor Corp.
- Yun-Jing Lin
- G01 - MEASURING TESTING
Information Patent Grant
Semiconductor device including an epitaxy region
- Patent number 11,955,547
- Issue date Apr 9, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd
- Te-Jen Pan
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Transmission control system of multi-media signal, transmitter cont...
- Patent number 11,936,927
- Issue date Mar 19, 2024
- Realtek Semiconductor Corporation
- Yun-Hung Lin
- G09 - EDUCATION CRYPTOGRAPHY DISPLAY ADVERTISING SEALS
Information Patent Grant
Photomask pellicle and method of forming the same
- Patent number 11,923,196
- Issue date Mar 5, 2024
- Taiwan Semiconductor Manufacturing Company Ltd.
- Yun-Yue Lin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Pellicle assembly and method for advanced lithography
- Patent number 11,914,286
- Issue date Feb 27, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd
- Amo Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
EUV photo masks and manufacturing method thereof
- Patent number 11,886,109
- Issue date Jan 30, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd
- Yun-Yue Lin
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Pellicle and method of using the same
- Patent number 11,868,041
- Issue date Jan 9, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd
- Chue San Yoo
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Extreme ultraviolet mask and method for forming the same
- Patent number 11,846,880
- Issue date Dec 19, 2023
- Taiwan Semiconductor Manufacturing Co., Ltd
- Yun-Yue Lin
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Extreme ultraviolet mask and method of manufacturing the same
- Patent number 11,789,355
- Issue date Oct 17, 2023
- Taiwan Semiconductor Manufacturing Co., Ltd
- Yun-Yue Lin
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Pellicle for an EUV lithography mask and a method of manufacturing...
- Patent number 11,782,339
- Issue date Oct 10, 2023
- Taiwan Semiconductor Manufacturing Company, Ltd
- Yun-Yue Lin
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Pellicle design for mask
- Patent number 11,762,282
- Issue date Sep 19, 2023
- Taiwan Semiconductor Manufacturing Co., Ltd
- Yun-Yue Lin
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Extreme ultraviolet lithography method, extreme ultraviolet mask an...
- Patent number 11,740,549
- Issue date Aug 29, 2023
- Taiwan Semiconductor Manufacturing Company, Ltd
- Yun-Yue Lin
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Leakage analysis on semiconductor device
- Patent number 11,720,738
- Issue date Aug 8, 2023
- Taiwan Semiconductor Manufacturing Co., Ltd
- Cheng-Hua Liu
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Leakage analysis on semiconductor device
- Patent number 11,714,949
- Issue date Aug 1, 2023
- Taiwan Semiconductor Manufacturing Co., Ltd
- Cheng-Hua Liu
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
EUV pellicle with structured ventilation frame
- Patent number 11,662,661
- Issue date May 30, 2023
- Taiwan Semiconductor Manufacturing Co., Ltd
- Yun-Yue Lin
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Robust, high transmission pellicle for extreme ultraviolet lithogra...
- Patent number 11,656,544
- Issue date May 23, 2023
- Taiwan Semiconductor Manufacturing Co., Ltd
- Yun-Yue Lin
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Internet of things system with prediction of farmland soil status a...
- Patent number 11,586,948
- Issue date Feb 21, 2023
- NATIONAL YANG MING CHIAO TUNG UNIVERSITY
- Wen-Liang Chen
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Pellicle and method of manufacturing same
- Patent number 11,526,073
- Issue date Dec 13, 2022
- Taiwan Semiconductor Manufacturing Company, Ltd
- Po Hsuan Li
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Patents Applicationslast 30 patents

Information Patent Application
PELLICLE FOR EUV LITHOGRAPHY MASK
- Publication number 20250076752
- Publication date Mar 6, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Yun-Yue LIN
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
NON-COHERENT NOISE REDUCTION METHOD AND NON-COHERENT NOISE REDUCTIO...
- Publication number 20250078800
- Publication date Mar 6, 2025
- MEDIATEK INC.
- Yun-Shao Lin
- G10 - MUSICAL INSTRUMENTS ACOUSTICS
Information Patent Application
SEMICONDUCTOR STRUCTURE AND METHOD FOR FORMING THE SAME
- Publication number 20240387546
- Publication date Nov 21, 2024
- Taiwan Semiconductor Manufacturing company Ltd.
- PO-YING CHANG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CLOCK OUTPUT DEVICE AND CLOCK DETECTION METHOD
- Publication number 20240388279
- Publication date Nov 21, 2024
- REALTEK SEMICONDUCTOR CORPORATION
- YUN-HSIEN LIN
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
PELLICLE FOR AN EUV LITHOGRAPHY MASK AND A METHOD OF MANUFACTURING...
- Publication number 20240377724
- Publication date Nov 14, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Yun-Yue LIN
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PELLICLE HAVING VENT HOLE
- Publication number 20240329517
- Publication date Oct 3, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Chue San YOO
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD FOR FORMING STRUCTURE OF PELLICLE-MASK STRUCTURE WITH VENT S...
- Publication number 20240280894
- Publication date Aug 22, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Yun-Yue LIN
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
EXTREME ULTRAVIOLET MASK AND METHOD FOR FORMING THE SAME
- Publication number 20240192582
- Publication date Jun 13, 2024
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Yun-Yue LIN
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PHOTOMASK PELLICLE AND METHOD OF FORMING THE SAME
- Publication number 20240177994
- Publication date May 30, 2024
- Taiwan Semiconductor Manufacturing company Ltd.
- YUN-YUE LIN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
EUV PHOTO MASKS AND MANUFACTURING METHOD THEREOF
- Publication number 20240134266
- Publication date Apr 25, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Yun-Yue LIN
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
SYSTEM AND STRUCTURE INCLUDING A PELLICLE
- Publication number 20240103358
- Publication date Mar 28, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Chue San YOO
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PELLICLE FOR AN EUV LITHOGRAPHY MASK AND A METHOD OF MANUFACTURING...
- Publication number 20230384661
- Publication date Nov 30, 2023
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Yun-Yue LIN
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PELLICLE DESIGN FOR MASK APPLICATION
- Publication number 20230367205
- Publication date Nov 16, 2023
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Yun-Yue LIN
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PELLICLE FOR AN EUV LITHOGRAPHY MASK AND A METHOD OF MANUFACTURING...
- Publication number 20230367203
- Publication date Nov 16, 2023
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Yun-Yue LIN
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
EXTREME ULTRAVIOLET MASK AND METHOD OF MANUFACTURING THE SAME
- Publication number 20230359115
- Publication date Nov 9, 2023
- Taiwan Semiconductor Manufacturing company Ltd.
- Yun-Yue LIN
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
EXTREME ULTRAVIOLET MASK AND METHOD FOR FORMING THE SAME
- Publication number 20230314926
- Publication date Oct 5, 2023
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Yun-Yue LIN
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
LEAKAGE ANALYSIS ON SEMICONDUCTOR DEVICE
- Publication number 20230306181
- Publication date Sep 28, 2023
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Cheng-Hua LIU
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
EUV PELLICLE WITH STRUCTURED VENTILATION FRAME
- Publication number 20230259020
- Publication date Aug 17, 2023
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Yun-Yue LIN
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
EXTREME ULTRAVIOLET LITHOGRAPHY METHOD USING ROBUST, HIGH TRANSMISS...
- Publication number 20230251566
- Publication date Aug 10, 2023
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Yun-Yue LIN
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Receiver detection system and receiver detection device
- Publication number 20230236647
- Publication date Jul 27, 2023
- REALTEK SEMICONDUCTOR CORPORATION
- YUN-HSIEN LIN
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
EUV PHOTO MASKS AND MANUFACTURING METHOD THEREOF
- Publication number 20230071118
- Publication date Mar 9, 2023
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Yun-Yue LIN
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PELLICLE AND METHOD OF USING THE SAME
- Publication number 20230061320
- Publication date Mar 2, 2023
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Chue San YOO
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PELLICLE FOR AN EUV LITHOGRAPHY MASK AND A METHOD OF MANUFACTURING...
- Publication number 20230069583
- Publication date Mar 2, 2023
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Yun-Yue LIN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Pellicle Design for Mask
- Publication number 20220357649
- Publication date Nov 10, 2022
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Yun-Yue LIN
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
MASK FOR EUV LITHOGRAPHY AND METHOD OF MANUFACTURING THE SAME
- Publication number 20220334463
- Publication date Oct 20, 2022
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Yun-Yue LIN
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
EXTREME ULTRAVIOLET LITHOGRAPHY METHOD, EXTREME ULTRAVIOLET MASK AN...
- Publication number 20220326597
- Publication date Oct 13, 2022
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Yun-Yue LIN
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PHOTOMASK PELLICLE AND METHOD OF FORMING THE SAME
- Publication number 20220283493
- Publication date Sep 8, 2022
- Taiwan Semiconductor Manufacturing company Ltd.
- YUN-YUE LIN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
EXTREME ULTRAVIOLET MASK AND METHOD FOR FORMING THE SAME
- Publication number 20220269163
- Publication date Aug 25, 2022
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Yun-Yue LIN
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
ROBUST, HIGH TRANSMISSION PELLICLE FOR EXTREME ULTRAVIOLET LITHOGRA...
- Publication number 20220252986
- Publication date Aug 11, 2022
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Yun-Yue LIN
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Pellicle Assembly and Method for Advanced Lithography
- Publication number 20220229360
- Publication date Jul 21, 2022
- Taiwan Semiconductor Manufacturing Company, Ltd.
- AMO CHEN
- H01 - BASIC ELECTRIC ELEMENTS

Person

Patents Grantslast 30 patents

Photomask pellicle including network of nanowires and method of for...

Pellicle design for mask application

Extreme ultraviolet mask and method for forming the same

Extreme ultraviolet mask and method of manufacturing the same

EUV photo masks and manufacturing method thereof

Pellicle for an EUV lithography mask and a method of manufacturing...

Receiver detection system and receiver detection device

Pellicle for an EUV lithography mask and a method of manufacturing...

Pellicle for an EUV lithography mask and a method of manufacturing...

Extreme ultraviolet lithography method using robust, high transmiss...

Pellicle having vent hole

Method for forming structure of pellicle-mask structure with vent s...

Circuit check method and electronic apparatus

Semiconductor device including an epitaxy region

Transmission control system of multi-media signal, transmitter cont...

Photomask pellicle and method of forming the same

Pellicle assembly and method for advanced lithography

EUV photo masks and manufacturing method thereof

Pellicle and method of using the same

Extreme ultraviolet mask and method for forming the same

Extreme ultraviolet mask and method of manufacturing the same

Pellicle for an EUV lithography mask and a method of manufacturing...

Pellicle design for mask

Extreme ultraviolet lithography method, extreme ultraviolet mask an...

Leakage analysis on semiconductor device

Leakage analysis on semiconductor device

EUV pellicle with structured ventilation frame

Robust, high transmission pellicle for extreme ultraviolet lithogra...

Internet of things system with prediction of farmland soil status a...

Pellicle and method of manufacturing same

Patents Applicationslast 30 patents

PELLICLE FOR EUV LITHOGRAPHY MASK

NON-COHERENT NOISE REDUCTION METHOD AND NON-COHERENT NOISE REDUCTIO...

SEMICONDUCTOR STRUCTURE AND METHOD FOR FORMING THE SAME

CLOCK OUTPUT DEVICE AND CLOCK DETECTION METHOD

PELLICLE FOR AN EUV LITHOGRAPHY MASK AND A METHOD OF MANUFACTURING...

PELLICLE HAVING VENT HOLE

METHOD FOR FORMING STRUCTURE OF PELLICLE-MASK STRUCTURE WITH VENT S...

EXTREME ULTRAVIOLET MASK AND METHOD FOR FORMING THE SAME

PHOTOMASK PELLICLE AND METHOD OF FORMING THE SAME

EUV PHOTO MASKS AND MANUFACTURING METHOD THEREOF

SYSTEM AND STRUCTURE INCLUDING A PELLICLE

PELLICLE FOR AN EUV LITHOGRAPHY MASK AND A METHOD OF MANUFACTURING...

PELLICLE DESIGN FOR MASK APPLICATION

PELLICLE FOR AN EUV LITHOGRAPHY MASK AND A METHOD OF MANUFACTURING...

EXTREME ULTRAVIOLET MASK AND METHOD OF MANUFACTURING THE SAME

EXTREME ULTRAVIOLET MASK AND METHOD FOR FORMING THE SAME

LEAKAGE ANALYSIS ON SEMICONDUCTOR DEVICE

EUV PELLICLE WITH STRUCTURED VENTILATION FRAME

EXTREME ULTRAVIOLET LITHOGRAPHY METHOD USING ROBUST, HIGH TRANSMISS...

Receiver detection system and receiver detection device

EUV PHOTO MASKS AND MANUFACTURING METHOD THEREOF

PELLICLE AND METHOD OF USING THE SAME

PELLICLE FOR AN EUV LITHOGRAPHY MASK AND A METHOD OF MANUFACTURING...

Pellicle Design for Mask

MASK FOR EUV LITHOGRAPHY AND METHOD OF MANUFACTURING THE SAME

EXTREME ULTRAVIOLET LITHOGRAPHY METHOD, EXTREME ULTRAVIOLET MASK AN...

PHOTOMASK PELLICLE AND METHOD OF FORMING THE SAME

EXTREME ULTRAVIOLET MASK AND METHOD FOR FORMING THE SAME

ROBUST, HIGH TRANSMISSION PELLICLE FOR EXTREME ULTRAVIOLET LITHOGRA...

Pellicle Assembly and Method for Advanced Lithography