Yung-Hee Yvette Lee

Person

San Jose, CA, US

People

Patents Grantslast 30 patents

Information Patent Grant
Process for etching a metal layer suitable for use in photomask fab...
- Patent number 8,202,441
- Issue date Jun 19, 2012
- Applied Materials, Inc.
- Madhavi R. Chandrachood
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method of reducing critical dimension bias during fabrication of a...
- Patent number 7,737,040
- Issue date Jun 15, 2010
- Applied Materials, Inc.
- Christopher Dennis Bencher
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Process for etching a metal layer suitable for use in photomask fab...
- Patent number 7,682,518
- Issue date Mar 23, 2010
- Applied Materials, Inc.
- Madhavi R. Chandrachood
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Process for etching photomasks
- Patent number 7,521,000
- Issue date Apr 21, 2009
- Applied Materials, Inc.
- Madhavi R. Chandrachood
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Reticle fabrication using a removable hard mask
- Patent number 7,365,014
- Issue date Apr 29, 2008
- Applied Materials, Inc.
- Christopher Dennis Bencher
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Integrated phase angle and optical critical dimension measurement m...
- Patent number 7,250,309
- Issue date Jul 31, 2007
- Applied Materials, Inc.
- Alfred W. Mak
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Etching method having high silicon-to-photoresist selectivity
- Patent number 6,921,723
- Issue date Jul 26, 2005
- Applied Materials, Inc.
- Yung-Hee Yvette Lee
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
PROCESS FOR ETCHING A METAL LAYER SUITABLE FOR USE IN PHOTOMASK FAB...
- Publication number 20100178600
- Publication date Jul 15, 2010
- Applied Materials, Inc.
- Madhavi R. Chandrachood
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Method of reducing critical dimension bias during fabrication of a...
- Publication number 20080096138
- Publication date Apr 24, 2008
- APPLIED MATERIALS, INC.
- Christopher Dennis Bencher
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
INTEGRATED PHASE ANGLE AND OPTICAL CRITICAL DIMENSION MEASUREMENT M...
- Publication number 20070296980
- Publication date Dec 27, 2007
- ALFRED W. MAK
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Process for etching photomasks
- Publication number 20070184354
- Publication date Aug 9, 2007
- Madhavi R. Chandrachood
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
PROCESS FOR ETCHING A METAL LAYER SUITABLE FOR USE IN PHOTOMASK FAB...
- Publication number 20070105381
- Publication date May 10, 2007
- Madhavi R. Chandrachood
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Reticle fabrication using a removable hard mask
- Publication number 20050170655
- Publication date Aug 4, 2005
- Christopher Dennis Bencher
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Integrated phase angle and optical critical dimension measurement m...
- Publication number 20050153564
- Publication date Jul 14, 2005
- APPLIED MATERIALS, INC.
- Alfred W. Mak
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Yung-Hee Yvette Lee

Person

Patents Grantslast 30 patents

Process for etching a metal layer suitable for use in photomask fab...

Method of reducing critical dimension bias during fabrication of a...

Process for etching a metal layer suitable for use in photomask fab...

Process for etching photomasks

Reticle fabrication using a removable hard mask

Integrated phase angle and optical critical dimension measurement m...

Etching method having high silicon-to-photoresist selectivity

Patents Applicationslast 30 patents

PROCESS FOR ETCHING A METAL LAYER SUITABLE FOR USE IN PHOTOMASK FAB...

Method of reducing critical dimension bias during fabrication of a...

INTEGRATED PHASE ANGLE AND OPTICAL CRITICAL DIMENSION MEASUREMENT M...

Process for etching photomasks

PROCESS FOR ETCHING A METAL LAYER SUITABLE FOR USE IN PHOTOMASK FAB...

Reticle fabrication using a removable hard mask

Integrated phase angle and optical critical dimension measurement m...