Yunhwan Kim

Person

Hwaseong-si, KR

People

Patents Grantslast 30 patents

Information Patent Grant
Impedance measurement jig and method of controlling a substrate-pro...
- Patent number 12,210,045
- Issue date Jan 28, 2025
- Samsung Electronics Co., Ltd.
- Byeongsang Kim
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Etching apparatus
- Patent number 11,515,193
- Issue date Nov 29, 2022
- Samsung Electronics Co., Ltd.
- Kuihyun Yoon
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus and method of manufacturing semiconduct...
- Patent number 11,348,760
- Issue date May 31, 2022
- Samsung Electronics Co., Ltd.
- Akira Koshiishi
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
PLASMA PROCESSING APPARATUS
- Publication number 20230402258
- Publication date Dec 14, 2023
- Samsung Electronics Co., Ltd.
- Yunhwan KIM
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING APPARATUS
- Publication number 20230317418
- Publication date Oct 5, 2023
- Samsung Electronics Co., Ltd.
- Jungmin KO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING APPARATUS INCLUDING PLURALITY OF ELECTRODES
- Publication number 20230100582
- Publication date Mar 30, 2023
- Samsung Electronics Co., Ltd.
- Yunhwan KIM
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA ETCHING APPARATUS AND SEMICONDUCTOR PROCESSING SYSTEM
- Publication number 20230078095
- Publication date Mar 16, 2023
- Samsung Electronics Co., Ltd.
- Dougyong SUNG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
IMPEDANCE MEASUREMENT JIG AND METHOD OF CONTROLLING A SUBSTRATE-PRO...
- Publication number 20230010881
- Publication date Jan 12, 2023
- Samsung Electronics Co., Ltd.
- Byeongsang KIM
- G01 - MEASURING TESTING
Information Patent Application
PLASMA PROCESSING APPARATUS AND METHOD OF MANUFACTURING SEMICONDUCT...
- Publication number 20210142985
- Publication date May 13, 2021
- Samsung Electronics Co., Ltd.
- AKIRA KOSHIISHI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ETCHING APPARATUS
- Publication number 20210111056
- Publication date Apr 15, 2021
- Samsung Electronics Co., Ltd.
- Kuihyun Yoon
- H01 - BASIC ELECTRIC ELEMENTS

Yunhwan Kim

Person

Patents Grantslast 30 patents

Impedance measurement jig and method of controlling a substrate-pro...

Etching apparatus

Plasma processing apparatus and method of manufacturing semiconduct...

Patents Applicationslast 30 patents

PLASMA PROCESSING APPARATUS

SUBSTRATE PROCESSING APPARATUS

SUBSTRATE PROCESSING APPARATUS INCLUDING PLURALITY OF ELECTRODES

PLASMA ETCHING APPARATUS AND SEMICONDUCTOR PROCESSING SYSTEM

IMPEDANCE MEASUREMENT JIG AND METHOD OF CONTROLLING A SUBSTRATE-PRO...

PLASMA PROCESSING APPARATUS AND METHOD OF MANUFACTURING SEMICONDUCT...

ETCHING APPARATUS