Yunwen Huang

Person

Shanghai, CN

People

Patents Grantslast 30 patents

Information Patent Grant
Capacitively coupled plasma etching apparatus
- Patent number 11,670,515
- Issue date Jun 6, 2023
- ADVANCED MICRO-FABRICATION EQUIPMENT INC. CHINA
- Yunwen Huang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Capacitively coupled plasma etching apparatus
- Patent number 11,515,168
- Issue date Nov 29, 2022
- ADVANCED MICRO-FABRICATION EQUIPMENT INC. CHINA
- Yunwen Huang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Capacitively coupled plasma etching apparatus
- Patent number 11,373,843
- Issue date Jun 28, 2022
- ADVANCED MICRO-FABRICATION EQUIPMENT INC. CHINA
- Yunwen Huang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods and apparatus for cleaning semiconductor wafers
- Patent number 10,020,208
- Issue date Jul 10, 2018
- ACM Research (Shanghai) Inc.
- Jian Wang
- B08 - CLEANING
Information Patent Grant
Methods and apparatus for cleaning semiconductor wafers
- Patent number 9,633,833
- Issue date Apr 25, 2017
- ACM Research (Shanghai) Inc.
- Jian Wang
- B08 - CLEANING
Information Patent Grant
Methods and apparatus for cleaning semiconductor wafers
- Patent number 9,595,457
- Issue date Mar 14, 2017
- ACM Research (Shanghai) Inc.
- Jian Wang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods and apparatus for cleaning semiconductor wafers
- Patent number 9,492,852
- Issue date Nov 15, 2016
- ACM Research (Shanghai) Inc.
- Jian Wang
- B08 - CLEANING
Information Patent Grant
Methods and apparatus for cleaning semiconductor wafers
- Patent number 8,671,961
- Issue date Mar 18, 2014
- ACM Research (Shanghai) Inc.
- Voha Nuch
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods and apparatus for cleaning semiconductor wafers
- Patent number 8,580,042
- Issue date Nov 12, 2013
- ACM Research (Shanghai) Inc.
- Voha Nuch
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plating apparatus for metallization on semiconductor workpiece
- Patent number 8,518,224
- Issue date Aug 27, 2013
- ACM Research (Shanghai) Inc.
- Yue Ma
- C25 - ELECTROLYTIC OR ELECTROPHORETIC PROCESSES APPARATUS THEREFOR

Patents Applicationslast 30 patents

Information Patent Application
PLASMA PROCESSING APPARATUS AND METHOD OF ADJUSTING THE SAME
- Publication number 20220157570
- Publication date May 19, 2022
- Advanced Micro-Fabrication Equipment Inc. China
- Mingming WANG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Capacitively Coupled Plasma Etching Apparatus
- Publication number 20200194276
- Publication date Jun 18, 2020
- Advanced Micro-Fabrication Equipment Inc. China
- Yunwen Huang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Capacitively Coupled Plasma Etching Apparatus
- Publication number 20200194230
- Publication date Jun 18, 2020
- Advanced Micro-Fabrication Equipment Inc. China
- Yunwen Huang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Capacitively Coupled Plasma Etching Apparatus
- Publication number 20200194275
- Publication date Jun 18, 2020
- Advanced Micro-Fabrication Equipment Inc. China
- Yunwen Huang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHODS AND APPARATUS FOR CLEANING SEMICONDUCTOR WAFERS
- Publication number 20170140952
- Publication date May 18, 2017
- ACM Research (Shanghai) Inc.
- Jian Wang
- B08 - CLEANING
Information Patent Application
Methods and Apparatus for Cleaning Semiconductor Wafers
- Publication number 20170032959
- Publication date Feb 2, 2017
- ACM Research (Shanghai) Inc.
- Jian Wang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Methods and Apparatus for Cleaning Semiconductor Wafers
- Publication number 20140034094
- Publication date Feb 6, 2014
- ACM Research (Shanghai) Inc.
- Voha Nuch
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Methods and Apparatus for Cleaning Semiconductor Wafers
- Publication number 20120097195
- Publication date Apr 26, 2012
- Jian Wang
- B08 - CLEANING
Information Patent Application
Methods and Apparatus for Cleaning Semiconductor Wafers
- Publication number 20110290277
- Publication date Dec 1, 2011
- Jian Wang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHODS AND APPARATUS FOR CLEANING SEMICONDUCTOR WAFERS
- Publication number 20110114120
- Publication date May 19, 2011
- Voha Nuch
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLATING APPARATUS FOR METALLIZATION ON SEMICONDUCTOR WORKPIECE
- Publication number 20100307913
- Publication date Dec 9, 2010
- ACM Research (Shanghai) Inc.
- Yue Ma
- C25 - ELECTROLYTIC OR ELECTROPHORETIC PROCESSES APPARATUS THEREFOR

Yunwen Huang

Person

Patents Grantslast 30 patents

Capacitively coupled plasma etching apparatus

Capacitively coupled plasma etching apparatus

Capacitively coupled plasma etching apparatus

Methods and apparatus for cleaning semiconductor wafers

Methods and apparatus for cleaning semiconductor wafers

Methods and apparatus for cleaning semiconductor wafers

Methods and apparatus for cleaning semiconductor wafers

Methods and apparatus for cleaning semiconductor wafers

Methods and apparatus for cleaning semiconductor wafers

Plating apparatus for metallization on semiconductor workpiece

Patents Applicationslast 30 patents

PLASMA PROCESSING APPARATUS AND METHOD OF ADJUSTING THE SAME

Capacitively Coupled Plasma Etching Apparatus

Capacitively Coupled Plasma Etching Apparatus

Capacitively Coupled Plasma Etching Apparatus

METHODS AND APPARATUS FOR CLEANING SEMICONDUCTOR WAFERS

Methods and Apparatus for Cleaning Semiconductor Wafers

Methods and Apparatus for Cleaning Semiconductor Wafers

Methods and Apparatus for Cleaning Semiconductor Wafers

Methods and Apparatus for Cleaning Semiconductor Wafers

METHODS AND APPARATUS FOR CLEANING SEMICONDUCTOR WAFERS

PLATING APPARATUS FOR METALLIZATION ON SEMICONDUCTOR WORKPIECE