Yuqiong Dai

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Santa Clara, CA, US

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Patents Grantslast 30 patents

Information Patent Grant
Fully self-aligned subtractive etch
- Patent number 11,869,807
- Issue date Jan 9, 2024
- Applied Materials, Inc.
- Lili Feng
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
DRY DEVELOP PROCESS OF PHOTORESIST
- Publication number 20220004105
- Publication date Jan 6, 2022
- Applied Materials, Inc.
- Yuqiong Dai
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
FULLY SELF-ALIGNED SUBTRACTIVE ETCH
- Publication number 20210391215
- Publication date Dec 16, 2021
- Applied Materials, Inc.
- Lili Feng
- H01 - BASIC ELECTRIC ELEMENTS