Yuri Nikolaevich Tolmachev

Person

Suwon-city, KR

People

Patents Grantslast 30 patents

Information Patent Grant
Plasma generating apparatus
- Patent number 8,169,148
- Issue date May 1, 2012
- Samsung Electronics Co., Ltd.
- Sang Jean Jeon
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Apparatus and method to generate plasma
- Patent number 7,804,250
- Issue date Sep 28, 2010
- Samsung Electronics Co., Ltd.
- Andrey Ushakov
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Inductively coupled antenna and plasma processing apparatus using t...
- Patent number 7,740,738
- Issue date Jun 22, 2010
- Samsung Electronics Co., Ltd.
- Tae-wan Kim
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Ionized physical vapor deposition apparatus using helical self-reso...
- Patent number 7,404,879
- Issue date Jul 29, 2008
- Samsung Electronics Co., Ltd.
- Yuri Nikolaevich Tolmachev
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Inductively coupled plasma generating apparatus incorporating serpe...
- Patent number 7,381,292
- Issue date Jun 3, 2008
- Samsung Electronics Co., Ltd.
- Young-dong Lee
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma accelerator
- Patent number 7,355,357
- Issue date Apr 8, 2008
- Samsung Electronics Co., Ltd.
- Won-taek Park
- F03 - MACHINES OR ENGINES FOR LIQUIDS WIND, SPRING WEIGHT AND MISCELLANEOUS M...
Information Patent Grant
Gas injection apparatus for semiconductor processing system
- Patent number 7,252,716
- Issue date Aug 7, 2007
- Samsung Electronics Co., Ltd.
- Tae-wan Kim
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
High-density plasma processing apparatus
- Patent number 7,210,424
- Issue date May 1, 2007
- Samsung Electronics Co., Ltd.
- Yuri Nikolaevich Tolmachev
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Magnetron cathode and magnetron sputtering apparatus comprising the...
- Patent number 7,052,583
- Issue date May 30, 2006
- Samsung Electronics Co., Ltd.
- Sergiy Yakovlevich Navala
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Inductively coupled plasma system
- Patent number 6,835,919
- Issue date Dec 28, 2004
- Samsung Electronics Co., Ltd.
- Yuri Nikolaevich Tolmachev
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
Plasma generating apparatus
- Publication number 20100065215
- Publication date Mar 18, 2010
- SAMSUNG ELECTRONICS CO., LTD.
- Sang Jean Jeon
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Plasma generating apparatus
- Publication number 20090015165
- Publication date Jan 15, 2009
- SAMSUNG ELETRONICS CO., LTD.
- Sang Jean Jeon
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Plasma based ion implantation system
- Publication number 20080289576
- Publication date Nov 27, 2008
- Samsung Electronics Co., Ltd.
- Young dong Lee
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
APPARATUS AND METHOD TO GENERATE PLASMA
- Publication number 20080061702
- Publication date Mar 13, 2008
- Samsung Electronics Co., Ltd.
- Andrey Ushakov
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ION ANALYSIS SYSTEM BASED ON ANALYZER OF ION ENERGY DISTRIBUTION US...
- Publication number 20080032427
- Publication date Feb 7, 2008
- Samsung Electronics Co., Ltd.
- Yung Hee Lee
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Plasma based ion implantation apparatus
- Publication number 20080023653
- Publication date Jan 31, 2008
- Samsung Electronics Co., Ltd.
- Young dong Lee
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Multi-channel plasma accelerator
- Publication number 20070114903
- Publication date May 24, 2007
- SAMSUNG ELECTRONICS CO., LTD.
- Yuri Tolmachev
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Application
Plasma accelerator
- Publication number 20070068457
- Publication date Mar 29, 2007
- Samsung Electronics Co., Ltd.
- Won-taek Park
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Application
Plasma generating apparatus and plasma processing apparatus
- Publication number 20050173069
- Publication date Aug 11, 2005
- Samsung Electronics Co., Ltd.
- Yuri Nikolaevich Tolmachev
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Plasma chemical vapor deposition system and method for coating both...
- Publication number 20050170668
- Publication date Aug 4, 2005
- Samsung Electronics Co., Ltd.
- Young-soo Park
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Ionized physical vapor deposition apparatus using helical self-reso...
- Publication number 20050103623
- Publication date May 19, 2005
- Samsung Electronics Co., Ltd.
- Yuri Nikolaevich Tolmachev
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
High-density plasma processing apparatus
- Publication number 20040261720
- Publication date Dec 30, 2004
- Yuri Nikolaevich Tolmachev
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Inductively coupled antenna and plasma processing apparatus using t...
- Publication number 20040149387
- Publication date Aug 5, 2004
- Tae-wan Kim
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Magnetron cathode and magnetron sputtering apparatus comprising the...
- Publication number 20040140204
- Publication date Jul 22, 2004
- Sergiy Yakovlevich Navala
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Gas injection apparatus for semiconductor processing system
- Publication number 20040099378
- Publication date May 27, 2004
- Tae-Wan Kim
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Inductively coupled plasma generating apparatus incorporating serpe...
- Publication number 20040079485
- Publication date Apr 29, 2004
- SAMSUNG ELECTRONICS CO., LTD.
- Young-Dong Lee
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Inductively coupled plasma system
- Publication number 20030111963
- Publication date Jun 19, 2003
- Yuri Nikolaevich Tolmachev
- H01 - BASIC ELECTRIC ELEMENTS

Yuri Nikolaevich Tolmachev

Person

Patents Grantslast 30 patents

Plasma generating apparatus

Apparatus and method to generate plasma

Inductively coupled antenna and plasma processing apparatus using t...

Ionized physical vapor deposition apparatus using helical self-reso...

Inductively coupled plasma generating apparatus incorporating serpe...

Plasma accelerator

Gas injection apparatus for semiconductor processing system

High-density plasma processing apparatus

Magnetron cathode and magnetron sputtering apparatus comprising the...

Inductively coupled plasma system

Patents Applicationslast 30 patents

Plasma generating apparatus

Plasma generating apparatus

Plasma based ion implantation system

APPARATUS AND METHOD TO GENERATE PLASMA

ION ANALYSIS SYSTEM BASED ON ANALYZER OF ION ENERGY DISTRIBUTION US...

Plasma based ion implantation apparatus

Multi-channel plasma accelerator

Plasma accelerator

Plasma generating apparatus and plasma processing apparatus

Plasma chemical vapor deposition system and method for coating both...

Ionized physical vapor deposition apparatus using helical self-reso...

High-density plasma processing apparatus

Inductively coupled antenna and plasma processing apparatus using t...

Magnetron cathode and magnetron sputtering apparatus comprising the...

Gas injection apparatus for semiconductor processing system

Inductively coupled plasma generating apparatus incorporating serpe...

Inductively coupled plasma system