Yuri Paskover

Person

Caesarea, IL

People

Patents Grantslast 30 patents

Information Patent Grant
Enhancing performance of overlay metrology
- Patent number 12,001,148
- Issue date Jun 4, 2024
- KLA Corporation
- Amnon Manassen
- H04 - ELECTRIC COMMUNICATION TECHNIQUE
Information Patent Grant
Perception camera with road surface glare reduction
- Patent number 11,874,539
- Issue date Jan 16, 2024
- GM Global Technology Operations LLC
- Tzvi Philipp
- B60 - VEHICLES IN GENERAL
Information Patent Grant
Optical near-field metrology
- Patent number 11,815,347
- Issue date Nov 14, 2023
- KLA-Tencor Corporation
- Yuri Paskover
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Enhancing performance of overlay metrology
- Patent number 11,592,755
- Issue date Feb 28, 2023
- KLA Corporation
- Amnon Manassen
- H04 - ELECTRIC COMMUNICATION TECHNIQUE
Information Patent Grant
Non-orthogonal target and method for using the same in measuring mi...
- Patent number 11,409,205
- Issue date Aug 9, 2022
- KLA Corporation
- Itay Gdor
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Topographic phase control for overlay measurement
- Patent number 11,314,173
- Issue date Apr 26, 2022
- KLA-Tencor Corporation
- Vladimir Levinski
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Off-axis illumination overlay measurement using two-diffracted orde...
- Patent number 11,281,111
- Issue date Mar 22, 2022
- KLA-Tencor Corporation
- Yoni Shalibo
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Single cell grey scatterometry overlay targets and their measuremen...
- Patent number 11,119,417
- Issue date Sep 14, 2021
- Amnon Manassen
- G01 - MEASURING TESTING
Information Patent Grant
Parameter-stable misregistration measurement amelioration in semico...
- Patent number 11,101,153
- Issue date Aug 24, 2021
- KLA Corporation
- Vladimir Levinski
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Estimating amplitude and phase asymmetry in imaging technology for...
- Patent number 10,866,090
- Issue date Dec 15, 2020
- KLA-Tencor Corporation
- Tal Marciano
- G01 - MEASURING TESTING
Information Patent Grant
Diffraction based overlay scatterometry
- Patent number 10,824,079
- Issue date Nov 3, 2020
- KLA-Tencor Corporation
- Yuval Lubashevsky
- G01 - MEASURING TESTING
Information Patent Grant
Localized telecentricity and focus optimization for overlay metrology
- Patent number 10,677,588
- Issue date Jun 9, 2020
- KLA-Tencor Corporation
- Andrew V. Hill
- G01 - MEASURING TESTING
Information Patent Grant
Process compatibility improvement by fill factor modulation
- Patent number 10,579,768
- Issue date Mar 3, 2020
- KLA-Tencor Corporation
- Vladimir Levinski
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Utilizing overlay misregistration error estimations in imaging over...
- Patent number 10,565,697
- Issue date Feb 18, 2020
- KLA-Tencor Corporation
- Tzahi Grunzweig
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Topographic phase control for overlay measurement
- Patent number 10,520,832
- Issue date Dec 31, 2019
- KLA-Tencor Corporation
- Vladimir Levinski
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Systems and methods for metrology with layer-specific illumination...
- Patent number 10,444,161
- Issue date Oct 15, 2019
- KLA-Tencor Corporation
- Amnon Manassen
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Quality estimation and improvement of imaging metrology targets
- Patent number 10,408,602
- Issue date Sep 10, 2019
- KLA-Tencor Corporation
- Boris Efraty
- G01 - MEASURING TESTING
Information Patent Grant
Simultaneous capturing of overlay signals from multiple targets
- Patent number 10,401,228
- Issue date Sep 3, 2019
- KLA-Tencor Corporation
- Andrew V. Hill
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Approaches in first order scatterometry overlay based on introducti...
- Patent number 10,197,389
- Issue date Feb 5, 2019
- KLA-Tencor Corporation
- Vladimir Levinski
- G01 - MEASURING TESTING
Information Patent Grant
Metrology imaging targets having reflection-symmetric pairs of refl...
- Patent number 10,190,979
- Issue date Jan 29, 2019
- KLA-Tencor Corporation
- Amnon Manassen
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Compound objectives for imaging and scatterometry overlay
- Patent number 10,139,528
- Issue date Nov 27, 2018
- KLA-Tencor Corporation
- Joel Seligson
- G02 - OPTICS
Information Patent Grant
Self-moiré target design principles for measuring unresolved device...
- Patent number 10,101,592
- Issue date Oct 16, 2018
- KLA-Tencor Corporation
- Vladimir Levinski
- G01 - MEASURING TESTING
Information Patent Grant
Simultaneous capturing of overlay signals from multiple targets
- Patent number 10,048,132
- Issue date Aug 14, 2018
- KLA-Tencor Corporation
- Andrew V. Hill
- G01 - MEASURING TESTING
Information Patent Grant
Self-moire target design principles for measuring unresolved device...
- Patent number 9,864,209
- Issue date Jan 9, 2018
- KLA-Tencor Corporation
- Vladimir Levinski
- G02 - OPTICS

Patents Applicationslast 30 patents

Information Patent Application
PERCEPTION CAMERA WITH ROAD SURFACE GLARE REDUCTION
- Publication number 20240019720
- Publication date Jan 18, 2024
- GM GLOBAL TECHNOLOGY OPERATIONS LLC
- Tzvi Philipp
- B60 - VEHICLES IN GENERAL
Information Patent Application
ENHANCING PERFORMANCE OF OVERLAY METROLOGY
- Publication number 20230400780
- Publication date Dec 14, 2023
- KLA Corporation
- Amnon Manassen
- H04 - ELECTRIC COMMUNICATION TECHNIQUE
Information Patent Application
SYSTEMS AND METHODS FOR ROTATIONAL CALIBRATION OF METROLOGY TOOLS
- Publication number 20230068016
- Publication date Mar 2, 2023
- KLA Corporation
- Alexander Novikov
- G01 - MEASURING TESTING
Information Patent Application
ENHANCING PERFORMANCE OF OVERLAY METROLOGY
- Publication number 20220317577
- Publication date Oct 6, 2022
- KLA Corporation
- Amnon Manassen
- G02 - OPTICS
Information Patent Application
Systems and Methods for Measurement of Misregistration and Ameliora...
- Publication number 20220307824
- Publication date Sep 29, 2022
- KLA Corporation
- Roie Volkovich
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Single Cell Grey Scatterometry Overlay Targets and Their Measuremen...
- Publication number 20210373445
- Publication date Dec 2, 2021
- KLA-Tencor Corporation
- Amnon Manassen
- G01 - MEASURING TESTING
Information Patent Application
Non-Orthogonal Target and Method for Using the Same in Measuring Mi...
- Publication number 20210364935
- Publication date Nov 25, 2021
- Itay Gdor
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Topographic Phase Control For Overlay Measurement
- Publication number 20210255551
- Publication date Aug 19, 2021
- KLA-Tencor Corporation
- Vladimir Levinski
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
PARAMETER-STABLE MISREGISTRATION MEASUREMENT AMELIORATION IN SEMICO...
- Publication number 20210020480
- Publication date Jan 21, 2021
- KLA Corporation
- Vladimir LEVINSKI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Single Cell Grey Scatterometry Overlay Targets and Their Measuremen...
- Publication number 20200159129
- Publication date May 21, 2020
- KLA-Tencor Corporation
- Amnon Manassen
- G01 - MEASURING TESTING
Information Patent Application
Topographic Phase Control For Overlay Measurement
- Publication number 20200142323
- Publication date May 7, 2020
- KLA-Tencor Corporation
- Vladimir Levinski
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
Topographic Phase Control For Overlay Measurement
- Publication number 20200142322
- Publication date May 7, 2020
- KLA-Tencor Corporation
- Vladimir Levinski
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
Topographic Phase Control For Overlay Measurement
- Publication number 20200142321
- Publication date May 7, 2020
- KLA-Tencor Corporation
- Vladimir Levinski
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
Estimating Amplitude and Phase Asymmetry in Imaging Technology for...
- Publication number 20200132445
- Publication date Apr 30, 2020
- KLA-Tencor Corporation
- Tal Marciano
- G01 - MEASURING TESTING
Information Patent Application
OFF-AXIS ILLUMINATION OVERLAY MEASUREMENT USING TWO-DIFFRACTED ORDE...
- Publication number 20200132446
- Publication date Apr 30, 2020
- KLA-Tencor Corporation
- Yoni Shalibo
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Localized Telecentricity and Focus Optimization for Overlay Metrology
- Publication number 20190310080
- Publication date Oct 10, 2019
- KLA-Tencor Corporation
- Andrew V. Hill
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
UTILIZING OVERLAY MISREGISTRATION ERROR ESTIMATIONS IN IMAGING OVER...
- Publication number 20190122357
- Publication date Apr 25, 2019
- KLA-Tencor Corporation
- Tzahi Grunzweig
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
DIFFRACTION BASED OVERLAY SCATTEROMETRY
- Publication number 20190004439
- Publication date Jan 3, 2019
- KLA-Tencor Corporation
- Yuval Lubashevsky
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Diffraction Based Overlay Scatterometry
- Publication number 20180342063
- Publication date Nov 29, 2018
- KLA-Tencor Corporation
- Yuval Lubashevsky
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
Simultaneous Capturing of Overlay Signals From Multiple Targets
- Publication number 20180335346
- Publication date Nov 22, 2018
- KLA-Tencor Corporation
- Andrew V. Hill
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Systems and Methods for Metrology with Layer-Specific Illumination...
- Publication number 20180292326
- Publication date Oct 11, 2018
- KLA-Tencor Corporation
- Amnon Manassen
- G01 - MEASURING TESTING
Information Patent Application
Process Compatibility Improvement by Fill Factor Modulation
- Publication number 20180157784
- Publication date Jun 7, 2018
- KLA-Tencor Corporation
- Vladimir Levinski
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
Optical Near-Field Metrology
- Publication number 20180087900
- Publication date Mar 29, 2018
- KLA-Tencor Corporation
- Yuri Paskover
- G01 - MEASURING TESTING
Information Patent Application
Self-Moiré Target Design Principles for Measuring Unresolved Device...
- Publication number 20180081193
- Publication date Mar 22, 2018
- KLA-Tencor Corporation
- Vladimir Levinski
- G02 - OPTICS
Information Patent Application
SIMULTANEOUS CAPTURING OF OVERLAY SIGNALS FROM MULTIPLE TARGETS
- Publication number 20180031424
- Publication date Feb 1, 2018
- KLA-Tencor Corporation
- Andrew V. Hill
- G01 - MEASURING TESTING
Information Patent Application
New Approaches in First Order Scatterometry Overlay Based on Introd...
- Publication number 20170268869
- Publication date Sep 21, 2017
- KLA-Tencor Corporation
- Vladimir Levinski
- G01 - MEASURING TESTING
Information Patent Application
Topographic Phase Control For Overlay Measurement
- Publication number 20170146915
- Publication date May 25, 2017
- KLA-Tencor Corporation
- Vladimir Levinski
- G02 - OPTICS
Information Patent Application
Self-Moire Target Design Principles for Measuring Unresolved Device...
- Publication number 20170146810
- Publication date May 25, 2017
- KLA-Tencor Corporation
- Vladimir Levinski
- G02 - OPTICS
Information Patent Application
QUALITY ESTIMATION AND IMPROVEMENT OF IMAGING METROLOGY TARGETS
- Publication number 20160231102
- Publication date Aug 11, 2016
- KLA-Tencor Corporation
- Boris Efraty
- G01 - MEASURING TESTING
Information Patent Application
METROLOGY IMAGING TARGETS HAVING REFLECTION-SYMMETRIC PAIRS OF REFL...
- Publication number 20160084758
- Publication date Mar 24, 2016
- KLA-Tencor Corporation
- Amnon Manassen
- G01 - MEASURING TESTING

Yuri Paskover

Person

Patents Grantslast 30 patents

Enhancing performance of overlay metrology

Perception camera with road surface glare reduction

Optical near-field metrology

Enhancing performance of overlay metrology

Non-orthogonal target and method for using the same in measuring mi...

Topographic phase control for overlay measurement

Off-axis illumination overlay measurement using two-diffracted orde...

Single cell grey scatterometry overlay targets and their measuremen...

Parameter-stable misregistration measurement amelioration in semico...

Estimating amplitude and phase asymmetry in imaging technology for...

Diffraction based overlay scatterometry

Localized telecentricity and focus optimization for overlay metrology

Process compatibility improvement by fill factor modulation

Utilizing overlay misregistration error estimations in imaging over...

Topographic phase control for overlay measurement

Systems and methods for metrology with layer-specific illumination...

Quality estimation and improvement of imaging metrology targets

Simultaneous capturing of overlay signals from multiple targets

Approaches in first order scatterometry overlay based on introducti...

Metrology imaging targets having reflection-symmetric pairs of refl...

Compound objectives for imaging and scatterometry overlay

Self-moiré target design principles for measuring unresolved device...

Simultaneous capturing of overlay signals from multiple targets

Self-moire target design principles for measuring unresolved device...

Patents Applicationslast 30 patents

PERCEPTION CAMERA WITH ROAD SURFACE GLARE REDUCTION

ENHANCING PERFORMANCE OF OVERLAY METROLOGY

SYSTEMS AND METHODS FOR ROTATIONAL CALIBRATION OF METROLOGY TOOLS

ENHANCING PERFORMANCE OF OVERLAY METROLOGY

Systems and Methods for Measurement of Misregistration and Ameliora...

Single Cell Grey Scatterometry Overlay Targets and Their Measuremen...

Non-Orthogonal Target and Method for Using the Same in Measuring Mi...

Topographic Phase Control For Overlay Measurement

PARAMETER-STABLE MISREGISTRATION MEASUREMENT AMELIORATION IN SEMICO...

Single Cell Grey Scatterometry Overlay Targets and Their Measuremen...

Topographic Phase Control For Overlay Measurement

Topographic Phase Control For Overlay Measurement

Topographic Phase Control For Overlay Measurement

Estimating Amplitude and Phase Asymmetry in Imaging Technology for...

OFF-AXIS ILLUMINATION OVERLAY MEASUREMENT USING TWO-DIFFRACTED ORDE...

Localized Telecentricity and Focus Optimization for Overlay Metrology

UTILIZING OVERLAY MISREGISTRATION ERROR ESTIMATIONS IN IMAGING OVER...

DIFFRACTION BASED OVERLAY SCATTEROMETRY

Diffraction Based Overlay Scatterometry

Simultaneous Capturing of Overlay Signals From Multiple Targets

Systems and Methods for Metrology with Layer-Specific Illumination...

Process Compatibility Improvement by Fill Factor Modulation

Optical Near-Field Metrology

Self-Moiré Target Design Principles for Measuring Unresolved Device...

SIMULTANEOUS CAPTURING OF OVERLAY SIGNALS FROM MULTIPLE TARGETS

New Approaches in First Order Scatterometry Overlay Based on Introd...

Topographic Phase Control For Overlay Measurement

Self-Moire Target Design Principles for Measuring Unresolved Device...

QUALITY ESTIMATION AND IMPROVEMENT OF IMAGING METROLOGY TARGETS

METROLOGY IMAGING TARGETS HAVING REFLECTION-SYMMETRIC PAIRS OF REFL...