Yuriko Matsuura

Person

Shizuoka, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Ethynyl derived composite, a composition comprising thereof, a meth...
- Patent number 11,914,296
- Issue date Feb 27, 2024
- Merck Patent GmbH
- Shigemasa Nakasugi
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Ethynyl derived composite, a composition comprising thereof, a meth...
- Patent number 11,609,498
- Issue date Mar 21, 2023
- Merck Patent GmbH
- Shigemasa Nakasugi
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Compound, semiconductor material, and methods for manufacturing coa...
- Patent number 11,450,805
- Issue date Sep 20, 2022
- Merck Patent GmbH
- Shigemasa Nakasugi
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Allyloxy derivative, resist underlayer forming composition using th...
- Patent number 11,366,389
- Issue date Jun 21, 2022
- Merck Patent GmbH
- Shigemasa Nakasugi
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Rinse composition, a method for forming resist patterns and a metho...
- Patent number 10,451,974
- Issue date Oct 22, 2019
- AZ Electronic Materials (Luxembourg) S.A.R.L.
- Kazuma Yamamoto
- C11 - ANIMAL AND VEGETABLE OILS, FATS, FATTY SUBSTANCES AND WAXES FATTY ACIDS...
Information Patent Grant
Rinse solution for lithography and pattern formation method employi...
- Patent number 9,298,095
- Issue date Mar 29, 2016
- Merck Patent GmbH
- Xiaowei Wang
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Resist pattern formating method
- Patent number 8,618,002
- Issue date Dec 31, 2013
- AZ Electronic Materials USA Corp.
- Wenbing Kang
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Patents Applicationslast 30 patents

Information Patent Application
ETHYNYL DERIVED COMPOSITE, A COMPOSITION COMPRISING THEREOF, A METH...
- Publication number 20230194989
- Publication date Jun 22, 2023
- Merck Patent GmbH
- Shigemasa NAKASUGI
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
ALLYLOXY DERIVATIVE, RESIST UNDERLAYER FORMING COMPOSITION USING TH...
- Publication number 20210181636
- Publication date Jun 17, 2021
- Merck Patent GmbH
- Shigemasa NAKASUGI
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
AN ETHYNYL DERIVED COMPOSITE, A COMPOSITION COMPRISING THEREOF, A M...
- Publication number 20200401046
- Publication date Dec 24, 2020
- Merck Patent GmbH
- Shigemasa NAKASUGI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
NOVEL COMPOUND, SEMICONDUCTOR MATERIAL, AND METHODS FOR MANUFACTURI...
- Publication number 20200044158
- Publication date Feb 6, 2020
- Merck Patent GmbH
- Shigemasa NAKASUGI
- C07 - ORGANIC CHEMISTRY
Information Patent Application
A RINSE COMPOSITION, A METHOD FOR FORMING RESIST PATTERNS AND A MET...
- Publication number 20190250515
- Publication date Aug 15, 2019
- AZ ELECTRONIC MATERIALS (LUXEMBOURG) S.a.r.l.
- Kazuma YAMAMOTO
- C11 - ANIMAL AND VEGETABLE OILS, FATS, FATTY SUBSTANCES AND WAXES FATTY ACIDS...
Information Patent Application
RINSE SOLUTION FOR LITHOGRAPHY AND PATTERN FORMATION METHOD EMPLOYI...
- Publication number 20140234783
- Publication date Aug 21, 2014
- AZ Electronic Materials USA Corp.
- Xiaowei Wang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
RINSE SOLUTION FOR LITHOGRAPHY AND PATTERN FORMATION METHOD EMPLOYI...
- Publication number 20130164694
- Publication date Jun 27, 2013
- AZ Electronic Materials USA Corp.
- Xiaowei Wang
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RESIST PATTERN FORMATING METHOD
- Publication number 20110241173
- Publication date Oct 6, 2011
- Wenbing Kang
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
SUBSTRATE TREATING SOLUTION AND METHOD EMPLOYING THE SAME FOR TREAT...
- Publication number 20110165523
- Publication date Jul 7, 2011
- Xiaowei Wang
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Yuriko Matsuura

Person

Patents Grantslast 30 patents

Ethynyl derived composite, a composition comprising thereof, a meth...

Ethynyl derived composite, a composition comprising thereof, a meth...

Compound, semiconductor material, and methods for manufacturing coa...

Allyloxy derivative, resist underlayer forming composition using th...

Rinse composition, a method for forming resist patterns and a metho...

Rinse solution for lithography and pattern formation method employi...

Resist pattern formating method

Patents Applicationslast 30 patents

ETHYNYL DERIVED COMPOSITE, A COMPOSITION COMPRISING THEREOF, A METH...

ALLYLOXY DERIVATIVE, RESIST UNDERLAYER FORMING COMPOSITION USING TH...

AN ETHYNYL DERIVED COMPOSITE, A COMPOSITION COMPRISING THEREOF, A M...

NOVEL COMPOUND, SEMICONDUCTOR MATERIAL, AND METHODS FOR MANUFACTURI...

A RINSE COMPOSITION, A METHOD FOR FORMING RESIST PATTERNS AND A MET...

RINSE SOLUTION FOR LITHOGRAPHY AND PATTERN FORMATION METHOD EMPLOYI...

RINSE SOLUTION FOR LITHOGRAPHY AND PATTERN FORMATION METHOD EMPLOYI...

RESIST PATTERN FORMATING METHOD

SUBSTRATE TREATING SOLUTION AND METHOD EMPLOYING THE SAME FOR TREAT...