Yushin PARK

Person

Suwon-si, Gyeonggi-do, KR

People

Patents Grantslast 30 patents

Information Patent Grant
Polymer, organic layer composition and method of forming patterns
- Patent number 11,512,162
- Issue date Nov 29, 2022
- Samsung SDI Co., Ltd.
- Sunghwan Kim
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Hardmask composition, hardmask layer and method of forming patterns
- Patent number 11,409,197
- Issue date Aug 9, 2022
- Samsung SDI Co., Ltd.
- Jaebum Lim
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Hardmask composition, hardmask layer and method of forming patterns
- Patent number 11,409,198
- Issue date Aug 9, 2022
- Samsung SDI Co., Ltd.
- Seunghyun Kim
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Hardmask composition, hardmask layer and method of forming patterns
- Patent number 11,214,678
- Issue date Jan 4, 2022
- Samsung SDI Co., Ltd.
- Jaebum Lim
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Polymer, organic layer composition, and method of forming patterns
- Patent number 11,203,662
- Issue date Dec 21, 2021
- Samsung SDI Co., Ltd.
- Hyeonil Jung
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...

Patents Applicationslast 30 patents

Information Patent Application
METHOD OF FORMING PATTERNS
- Publication number 20250115691
- Publication date Apr 10, 2025
- Samsung SDI Co., Ltd.
- Seung-Wook SHIN
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
HARDMASK COMPOSITION, HARDMASK LAYER, AND METHOD OF FORMING PATTERNS
- Publication number 20250028236
- Publication date Jan 23, 2025
- Samsung SDI Co., Ltd.
- Younhee NAM
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD OF FORMING PATTERNS
- Publication number 20230406970
- Publication date Dec 21, 2023
- Samsung SDI Co., Ltd.
- Seung-Wook SHIN
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
HARDMASK COMPOSITION, HARDMASK LAYER, AND METHOD OF FORMING PATTERNS
- Publication number 20230221641
- Publication date Jul 13, 2023
- Samsung SDI Co., Ltd.
- Seung-Wook SHIN
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
HARDMASK COMPOSITION, HARDMASK LAYER AND METHOD OF FORMING PATTERNS
- Publication number 20220315790
- Publication date Oct 6, 2022
- Samsung SDI Co., Ltd.
- Sunghwan KIM
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
HARDMASK COMPOSITION, HARDMASK LAYER AND METHOD OF FORMING PATTERNS
- Publication number 20200209754
- Publication date Jul 2, 2020
- Samsung SDI Co., Ltd.
- Seunghyun KIM
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
HARDMASK COMPOSITION, HARDMASK LAYER AND METHOD OF FORMING PATTERNS
- Publication number 20200201185
- Publication date Jun 25, 2020
- Samsung SDI Co., Ltd.
- Jaebum LIM
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
POLYMER, ORGANIC LAYER COMPOSITION AND METHOD OF FORMING PATTERNS
- Publication number 20200062875
- Publication date Feb 27, 2020
- Samsung SDI Co., Ltd.
- Seung-Wook SHIN
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
POLYMER, ORGANIC LAYER COMPOSITION AND METHOD OF FORMING PATTERNS
- Publication number 20200024384
- Publication date Jan 23, 2020
- Samsung SDI Co., Ltd.
- Sunghwan KIM
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
HARDMASK COMPOSITION, HARDMASK LAYER AND METHOD OF FORMING PATTERNS
- Publication number 20200017678
- Publication date Jan 16, 2020
- Samsung SDI Co., Ltd.
- Jaebum LIM
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
ORGANIC LAYER COMPOSITION, ORGANIC LAYER, AND METHOD OF FORMING PAT...
- Publication number 20190317403
- Publication date Oct 17, 2019
- Samsung SDI Co., Ltd.
- Shinhyo BAE
- C07 - ORGANIC CHEMISTRY
Information Patent Application
POLYMER, ORGANIC LAYER COMPOSITION, AND METHOD OF FORMING PATTERNS
- Publication number 20190233576
- Publication date Aug 1, 2019
- Samsung SDI Co., Ltd.
- Hyeonil JUNG
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Yushin PARK

Person

Patents Grantslast 30 patents

Polymer, organic layer composition and method of forming patterns

Hardmask composition, hardmask layer and method of forming patterns

Hardmask composition, hardmask layer and method of forming patterns

Hardmask composition, hardmask layer and method of forming patterns

Polymer, organic layer composition, and method of forming patterns

Patents Applicationslast 30 patents

METHOD OF FORMING PATTERNS

HARDMASK COMPOSITION, HARDMASK LAYER, AND METHOD OF FORMING PATTERNS

METHOD OF FORMING PATTERNS

HARDMASK COMPOSITION, HARDMASK LAYER, AND METHOD OF FORMING PATTERNS

HARDMASK COMPOSITION, HARDMASK LAYER AND METHOD OF FORMING PATTERNS

HARDMASK COMPOSITION, HARDMASK LAYER AND METHOD OF FORMING PATTERNS

HARDMASK COMPOSITION, HARDMASK LAYER AND METHOD OF FORMING PATTERNS

POLYMER, ORGANIC LAYER COMPOSITION AND METHOD OF FORMING PATTERNS

POLYMER, ORGANIC LAYER COMPOSITION AND METHOD OF FORMING PATTERNS

HARDMASK COMPOSITION, HARDMASK LAYER AND METHOD OF FORMING PATTERNS

ORGANIC LAYER COMPOSITION, ORGANIC LAYER, AND METHOD OF FORMING PAT...

POLYMER, ORGANIC LAYER COMPOSITION, AND METHOD OF FORMING PATTERNS