Yusuke ANNO

Person

Tokyo, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Pattern-forming method and composition for resist pattern-refinement
- Patent number 10,216,090
- Issue date Feb 26, 2019
- JSR Corporation
- Kanako Meya
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Resist pattern-forming method
- Patent number 10,025,188
- Issue date Jul 17, 2018
- JSR Corporation
- Yusuke Anno
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Polysiloxane composition and pattern-forming method
- Patent number 9,329,478
- Issue date May 3, 2016
- JSR Corporation
- Yusuke Anno
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Pattern-forming method, and composition for forming resist underlay...
- Patent number 9,046,769
- Issue date Jun 2, 2015
- JSR Corporation
- Yushi Matsumura
- B44 - DECORATIVE ARTS
Information Patent Grant
Resist pattern-forming method
- Patent number 8,993,223
- Issue date Mar 31, 2015
- JSR Corporation
- Yusuke Anno
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Pattern-forming method, and composition for forming resist underlay...
- Patent number 8,859,191
- Issue date Oct 14, 2014
- JSR Corporation
- Yushi Matsumura
- B44 - DECORATIVE ARTS
Information Patent Grant
Resist pattern-forming method
- Patent number 8,669,042
- Issue date Mar 11, 2014
- JSR Corporation
- Yusuke Anno
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Positive-type radiation-sensitive composition, and resist pattern f...
- Patent number 8,501,385
- Issue date Aug 6, 2013
- JSR Corporation
- Yusuke Anno
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...

Patents Applicationslast 30 patents

Information Patent Application
SILICON-CONTAINING COMPOSITION AND METHOD FOR MANUFACTURING SEMICON...
- Publication number 20230340266
- Publication date Oct 26, 2023
- JSR Corporation
- Tomoaki SEKO
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
COMPOSITION FOR RESIST UNDERLAYER FILM FORMATION, AND METHOD OF PRO...
- Publication number 20230069221
- Publication date Mar 2, 2023
- JSR Corporation
- Tomoaki SEKO
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RESIST UNDERLAYER FILM-FORMING COMPOSITION, RESIST UNDERLAYER FILM,...
- Publication number 20230053159
- Publication date Feb 16, 2023
- JSR Corporation
- Tomoaki Seko
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
COMPOSITION, SILICON-CONTAINING FILM, METHOD OF FORMING SILICON-CON...
- Publication number 20220146940
- Publication date May 12, 2022
- JSR Corporation
- Tatsuya KASAI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PATTERN-FORMING METHOD AND COMPOSITION FOR RESIST PATTERN-REFINEMENT
- Publication number 20190155162
- Publication date May 23, 2019
- JSR Corporation
- Kanako MEYA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
FILM-FORMING MATERIAL FOR RESIST PROCESS AND PATTERN-FORMING METHOD
- Publication number 20190025699
- Publication date Jan 24, 2019
- JSR Corporation
- Junya Suzuki
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
RESIST PATTERN-FORMING METHOD
- Publication number 20170322492
- Publication date Nov 9, 2017
- JSR Corporation
- Yusuke ANNO
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RESIST PATTERN-FORMING METHOD
- Publication number 20160320705
- Publication date Nov 3, 2016
- JSR Corporation
- Yusuke ANNO
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PATTERN-FORMING METHOD AND COMPOSITION FOR RESIST PATTERN-REFINEMENT
- Publication number 20160291462
- Publication date Oct 6, 2016
- JSR Corporation
- Kanako MEYA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
RESIST PATTERN-FORMING METHOD
- Publication number 20160097978
- Publication date Apr 7, 2016
- JSR Corporation
- Yusuke ANNO
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RESIST PATTERN-FORMING METHOD
- Publication number 20150160556
- Publication date Jun 11, 2015
- JSR Corporation
- Yusuke ANNO
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RESIST PATTERN-FORMING METHOD
- Publication number 20150050600
- Publication date Feb 19, 2015
- JSR Corporation
- Yusuke ANNO
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PATTERN-FORMING METHOD, AND COMPOSITION FOR FORMING RESIST UNDERLAY...
- Publication number 20140371466
- Publication date Dec 18, 2014
- JSR Corporation
- Yushi MATSUMURA
- B44 - DECORATIVE ARTS
Information Patent Application
RESIST PATTERN-FORMING METHOD
- Publication number 20140134544
- Publication date May 15, 2014
- JSR Corporation
- Yusuke ANNO
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
POLYSILOXANE COMPOSITION AND PATTERN-FORMING METHOD
- Publication number 20130130179
- Publication date May 23, 2013
- JSR Corporation
- Yusuke ANNO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
RADIATION-SENSITIVE RESIN COMPOSITION, METHOD FOR FORMING RESIST PA...
- Publication number 20130022912
- Publication date Jan 24, 2013
- JSR Corporation
- Mitsuo SATO
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
PATTERN-FORMING METHOD, AND COMPOSITION FOR FORMING RESIST UNDERLAY...
- Publication number 20120285929
- Publication date Nov 15, 2012
- JSR Corporation
- Yushi MATSUMURA
- B44 - DECORATIVE ARTS
Information Patent Application
RESIST PATTERN-FORMING METHOD
- Publication number 20120183908
- Publication date Jul 19, 2012
- JSR Corporation
- Yusuke ANNO
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RESIST PATTERN COATING AGENT AND RESIST PATTERN FORMING METHOD USIN...
- Publication number 20110223544
- Publication date Sep 15, 2011
- JSR Corporation
- Yuji YADA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
POSITIVE-TYPE RADIATION-SENSITIVE COMPOSITION, AND RESIST PATTERN F...
- Publication number 20110104612
- Publication date May 5, 2011
- JSR Corporation
- Yusuke ANNO
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...

Yusuke ANNO

Person

Patents Grantslast 30 patents

Pattern-forming method and composition for resist pattern-refinement

Resist pattern-forming method

Polysiloxane composition and pattern-forming method

Pattern-forming method, and composition for forming resist underlay...

Resist pattern-forming method

Pattern-forming method, and composition for forming resist underlay...

Resist pattern-forming method

Positive-type radiation-sensitive composition, and resist pattern f...

Patents Applicationslast 30 patents

SILICON-CONTAINING COMPOSITION AND METHOD FOR MANUFACTURING SEMICON...

COMPOSITION FOR RESIST UNDERLAYER FILM FORMATION, AND METHOD OF PRO...

RESIST UNDERLAYER FILM-FORMING COMPOSITION, RESIST UNDERLAYER FILM,...

COMPOSITION, SILICON-CONTAINING FILM, METHOD OF FORMING SILICON-CON...

PATTERN-FORMING METHOD AND COMPOSITION FOR RESIST PATTERN-REFINEMENT

FILM-FORMING MATERIAL FOR RESIST PROCESS AND PATTERN-FORMING METHOD

RESIST PATTERN-FORMING METHOD

RESIST PATTERN-FORMING METHOD

PATTERN-FORMING METHOD AND COMPOSITION FOR RESIST PATTERN-REFINEMENT

RESIST PATTERN-FORMING METHOD

RESIST PATTERN-FORMING METHOD

RESIST PATTERN-FORMING METHOD

PATTERN-FORMING METHOD, AND COMPOSITION FOR FORMING RESIST UNDERLAY...

RESIST PATTERN-FORMING METHOD

POLYSILOXANE COMPOSITION AND PATTERN-FORMING METHOD

RADIATION-SENSITIVE RESIN COMPOSITION, METHOD FOR FORMING RESIST PA...

PATTERN-FORMING METHOD, AND COMPOSITION FOR FORMING RESIST UNDERLAY...

RESIST PATTERN-FORMING METHOD

RESIST PATTERN COATING AGENT AND RESIST PATTERN FORMING METHOD USIN...

POSITIVE-TYPE RADIATION-SENSITIVE COMPOSITION, AND RESIST PATTERN F...