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Yusuke ASANO
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Tokyo, JP
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Patents Grants
last 30 patents
Information
Patent Grant
Mounting member and motion guidance apparatus including the mountin...
Patent number
12,078,511
Issue date
Sep 3, 2024
THK Co., Ltd
Yusuke Asano
F16 - ENGINEERING ELEMENTS AND UNITS GENERAL MEASURES FOR PRODUCING AND MAINT...
Information
Patent Grant
Radiation-sensitive composition and resist pattern-forming method
Patent number
11,506,976
Issue date
Nov 22, 2022
JSR Corporation
Hisashi Nakagawa
C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information
Patent Grant
Lifespan diagnosis device, method, non-transitory storage medium, a...
Patent number
11,371,909
Issue date
Jun 28, 2022
THK Co., Ltd
Akihiro Unno
G01 - MEASURING TESTING
Information
Patent Grant
Machining control system and motion guidance device
Patent number
11,226,001
Issue date
Jan 18, 2022
THK Co., Ltd
Akihiro Unno
F16 - ENGINEERING ELEMENTS AND UNITS GENERAL MEASURES FOR PRODUCING AND MAINT...
Information
Patent Grant
Radiation-sensitive composition, pattern-forming method, and metal-...
Patent number
11,079,676
Issue date
Aug 3, 2021
JSR Corporation
Yusuke Asano
C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information
Patent Grant
Motion guide device load measuring system and load measuring method...
Patent number
10,920,825
Issue date
Feb 16, 2021
THK Co., Ltd
Yusuke Asano
F16 - ENGINEERING ELEMENTS AND UNITS GENERAL MEASURES FOR PRODUCING AND MAINT...
Information
Patent Grant
Workpiece transport control system and motion guidance device
Patent number
10,844,904
Issue date
Nov 24, 2020
THK Co., Ltd
Akihiro Unno
F16 - ENGINEERING ELEMENTS AND UNITS GENERAL MEASURES FOR PRODUCING AND MAINT...
Information
Patent Grant
Management system and motion guidance device
Patent number
10,738,827
Issue date
Aug 11, 2020
THK Co., Ltd
Akihiro Unno
F16 - ENGINEERING ELEMENTS AND UNITS GENERAL MEASURES FOR PRODUCING AND MAINT...
Information
Patent Grant
Radiation-sensitive resin composition, polymer and method for formi...
Patent number
9,598,520
Issue date
Mar 21, 2017
JSR Corporation
Yuko Kiridoshi
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Grant
Radiation-sensitive resin composition, resist pattern-forming metho...
Patent number
9,523,911
Issue date
Dec 20, 2016
JSR Corporation
Hiroshi Tomioka
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Grant
Radiation-sensitive resin composition, method for forming resist pa...
Patent number
9,261,780
Issue date
Feb 16, 2016
JSR Corporation
Yusuke Asano
C07 - ORGANIC CHEMISTRY
Information
Patent Grant
Radiation-sensitive resin composition, method for forming resist pa...
Patent number
9,188,858
Issue date
Nov 17, 2015
JSR Corporation
Yusuke Asano
C07 - ORGANIC CHEMISTRY
Information
Patent Grant
Radiation-sensitive resin composition, method for forming resist pa...
Patent number
9,152,044
Issue date
Oct 6, 2015
JSR Corporation
Yusuke Asano
C07 - ORGANIC CHEMISTRY
Information
Patent Grant
Resist composition, resist pattern-forming method, and resist solvent
Patent number
9,146,466
Issue date
Sep 29, 2015
JSR Corporation
Yusuke Asano
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Grant
Resist pattern-forming method, resist pattern-forming radiation-sen...
Patent number
9,046,765
Issue date
Jun 2, 2015
JSR Corporation
Hiromitsu Nakashima
C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information
Patent Grant
Radiation-sensitive resin composition, method for forming resist pa...
Patent number
9,040,221
Issue date
May 26, 2015
JSR Corporation
Hitoshi Osaki
C07 - ORGANIC CHEMISTRY
Information
Patent Grant
Radiation sensitive resin composition, method for forming a pattern...
Patent number
8,765,355
Issue date
Jul 1, 2014
JSR Corporation
Takakazu Kimoto
C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information
Patent Grant
Radiation-sensitive resin composition, polymer and compound
Patent number
8,603,726
Issue date
Dec 10, 2013
JSR Corporation
Kazuo Nakahara
C07 - ORGANIC CHEMISTRY
Information
Patent Grant
Radiation-sensitive resin composition, method for forming resist pa...
Patent number
8,580,480
Issue date
Nov 12, 2013
JSR Corporation
Yusuke Asano
C07 - ORGANIC CHEMISTRY
Patents Applications
last 30 patents
Information
Patent Application
INFORMATION PROCESSING SYSTEM, INFORMATION PROCESSING DEVICE, AND I...
Publication number
20240136028
Publication date
Apr 25, 2024
Preferred Networks, Inc.
Kosuke NAKAGO
Information
Patent Application
INFERRING DEVICE, MODEL GENERATION METHOD, AND INFERRING METHOD
Publication number
20240127533
Publication date
Apr 18, 2024
Preferred Networks, Inc.
So TAKAMOTO
G06 - COMPUTING CALCULATING COUNTING
Information
Patent Application
INFORMATION PROCESSING DEVICE, INFORMATION PROCESSING METHOD, AND N...
Publication number
20240112764
Publication date
Apr 4, 2024
ENEOS Corporation
Yoshihiro YAYAMA
Information
Patent Application
MOUNTING MEMBER AND MOTION GUIDANCE APPARATUS INCLUDING THE MOUNTIN...
Publication number
20230003560
Publication date
Jan 5, 2023
THK CO., LTD.
Yusuke Asano
F16 - ENGINEERING ELEMENTS AND UNITS GENERAL MEASURES FOR PRODUCING AND MAINT...
Information
Patent Application
SOURCE CODE TRADING SYSTEM USING AI
Publication number
20210342870
Publication date
Nov 4, 2021
ONE ACT INC.
Yusuke ASANO
G06 - COMPUTING CALCULATING COUNTING
Information
Patent Application
MOTION GUIDE DEVICE LOAD MEASURING SYSTEM AND LOAD MEASURING METHOD...
Publication number
20200284297
Publication date
Sep 10, 2020
THK CO., LTD.
Yusuke Asano
F16 - ENGINEERING ELEMENTS AND UNITS GENERAL MEASURES FOR PRODUCING AND MAINT...
Information
Patent Application
RADIATION-SENSITIVE COMPOSITION AND RESIST PATTERN-FORMING METHOD
Publication number
20200166840
Publication date
May 28, 2020
JSR Corporation
Hisashi Nakagawa
C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information
Patent Application
MANAGEMENT SYSTEM AND MOTION GUIDANCE DEVICE
Publication number
20200124091
Publication date
Apr 23, 2020
THK CO., LTD.
Akihiro Unno
F16 - ENGINEERING ELEMENTS AND UNITS GENERAL MEASURES FOR PRODUCING AND MAINT...
Information
Patent Application
LIFESPAN DIAGNOSIS DEVICE, METHOD, NON-TRANSITORY STORAGE MEDIUM, A...
Publication number
20200103311
Publication date
Apr 2, 2020
THK CO., LTD.
Akihiro Unno
G01 - MEASURING TESTING
Information
Patent Application
RADIATION-SENSITIVE COMPOSITION AND RESIST PATTERN-FORMING METHOD
Publication number
20200041898
Publication date
Feb 6, 2020
JSR Corporation
Hisashi NAKAGAWA
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
MACHINING CONTROL SYSTEM AND MOTION GUIDANCE DEVICE
Publication number
20190383327
Publication date
Dec 19, 2019
THK CO., LTD.
Akihiro Unno
F16 - ENGINEERING ELEMENTS AND UNITS GENERAL MEASURES FOR PRODUCING AND MAINT...
Information
Patent Application
WORKPIECE TRANSPORT CONTROL SYSTEM AND MOTION GUIDANCE DEVICE
Publication number
20190376553
Publication date
Dec 12, 2019
THK CO., LTD.
Akihiro Unno
F16 - ENGINEERING ELEMENTS AND UNITS GENERAL MEASURES FOR PRODUCING AND MAINT...
Information
Patent Application
RADIATION-SENSITIVE COMPOSITION, PATTERN-FORMING METHOD AND METAL O...
Publication number
20190310551
Publication date
Oct 10, 2019
JSR Corporation
Shinya MINEGISHI
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
RADIATION-SENSITIVE COMPOSITION, PATTERN-FORMING METHOD, AND METAL-...
Publication number
20190310552
Publication date
Oct 10, 2019
JSR Corporation
Yusuke ASANO
C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information
Patent Application
RADIATION-SENSITIVE RESIN COMPOSITION, RESIST PATTERN-FORMING METHO...
Publication number
20170038679
Publication date
Feb 9, 2017
JSR Corporation
Hiroshi TOMIOKA
C07 - ORGANIC CHEMISTRY
Information
Patent Application
RADIATION-SENSITIVE RESIN COMPOSITION, RESIST PATTERN-FORMING METHO...
Publication number
20140342288
Publication date
Nov 20, 2014
JSR Corporation
Hiroshi TOMIOKA
C07 - ORGANIC CHEMISTRY
Information
Patent Application
RESIST COMPOSITION, RESIST PATTERN-FORMING METHOD, AND RESIST SOLVENT
Publication number
20140302438
Publication date
Oct 9, 2014
JSR Corporation
Yusuke ASANO
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
RESIST PATTERN-FORMING METHOD, RESIST PATTERN-FORMING RADIATION-SEN...
Publication number
20140023968
Publication date
Jan 23, 2014
JSR Corporation
Hiromitsu NAKASHIMA
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Application
RADIATION-SENSITIVE RESIN COMPOSITION, METHOD FOR FORMING RESIST PA...
Publication number
20140004463
Publication date
Jan 2, 2014
JSR Corporation
Yusuke Asano
C07 - ORGANIC CHEMISTRY
Information
Patent Application
RADIATION-SENSITIVE RESIN COMPOSITION, METHOD FOR FORMING RESIST PA...
Publication number
20130143160
Publication date
Jun 6, 2013
JSR Corporation
Yusuke Asano
C07 - ORGANIC CHEMISTRY
Information
Patent Application
RADIATION-SENSITIVE RESIN COMPOSITION, METHOD FOR FORMING RESIST PA...
Publication number
20130122426
Publication date
May 16, 2013
JSR Corporation
Hitoshi Osaki
C07 - ORGANIC CHEMISTRY
Information
Patent Application
PHOTORESIST COMPOSITION, METHOD FOR PRODUCING PHOTORESIST COMPOSITI...
Publication number
20130078571
Publication date
Mar 28, 2013
JSR Corporation
Ryuichi SERIZAWA
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
RADIATION-SENSITIVE RESIN COMPOSITION, METHOD FOR FORMING RESIST PA...
Publication number
20130078579
Publication date
Mar 28, 2013
JSR Corporation
Yusuke ASANO
C07 - ORGANIC CHEMISTRY
Information
Patent Application
RADIATION-SENSITIVE RESIN COMPOSITION, POLYMER AND METHOD FOR FORMI...
Publication number
20120295197
Publication date
Nov 22, 2012
JSR Corporation
Yuko KIRIDOSHI
C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information
Patent Application
RADIATION SENSITIVE RESIN COMPOSITION, METHOD FOR FORMING A PATTERN...
Publication number
20120276482
Publication date
Nov 1, 2012
JSR Corporation
Takakazu Kimoto
C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information
Patent Application
RADIATION-SENSITIVE RESIN COMPOSITION, POLYMER AND COMPOUND
Publication number
20120082934
Publication date
Apr 5, 2012
JSR Corporation
Kazuo Nakahara
C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information
Patent Application
RADIATION-SENSITIVE RESIN COMPOSITION, METHOD FOR FORMING RESIST PA...
Publication number
20120028189
Publication date
Feb 2, 2012
JSR Corporation
Yusuke Asano
C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...