Yusuke BIYAJIMA

Person

Jyoetsu, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Material for forming organic film, method for forming organic film,...
- Patent number 12,215,221
- Issue date Feb 4, 2025
- Shin-Etsu Chemical Co., Ltd.
- Daisuke Kori
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Composition for forming silicon-containing resist underlayer film a...
- Patent number 12,174,541
- Issue date Dec 24, 2024
- Shin-Etsu Chemical Co., Ltd.
- Tsutomu Ogihara
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Resist underlayer film material, patterning process, and method for...
- Patent number 12,147,160
- Issue date Nov 19, 2024
- Shin-Etsu Chemical Co., Ltd.
- Daisuke Kori
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Composition for forming silicon-containing resist underlayer film a...
- Patent number 12,085,857
- Issue date Sep 10, 2024
- Shin-Etsu Chemical Co., Ltd.
- Tsutomu Ogihara
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Resist underlayer film material, patterning process, and method for...
- Patent number 12,013,640
- Issue date Jun 18, 2024
- Shin-Etsu Chemical Co., Ltd.
- Takayoshi Nakahara
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Composition for forming silicon-containing resist underlayer film a...
- Patent number 12,001,138
- Issue date Jun 4, 2024
- Shin-Etsu Chemical Co., Ltd.
- Yusuke Kai
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Thermosetting iodine- and silicon-containing material, composition...
- Patent number 11,914,295
- Issue date Feb 27, 2024
- Shin-Etsu Chemical Co., Ltd.
- Tsutomu Ogihara
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Material for forming organic film, method for forming organic film,...
- Patent number 11,822,247
- Issue date Nov 21, 2023
- Shin-Etsu Chemical Co., Ltd.
- Takayoshi Nakahara
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Material for forming organic film, method for forming organic film,...
- Patent number 11,720,023
- Issue date Aug 8, 2023
- Shin-Etsu Chemical Co., Ltd.
- Daisuke Kori
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Method for measuring distance of diffusion of curing catalyst
- Patent number 11,592,287
- Issue date Feb 28, 2023
- Shin-Etsu Chemical Co., Ltd.
- Tsutomu Ogihara
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Method for measuring distance of diffusion of curing catalyst
- Patent number 11,555,697
- Issue date Jan 17, 2023
- Shin-Etsu Chemical Co., Ltd.
- Tsutomu Ogihara
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Composition for forming silicon-containing resist underlayer film a...
- Patent number 11,480,879
- Issue date Oct 25, 2022
- Shin-Etsu Chemical Co., Ltd.
- Tsutomu Ogihara
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Composition for forming silicon-containing resist underlayer film a...
- Patent number 11,385,544
- Issue date Jul 12, 2022
- Shin-Etsu Chemical Co., Ltd.
- Tsutomu Ogihara
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Composition for forming organic film, substrate for manufacturing s...
- Patent number 11,018,015
- Issue date May 25, 2021
- Shin-Etsu Chemical Co., Ltd.
- Tsutomu Ogihara
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Resist underlayer film composition, patterning process, method for...
- Patent number 10,620,537
- Issue date Apr 14, 2020
- Shin-Etsu Chemical Co., Ltd.
- Takeru Watanabe
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for manufacturing a resist composition
- Patent number 10,610,906
- Issue date Apr 7, 2020
- Shin-Etsu Chemical Co., Ltd.
- Motoaki Iwabuchi
- B08 - CLEANING
Information Patent Grant
Composition for forming a silicon-containing resist under layer fil...
- Patent number 9,312,144
- Issue date Apr 12, 2016
- Shin-Etsu Chemical Co., Ltd.
- Tsutomu Ogihara
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Method for producing semiconductor apparatus substrate
- Patent number 9,312,127
- Issue date Apr 12, 2016
- Shin-Etsu Chemical Co., Ltd.
- Tsutomu Ogihara
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for producing resist composition
- Patent number 9,207,535
- Issue date Dec 8, 2015
- Shin-Etsu Chemical Co., Ltd.
- Tsutomu Ogihara
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Method for producing resist composition
- Patent number 9,201,301
- Issue date Dec 1, 2015
- Shin-Etsu Chemical Co., Ltd.
- Tsutomu Ogihara
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Pattern forming process
- Patent number 9,052,603
- Issue date Jun 9, 2015
- Shin-Etsu Chemical Co., Ltd.
- Jun Hatakeyama
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Resist underlayer film composition and patterning process using the...
- Patent number 8,877,422
- Issue date Nov 4, 2014
- Shin-Etsu Chemical Co., Ltd.
- Tsutomu Ogihara
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Resist underlayer film composition and patterning process using the...
- Patent number 8,853,031
- Issue date Oct 7, 2014
- Shin-Etsu Chemical Co., Ltd.
- Tsutomu Ogihara
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Resist underlayer film composition and patterning process using the...
- Patent number 8,663,898
- Issue date Mar 4, 2014
- Shin-Etsu Chemical Co., Ltd.
- Tsutomu Ogihara
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Resist underlayer film composition and patterning process using the...
- Patent number 8,592,956
- Issue date Nov 26, 2013
- Shin-Etsu Chemical Co., Ltd.
- Tsutomu Ogihara
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Patents Applicationslast 30 patents

Information Patent Application
Resist Underlayer Film Material, Pattern Forming Method, And Method...
- Publication number 20240337944
- Publication date Oct 10, 2024
- Shin-Etsu Chemical Co., Ltd.
- Takayoshi NAKAHARA
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
Material For Forming Adhesive Film, Patterning Process, And Method...
- Publication number 20240310731
- Publication date Sep 19, 2024
- Shin-Etsu Chemical Co., Ltd.
- Mamoru WATABE
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Resist Underlayer Film Material, Patterning Process, And Method For...
- Publication number 20230400770
- Publication date Dec 14, 2023
- Shin-Etsu Chemical Co., Ltd.
- Takayoshi NAKAHARA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
THERMOSETTING IODINE- AND SILICON-CONTAINING MATERIAL, COMPOSITION...
- Publication number 20230333472
- Publication date Oct 19, 2023
- Shin-Etsu Chemical Co., Ltd.
- Tsutomu OGIHARA
- C07 - ORGANIC CHEMISTRY
Information Patent Application
COMPOSITION FOR FORMING SILICON-CONTAINING RESIST UNDERLAYER FILM A...
- Publication number 20230244149
- Publication date Aug 3, 2023
- Shin-Etsu Chemical Co., Ltd.
- Tsutomu OGIHARA
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
MATERIAL FOR FORMING ADHESIVE FILM, PATTERNING PROCESS, AND METHOD...
- Publication number 20230203354
- Publication date Jun 29, 2023
- Shin-Etsu Chemical Co., Ltd.
- Mamoru WATABE
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
MATERIAL FOR FORMING ADHESIVE FILM, METHOD FOR FORMING ADHESIVE FIL...
- Publication number 20230059089
- Publication date Feb 23, 2023
- Shin-Etsu Chemical Co., Ltd.
- Takayoshi NAKAHARA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RESIST UNDERLAYER FILM MATERIAL, PATTERNING PROCESS, AND METHOD FOR...
- Publication number 20220163890
- Publication date May 26, 2022
- Shin-Etsu Chemical Co., Ltd.
- Daisuke KORI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RESIST UNDERLAYER FILM MATERIAL, PATTERNING PROCESS, AND METHOD FOR...
- Publication number 20210397092
- Publication date Dec 23, 2021
- Shin-Etsu Chemical Co., Ltd.
- Takayoshi NAKAHARA
- C07 - ORGANIC CHEMISTRY
Information Patent Application
MATERIAL FOR FORMING ORGANIC FILM, METHOD FOR FORMING ORGANIC FILM,...
- Publication number 20210286266
- Publication date Sep 16, 2021
- Shin-Etsu Chemical Co., Ltd.
- Takayoshi NAKAHARA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MATERIAL FOR FORMING ORGANIC FILM, METHOD FOR FORMING ORGANIC FILM,...
- Publication number 20210198472
- Publication date Jul 1, 2021
- Shin-Etsu Chemical Co., Ltd.
- Daisuke KORI
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
MATERIAL FOR FORMING ORGANIC FILM, METHOD FOR FORMING ORGANIC FILM,...
- Publication number 20210181637
- Publication date Jun 17, 2021
- Shin-Etsu Chemical Co., Ltd.
- Daisuke KORI
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
COMPOSITION FOR FORMING SILICON-CONTAINING RESIST UNDERLAYER FILM A...
- Publication number 20210088908
- Publication date Mar 25, 2021
- Shin-Etsu Chemical Co., Ltd.
- Yusuke KAI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
COMPOSITION FOR FORMING SILICON-CONTAINING RESIST UNDERLAYER FILM A...
- Publication number 20210026246
- Publication date Jan 28, 2021
- Shin-Etsu Chemical Co., Ltd.
- Tsutomu OGIHARA
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
METHOD FOR MEASURING DISTANCE OF DIFFUSION OF CURING CATALYST
- Publication number 20200340806
- Publication date Oct 29, 2020
- Shin-Etsu Chemical Co., Ltd.
- Tsutomu OGIHARA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
COMPOSITION FOR FORMING SILICON-CONTAINING RESIST UNDERLAYER FILM A...
- Publication number 20200341377
- Publication date Oct 29, 2020
- Shin-Etsu Chemical Co., Ltd.
- Tsutomu OGIHARA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
COMPOSITION FOR FORMING SILICON-CONTAINING RESIST UNDERLAYER FILM A...
- Publication number 20200233303
- Publication date Jul 23, 2020
- Shin-Etsu Chemical Co., Ltd.
- Tsutomu OGIHARA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
THERMOSETTING IODINE- AND SILICON-CONTAINING MATERIAL, COMPOSITION...
- Publication number 20200159120
- Publication date May 21, 2020
- Shin-Etsu Chemical Co., Ltd.
- Tsutomu OGIHARA
- C07 - ORGANIC CHEMISTRY
Information Patent Application
COMPOSITION FOR FORMING ORGANIC FILM, SUBSTRATE FOR MANUFACTURING S...
- Publication number 20190198341
- Publication date Jun 27, 2019
- Shin-Etsu Chemical Co., Ltd.
- Tsutomu OGIHARA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
THERMAL CROSSLINKING ACCELERATOR, POLYSILOXANE-CONTAINING RESIST UN...
- Publication number 20180081272
- Publication date Mar 22, 2018
- SHIN-ETSU CHEMICAL CO., LTD.
- Tsutomu OGIHARA
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
RESIST UNDERLAYER FILM COMPOSITION, PATTERNING PROCESS, METHOD FOR...
- Publication number 20180011405
- Publication date Jan 11, 2018
- Shin-Etsu Chemical Co., Ltd.
- Takeru WATANABE
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD FOR PRODUCING SEMICONDUCTOR APPARATUS SUBSTRATE
- Publication number 20160064220
- Publication date Mar 3, 2016
- Shin-Etsu Chemical Co., Ltd.
- Tsutomu OGIHARA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD FOR MANUFACTURING A RESIST COMPOSITION
- Publication number 20150099216
- Publication date Apr 9, 2015
- Shin-Etsu Chemical Co., Ltd.
- Motoaki IWABUCHI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
COMPOSITION FOR FORMING A SILICON-CONTAINING RESIST UNDER LAYER FIL...
- Publication number 20150093901
- Publication date Apr 2, 2015
- Shin-Etsu Chemical Co., Ltd.
- Tsutomu OGIHARA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD FOR PRODUCING RESIST COMPOSITION
- Publication number 20150064625
- Publication date Mar 5, 2015
- Shin-Etsu Chemical Co., Ltd.
- Tsutomu OGIHARA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD FOR PRODUCING RESIST COMPOSITION
- Publication number 20140335453
- Publication date Nov 13, 2014
- Shin-Etsu Chemical Co., Ltd.
- Tsutomu OGIHARA
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
PATTERN FORMING PROCESS
- Publication number 20140234785
- Publication date Aug 21, 2014
- Shin-Etsu Chemical Co., Ltd.
- Jun Hatakeyama
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
THERMAL CROSSLINKING ACCELERATOR, POLYSILOXANE-CONTAINING RESIST UN...
- Publication number 20140205951
- Publication date Jul 24, 2014
- Shin-Etsu Chemical Co., Ltd.
- Tsutomu OGIHARA
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
RESIST UNDERLAYER FILM COMPOSITION AND PATTERNING PROCESS USING THE...
- Publication number 20120184103
- Publication date Jul 19, 2012
- Shin-Etsu Chemical Co., Ltd.
- Tsutomu OGIHARA
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
RESIST UNDERLAYER FILM COMPOSITION AND PATTERNING PROCESS USING THE...
- Publication number 20120171868
- Publication date Jul 5, 2012
- Shin-Etsu Chemical Co., Ltd.
- Tsutomu OGIHARA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Yusuke BIYAJIMA

Person

Patents Grantslast 30 patents

Material for forming organic film, method for forming organic film,...

Composition for forming silicon-containing resist underlayer film a...

Resist underlayer film material, patterning process, and method for...

Composition for forming silicon-containing resist underlayer film a...

Resist underlayer film material, patterning process, and method for...

Composition for forming silicon-containing resist underlayer film a...

Thermosetting iodine- and silicon-containing material, composition...

Material for forming organic film, method for forming organic film,...

Material for forming organic film, method for forming organic film,...

Method for measuring distance of diffusion of curing catalyst

Method for measuring distance of diffusion of curing catalyst

Composition for forming silicon-containing resist underlayer film a...

Composition for forming silicon-containing resist underlayer film a...

Composition for forming organic film, substrate for manufacturing s...

Resist underlayer film composition, patterning process, method for...

Method for manufacturing a resist composition

Composition for forming a silicon-containing resist under layer fil...

Method for producing semiconductor apparatus substrate

Method for producing resist composition

Method for producing resist composition

Pattern forming process

Resist underlayer film composition and patterning process using the...

Resist underlayer film composition and patterning process using the...

Resist underlayer film composition and patterning process using the...

Resist underlayer film composition and patterning process using the...

Patents Applicationslast 30 patents

Resist Underlayer Film Material, Pattern Forming Method, And Method...

Material For Forming Adhesive Film, Patterning Process, And Method...

Resist Underlayer Film Material, Patterning Process, And Method For...

THERMOSETTING IODINE- AND SILICON-CONTAINING MATERIAL, COMPOSITION...

COMPOSITION FOR FORMING SILICON-CONTAINING RESIST UNDERLAYER FILM A...

MATERIAL FOR FORMING ADHESIVE FILM, PATTERNING PROCESS, AND METHOD...

MATERIAL FOR FORMING ADHESIVE FILM, METHOD FOR FORMING ADHESIVE FIL...

RESIST UNDERLAYER FILM MATERIAL, PATTERNING PROCESS, AND METHOD FOR...

RESIST UNDERLAYER FILM MATERIAL, PATTERNING PROCESS, AND METHOD FOR...

MATERIAL FOR FORMING ORGANIC FILM, METHOD FOR FORMING ORGANIC FILM,...

MATERIAL FOR FORMING ORGANIC FILM, METHOD FOR FORMING ORGANIC FILM,...

MATERIAL FOR FORMING ORGANIC FILM, METHOD FOR FORMING ORGANIC FILM,...

COMPOSITION FOR FORMING SILICON-CONTAINING RESIST UNDERLAYER FILM A...

COMPOSITION FOR FORMING SILICON-CONTAINING RESIST UNDERLAYER FILM A...

METHOD FOR MEASURING DISTANCE OF DIFFUSION OF CURING CATALYST

COMPOSITION FOR FORMING SILICON-CONTAINING RESIST UNDERLAYER FILM A...

COMPOSITION FOR FORMING SILICON-CONTAINING RESIST UNDERLAYER FILM A...

THERMOSETTING IODINE- AND SILICON-CONTAINING MATERIAL, COMPOSITION...

COMPOSITION FOR FORMING ORGANIC FILM, SUBSTRATE FOR MANUFACTURING S...

THERMAL CROSSLINKING ACCELERATOR, POLYSILOXANE-CONTAINING RESIST UN...

RESIST UNDERLAYER FILM COMPOSITION, PATTERNING PROCESS, METHOD FOR...

METHOD FOR PRODUCING SEMICONDUCTOR APPARATUS SUBSTRATE

METHOD FOR MANUFACTURING A RESIST COMPOSITION

COMPOSITION FOR FORMING A SILICON-CONTAINING RESIST UNDER LAYER FIL...

METHOD FOR PRODUCING RESIST COMPOSITION

METHOD FOR PRODUCING RESIST COMPOSITION

PATTERN FORMING PROCESS

THERMAL CROSSLINKING ACCELERATOR, POLYSILOXANE-CONTAINING RESIST UN...

RESIST UNDERLAYER FILM COMPOSITION AND PATTERNING PROCESS USING THE...

RESIST UNDERLAYER FILM COMPOSITION AND PATTERNING PROCESS USING THE...