Yusuke FUJI

Person

Osaka, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Resin and resist composition
- Patent number 10,766,992
- Issue date Sep 8, 2020
- Sumitomo Chemical Company, Limited
- Koji Ichikawa
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Resin and resist composition
- Patent number 9,051,405
- Issue date Jun 9, 2015
- Sumitomo Chemical Company, Limited
- Koji Ichikawa
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Chemically amplified resist composition and chemically amplified re...
- Patent number 8,062,829
- Issue date Nov 22, 2011
- Sumitomo Chemical Company, Limited
- Mitsuhiro Hata
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Chemically amplified positive resist composition
- Patent number 8,062,830
- Issue date Nov 22, 2011
- Sumitomo Chemical Company, Limited
- Yusuke Fuji
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Chemically amplified positive resist composition
- Patent number 8,057,983
- Issue date Nov 15, 2011
- Sumitomo Chemical Company, Limited
- Yusuke Fuji
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Polymer and chemically amplified resist composition comprising the...
- Patent number 8,048,612
- Issue date Nov 1, 2011
- Sumitomo Chemical Company, Limited
- Yusuke Fuji
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Polymer and chemically amplified resist composition comprising the...
- Patent number 7,981,985
- Issue date Jul 19, 2011
- Sumitomo Chemical Company, Limited
- Yusuke Fuji
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Chemically amplified positive resist composition
- Patent number 7,794,914
- Issue date Sep 14, 2010
- Sumitomo Chemical Company, Limited
- Nobuo Ando
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Chemically amplified resist composition
- Patent number 7,572,570
- Issue date Aug 11, 2009
- Sumitomo Chemical Company, Limited
- Yusuke Fuji
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Chemical amplification type positive resist composition and a resin...
- Patent number 7,175,963
- Issue date Feb 13, 2007
- Sumitomo Chemical Company, Limited
- Yusuke Fuji
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC

Patents Applicationslast 30 patents

Information Patent Application
RESIN AND RESIST COMPOSITION
- Publication number 20150132698
- Publication date May 14, 2015
- Sumitomo Chemical Company, Limited
- Koji ICHIKAWA
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
RESIN AND RESIST COMPOSITION
- Publication number 20100323296
- Publication date Dec 23, 2010
- Sumitomo Chemical Company, Limited
- Koji Ichikawa
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
RESIST PROCESSING METHOD
- Publication number 20100279226
- Publication date Nov 4, 2010
- Mitsuhiro Hata
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PROCESS FOR PRODUCING PHOTORESIST PATTERN
- Publication number 20100273112
- Publication date Oct 28, 2010
- Sumitomo Chemical Company, Limited
- Mitsuhiro Hata
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
CHEMICALLY AMPLIFIED PHOTORESIST COMPOSITION AND METHOD FOR FORMING...
- Publication number 20100203446
- Publication date Aug 12, 2010
- Sumitomo Chemical Company, Limited
- Koji Ichikawa
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
CHEMICALLY AMPLIFIED POSITIVE RESIST COMPOSITION
- Publication number 20100167199
- Publication date Jul 1, 2010
- SUMITOMO CHEMICAL COMPANY, LIMITED
- Takayuki MIYAGAWA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
POLYMER AND CHEMICALLY AMPLIFIED RESIST COMPOSITION COMPRISING THE...
- Publication number 20090317744
- Publication date Dec 24, 2009
- Sumitomo Chemical Company, Limited
- Yusuke FUJI
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
CHEMICALLY AMPLIFIED POSITIVE RESIST COMPOSITION
- Publication number 20090269695
- Publication date Oct 29, 2009
- Sumitomo Chemical Company, Limited
- Yusuke FUJI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
POLYMER AND CHEMICALLY AMPLIFIED RESIST COMPOSITION COMPRISING THE...
- Publication number 20090264565
- Publication date Oct 22, 2009
- Sumitomo Chemical Company, Limited
- Yusuke FUJI
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
CHEMICALLY AMPLIFIED POSITIVE RESIST COMPOSITION
- Publication number 20090263742
- Publication date Oct 22, 2009
- Sumitomo Chemical Company, Limited
- Yusuke FUJI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
CHEMICALLY AMPLIFIED RESIST COMPOSITION AND CHEMICALLY AMPLIFIED RE...
- Publication number 20090220890
- Publication date Sep 3, 2009
- Mitsuhiro HATA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
CHEMICALLY AMPLIFIED RESIST COMPOSITION
- Publication number 20080274426
- Publication date Nov 6, 2008
- Sumitomo Chemical Company, Limited
- Yusuke FUJI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Chemically amplified positive resist composition
- Publication number 20070218401
- Publication date Sep 20, 2007
- Sumitomo Chemical Company, Limited
- Nobuo Ando
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Method for producing resin for chemically amplified positive resist
- Publication number 20070072120
- Publication date Mar 29, 2007
- SUMITOMO SEIKA CHEMICALS CO., LTD.
- Shinya Okazaki
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
Chemical amplification type positive resist composition and a resin...
- Publication number 20050100819
- Publication date May 12, 2005
- Sumitomo Chemical Company, Limited
- Yusuke Fuji
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Yusuke FUJI

Person

Patents Grantslast 30 patents

Resin and resist composition

Resin and resist composition

Chemically amplified resist composition and chemically amplified re...

Chemically amplified positive resist composition

Chemically amplified positive resist composition

Polymer and chemically amplified resist composition comprising the...

Polymer and chemically amplified resist composition comprising the...

Chemically amplified positive resist composition

Chemically amplified resist composition

Chemical amplification type positive resist composition and a resin...

Patents Applicationslast 30 patents

RESIN AND RESIST COMPOSITION

RESIN AND RESIST COMPOSITION

RESIST PROCESSING METHOD

PROCESS FOR PRODUCING PHOTORESIST PATTERN

CHEMICALLY AMPLIFIED PHOTORESIST COMPOSITION AND METHOD FOR FORMING...

CHEMICALLY AMPLIFIED POSITIVE RESIST COMPOSITION

POLYMER AND CHEMICALLY AMPLIFIED RESIST COMPOSITION COMPRISING THE...

CHEMICALLY AMPLIFIED POSITIVE RESIST COMPOSITION

POLYMER AND CHEMICALLY AMPLIFIED RESIST COMPOSITION COMPRISING THE...

CHEMICALLY AMPLIFIED POSITIVE RESIST COMPOSITION

CHEMICALLY AMPLIFIED RESIST COMPOSITION AND CHEMICALLY AMPLIFIED RE...

CHEMICALLY AMPLIFIED RESIST COMPOSITION

Chemically amplified positive resist composition

Method for producing resin for chemically amplified positive resist

Chemical amplification type positive resist composition and a resin...