Yusuke HAMA

Person

Kakegawa-shi, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Ethynyl derived composite, a composition comprising thereof, a meth...
- Patent number 11,914,296
- Issue date Feb 27, 2024
- Merck Patent GmbH
- Shigemasa Nakasugi
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Ethynyl derived composite, a composition comprising thereof, a meth...
- Patent number 11,609,498
- Issue date Mar 21, 2023
- Merck Patent GmbH
- Shigemasa Nakasugi
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Compound, semiconductor material, and methods for manufacturing coa...
- Patent number 11,450,805
- Issue date Sep 20, 2022
- Merck Patent GmbH
- Shigemasa Nakasugi
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Allyloxy derivative, resist underlayer forming composition using th...
- Patent number 11,366,389
- Issue date Jun 21, 2022
- Merck Patent GmbH
- Shigemasa Nakasugi
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Composition for forming underlayer and method for forming underlaye...
- Patent number 10,451,971
- Issue date Oct 22, 2019
- AZ Electronic Materials (Luxembourg) S.A.R.L.
- Masato Suzuki
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Top-layer membrane formation composition and method for forming res...
- Patent number 10,268,117
- Issue date Apr 23, 2019
- AZ Electronic Materials (Luxembourg) S.a.r.l.
- Masato Suzuki
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Composition for forming topcoat layer and resist pattern formation...
- Patent number 9,804,493
- Issue date Oct 31, 2017
- Samsung Electronics Co., Ltd.
- Hyun-woo Kim
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Composition for forming topcoat layer and resist pattern formation...
- Patent number 9,766,544
- Issue date Sep 19, 2017
- Samsung Electronics Co., Ltd.
- Hyun-woo Kim
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Patents Applicationslast 30 patents

Information Patent Application
ETHYNYL DERIVED COMPOSITE, A COMPOSITION COMPRISING THEREOF, A METH...
- Publication number 20230194989
- Publication date Jun 22, 2023
- Merck Patent GmbH
- Shigemasa NAKASUGI
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
A PHOTORESIST COMPOSITION, A METHOD FOR MANUFACTURING A PHOTORESIST...
- Publication number 20210263414
- Publication date Aug 26, 2021
- Shunji KAWATO
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
ALLYLOXY DERIVATIVE, RESIST UNDERLAYER FORMING COMPOSITION USING TH...
- Publication number 20210181636
- Publication date Jun 17, 2021
- Merck Patent GmbH
- Shigemasa NAKASUGI
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
AN ETHYNYL DERIVED COMPOSITE, A COMPOSITION COMPRISING THEREOF, A M...
- Publication number 20200401046
- Publication date Dec 24, 2020
- Merck Patent GmbH
- Shigemasa NAKASUGI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
NOVEL COMPOUND, SEMICONDUCTOR MATERIAL, AND METHODS FOR MANUFACTURI...
- Publication number 20200044158
- Publication date Feb 6, 2020
- Merck Patent GmbH
- Shigemasa NAKASUGI
- C07 - ORGANIC CHEMISTRY
Information Patent Application
A POLYMER, COMPOSITION, FORMING SACRIFICIAL LAYER AND METHOD FOR SE...
- Publication number 20190048129
- Publication date Feb 14, 2019
- Shigemasa NAKASUGI
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
COMPOSITION FOR FORMING UNDERLAYER AND METHOD FOR FORMING UNDERLAYE...
- Publication number 20180039178
- Publication date Feb 8, 2018
- AZ ELECTRONIC MATERIALS (LUXEMBOURG) S.a.r.l.
- Masato SUZUKI
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
SACRIFICIAL FILM COMPOSITION, METHOD FOR PREPARING SAME, SEMICONDUC...
- Publication number 20170218227
- Publication date Aug 3, 2017
- AZ ELECTRONIC MATERIALS (LUXEMBOURG) S.a.r.l.
- Shigemasa NAKASUGI
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
TOP-LAYER MEMBRANE FORMATION COMPOSITION AND METHOD FOR FORMING RES...
- Publication number 20170090288
- Publication date Mar 30, 2017
- AZ ELECTRONIC MATERIALS (LUXEMBOURG) S.a.r.l.
- Masato SUZUKI
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
COMPOSITION FOR FORMING TOPCOAT LAYER AND RESIST PATTERN FORMATION...
- Publication number 20150147701
- Publication date May 28, 2015
- Hyun-woo KIM
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...

Yusuke HAMA

Person

Patents Grantslast 30 patents

Ethynyl derived composite, a composition comprising thereof, a meth...

Ethynyl derived composite, a composition comprising thereof, a meth...

Compound, semiconductor material, and methods for manufacturing coa...

Allyloxy derivative, resist underlayer forming composition using th...

Composition for forming underlayer and method for forming underlaye...

Top-layer membrane formation composition and method for forming res...

Composition for forming topcoat layer and resist pattern formation...

Composition for forming topcoat layer and resist pattern formation...

Patents Applicationslast 30 patents

ETHYNYL DERIVED COMPOSITE, A COMPOSITION COMPRISING THEREOF, A METH...

A PHOTORESIST COMPOSITION, A METHOD FOR MANUFACTURING A PHOTORESIST...

ALLYLOXY DERIVATIVE, RESIST UNDERLAYER FORMING COMPOSITION USING TH...

AN ETHYNYL DERIVED COMPOSITE, A COMPOSITION COMPRISING THEREOF, A M...

NOVEL COMPOUND, SEMICONDUCTOR MATERIAL, AND METHODS FOR MANUFACTURI...

A POLYMER, COMPOSITION, FORMING SACRIFICIAL LAYER AND METHOD FOR SE...

COMPOSITION FOR FORMING UNDERLAYER AND METHOD FOR FORMING UNDERLAYE...

SACRIFICIAL FILM COMPOSITION, METHOD FOR PREPARING SAME, SEMICONDUC...

TOP-LAYER MEMBRANE FORMATION COMPOSITION AND METHOD FOR FORMING RES...

COMPOSITION FOR FORMING TOPCOAT LAYER AND RESIST PATTERN FORMATION...