Yusuke Horiguchi

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Toyama-shi, JP

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Patents Grantslast 30 patents

Information Patent Grant
Composition for forming photosensitive resist underlayer film
- Patent number 9,436,085
- Issue date Sep 6, 2016
- Nissan Chemical Industries, Ltd.
- Yusuke Horiguchi
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Resist underlayer film forming composition containing liquid additive
- Patent number 8,481,247
- Issue date Jul 9, 2013
- Nissan Chemical Industries, Ltd.
- Yusuke Horiguchi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method of producing semiconductor device using resist underlayer fi...
- Patent number 8,227,172
- Issue date Jul 24, 2012
- Nissan Chemical Industries, Ltd.
- Yusuke Horiguchi
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Silicon-containing resist underlayer coating forming composition fo...
- Patent number 8,048,615
- Issue date Nov 1, 2011
- Nissan Chemical Industries, Ltd.
- Satoshi Takei
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Patents Applicationslast 30 patents

Information Patent Application
COMPOSITION FOR FORMATION OF PHOTOSENSITIVE RESIST UNDERLAYER FILM...
- Publication number 20120288795
- Publication date Nov 15, 2012
- Nissan Chemical Industries, Ltd.
- Makiko Umezaki
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
COMPOSITION FOR FORMING PHOTOSENSITIVE RESIST UNDERLAYER FILM
- Publication number 20120251950
- Publication date Oct 4, 2012
- Nissan Chemical Industries, Ltd.
- Yusuke Horiguchi
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
Method of producing semiconductor device using resist underlayer fi...
- Publication number 20100022092
- Publication date Jan 28, 2010
- Nissan Chemical Industries, Ltd.
- Yusuke Horiguchi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RESIST UNDERLAYER FILM FORMING COMPOSITION CONTAINING LIQUID ADDITIVE
- Publication number 20090311624
- Publication date Dec 17, 2009
- Nissan Chemical Industries, Ltd.
- Yusuke Horiguchi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Silicon-Containing Resist Underlayer Coating Forming Composition fo...
- Publication number 20090162782
- Publication date Jun 25, 2009
- Nissan Chemical Industries, Ltd.
- Satoshi Takei
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY