Yusuke Muraki

Person

Yamanashi-Ken, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Gas phase etch with controllable etch selectivity of metals
- Patent number 11,715,643
- Issue date Aug 1, 2023
- Tokyo Electron Limited
- Subhadeep Kal
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate processing method and substrate processing apparatus
- Patent number 11,328,932
- Issue date May 10, 2022
- Tokyo Electron Limited
- Yusuke Muraki
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Modification processing method and method of manufacturing semicond...
- Patent number 9,911,596
- Issue date Mar 6, 2018
- Tokyo Electron Limited
- Tamotsu Morimoto
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Modification processing method and method of manufacturing semicond...
- Patent number 9,443,724
- Issue date Sep 13, 2016
- Tokyo Electron Limited
- Tamotsu Morimoto
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Etching method, etching apparatus, and storage medium
- Patent number 9,362,149
- Issue date Jun 7, 2016
- Tokyo Electron Limited
- Yusuke Muraki
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate stage, substrate processing apparatus and substrate proce...
- Patent number 9,153,465
- Issue date Oct 6, 2015
- Tokyo Electron Limited
- Masaya Odagiri
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Etching of silicon oxide film
- Patent number 9,105,586
- Issue date Aug 11, 2015
- Tokyo Electron Limited
- Shigeki Tozawa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate processing apparatus
- Patent number 8,741,065
- Issue date Jun 3, 2014
- Tokyo Electron Limited
- Masaya Odagiri
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Substrate processing apparatus
- Patent number 8,353,986
- Issue date Jan 15, 2013
- Tokyo Electron Limited
- Yoshiaki Sasaski
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method for manufacturing semiconductor device
- Patent number 7,897,498
- Issue date Mar 1, 2011
- Tokyo Electron Limited
- Glenn Gale
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Method of manufacturing a capacitor having tantalum oxide film as a...
- Patent number 6,797,560
- Issue date Sep 28, 2004
- Tokyo Electron Limited
- Keizo Hosoda
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Capacitor for analog circuit, and manufacturing method thereof
- Patent number 6,551,896
- Issue date Apr 22, 2003
- Tokyo Electron Limited
- Keizo Hosoda
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Silicon nitride film formation method
- Patent number 6,355,582
- Issue date Mar 12, 2002
- Tokyo Electron Limited
- Keizo Hosoda
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

Patents Applicationslast 30 patents

Information Patent Application
SUBSTRATE PROCESSING METHOD AND SUBSTRATE PROCESSING APPARATUS
- Publication number 20210287906
- Publication date Sep 16, 2021
- TOKYO ELECTRON LIMITED
- Yusuke MURAKI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
GAS PHASE ETCH WITH CONTROLLABLE ETCH SELECTIVITY OF METALS
- Publication number 20210020454
- Publication date Jan 21, 2021
- TOKYO ELECTRON LIMITED
- Subhadeep Kal
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MODIFICATION PROCESSING METHOD AND METHOD OF MANUFACTURING SEMICOND...
- Publication number 20160351390
- Publication date Dec 1, 2016
- TOKYO ELECTRON LIMITED
- Tamotsu MORIMOTO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MODIFICATION PROCESSING METHOD AND METHOD OF MANUFACTURING SEMICOND...
- Publication number 20150357187
- Publication date Dec 10, 2015
- TOKYO ELECTRON LIMITED
- Tamotsu MORIMOTO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Etching Method, Etching Apparatus, and Storage Medium
- Publication number 20150072533
- Publication date Mar 12, 2015
- TOKYO ELECTRON LIMITED
- Yusuke MURAKI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING APPARATUS
- Publication number 20120178263
- Publication date Jul 12, 2012
- TOKYO ELECTRON LIMITED
- Shigeki TOZAWA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE STAGE, SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCE...
- Publication number 20120000612
- Publication date Jan 5, 2012
- TOKYO ELECTRON LIMITED
- Masaya ODAGIRI
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SUBSTRATE PROCESSING APPARATUS
- Publication number 20120000629
- Publication date Jan 5, 2012
- TOKYO ELECTRON LIMITED
- Masaya ODAGIRI
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
GAS PROCESSING APPARATUS, GAS PROCESSING METHOD, AND STORAGE MEDIUM
- Publication number 20110035957
- Publication date Feb 17, 2011
- TOKYO ELECTRON LIMITED
- Yusuke Muraki
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Processing Method and Recording Medium
- Publication number 20100216296
- Publication date Aug 26, 2010
- Yusuke Muraki
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Substrate Processing Apparatus
- Publication number 20100163179
- Publication date Jul 1, 2010
- Shigeki Tozawa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
THERMAL PROCESSING APPARATUS AND PROCESSING SYSTEM
- Publication number 20090242129
- Publication date Oct 1, 2009
- TOKYO ELECTRON, LIMITED
- Tadashi Onishi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method for Manufacturing Semiconductor Device
- Publication number 20080268655
- Publication date Oct 30, 2008
- Glenn Gale
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Etching of silicon oxide film
- Publication number 20080254636
- Publication date Oct 16, 2008
- TOKYO ELECTRON LIMITED
- Shigeki Tozawa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Peeling-off method and reworking method of resist film
- Publication number 20070184379
- Publication date Aug 9, 2007
- TOKYO ELECTRON LIMITED
- Shigeo Ashigaki
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Substrate processing apparatus
- Publication number 20060219171
- Publication date Oct 5, 2006
- TOKYO ELECTRON LIMITED
- Yoshiaki Sasaki
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Capacitor for analog circuit, and manufacturing method thereof
- Publication number 20020160577
- Publication date Oct 31, 2002
- Keizo Hosoda
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method of manufacturing a capacitor having tantalum oxide film as a...
- Publication number 20010055821
- Publication date Dec 27, 2001
- Keizo Hosoda
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

Yusuke Muraki

Person

Patents Grantslast 30 patents

Gas phase etch with controllable etch selectivity of metals

Substrate processing method and substrate processing apparatus

Modification processing method and method of manufacturing semicond...

Modification processing method and method of manufacturing semicond...

Etching method, etching apparatus, and storage medium

Substrate stage, substrate processing apparatus and substrate proce...

Etching of silicon oxide film

Substrate processing apparatus

Substrate processing apparatus

Method for manufacturing semiconductor device

Method of manufacturing a capacitor having tantalum oxide film as a...

Capacitor for analog circuit, and manufacturing method thereof

Silicon nitride film formation method

Patents Applicationslast 30 patents

SUBSTRATE PROCESSING METHOD AND SUBSTRATE PROCESSING APPARATUS

GAS PHASE ETCH WITH CONTROLLABLE ETCH SELECTIVITY OF METALS

MODIFICATION PROCESSING METHOD AND METHOD OF MANUFACTURING SEMICOND...

MODIFICATION PROCESSING METHOD AND METHOD OF MANUFACTURING SEMICOND...

Etching Method, Etching Apparatus, and Storage Medium

SUBSTRATE PROCESSING APPARATUS

SUBSTRATE STAGE, SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCE...

SUBSTRATE PROCESSING APPARATUS

GAS PROCESSING APPARATUS, GAS PROCESSING METHOD, AND STORAGE MEDIUM

Processing Method and Recording Medium

Substrate Processing Apparatus

THERMAL PROCESSING APPARATUS AND PROCESSING SYSTEM

Method for Manufacturing Semiconductor Device

Etching of silicon oxide film

Peeling-off method and reworking method of resist film

Substrate processing apparatus

Capacitor for analog circuit, and manufacturing method thereof

Method of manufacturing a capacitor having tantalum oxide film as a...