Yusuke Muraoka

Person

Kyoto, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Substrate stage and heat treatment apparatus
- Patent number 7,764,355
- Issue date Jul 27, 2010
- Tohoku University
- Tadahiro Ohmi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
High-pressure processing apparatus and high-pressure processing method
- Patent number 7,562,663
- Issue date Jul 21, 2009
- Dainippon Screen Mfg. Co., Ltd.
- Yusuke Muraoka
- B08 - CLEANING
Information Patent Grant
High pressure processing method and apparatus
- Patent number 7,513,265
- Issue date Apr 7, 2009
- Kabushiki Kaisha Kobe Seiko Sho
- Tetsuya Yoshikawa
- B08 - CLEANING
Information Patent Grant
High-pressure processing apparatus and high-pressure processing method
- Patent number 7,435,396
- Issue date Oct 14, 2008
- Dainippon Screen Mfg. Co., Ltd.
- Yusuke Muraoka
- G05 - CONTROLLING REGULATING
Information Patent Grant
Substrate processing method, substrate processing apparatus and sub...
- Patent number 7,384,484
- Issue date Jun 10, 2008
- Dainippon Screen Mfg. Co., Ltd.
- Yusuke Muraoka
- G11 - INFORMATION STORAGE
Information Patent Grant
High pressure processing method
- Patent number 7,252,719
- Issue date Aug 7, 2007
- Kabushiki Kaisha Kobe Seiko Sho
- Yoshihiko Sakashita
- B08 - CLEANING
Information Patent Grant
High pressure processing apparatus and method
- Patent number 7,111,630
- Issue date Sep 26, 2006
- Dainippon Screen Mfg. Co., Ltd.
- Ikuo Mizobata
- B08 - CLEANING
Information Patent Grant
High pressure processing apparatus and method
- Patent number 7,080,651
- Issue date Jul 25, 2006
- Dainippon Screen Mfg. Co., Ltd.
- Ikuo Mizobata
- B08 - CLEANING
Information Patent Grant
High pressure processing apparatus and high pressure processing method
- Patent number 7,000,653
- Issue date Feb 21, 2006
- Kabushiki Kaisha Kobe Seiko Sho
- Yoshihiko Sakashita
- B08 - CLEANING
Information Patent Grant
High pressure processing apparatus
- Patent number 6,874,513
- Issue date Apr 5, 2005
- Kabushiki Kaisha Kobe Seiko Sho
- Masahiro Yamagata
- B08 - CLEANING
Information Patent Grant
Substrate processing apparatus equipping with high-pressure process...
- Patent number 6,841,031
- Issue date Jan 11, 2005
- Dainippon Screen Mfg. Co., Ltd.
- Tomomi Iwata
- C03 - GLASS MINERAL OR SLAG WOOL
Information Patent Grant
High pressure processing apparatus and high pressure processing method
- Patent number 6,823,880
- Issue date Nov 30, 2004
- Kabushiki Kaisha Kobe Seiko Sho
- Yoshihiko Sakashita
- B08 - CLEANING
Information Patent Grant
Method and system for processing substrate
- Patent number 6,703,316
- Issue date Mar 9, 2004
- Kabushiki Kaisha Kobe Seiko Sho
- Yoichi Inoue
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
High-pressure drying apparatus, high-pressure drying method and sub...
- Patent number 6,691,430
- Issue date Feb 17, 2004
- Dainippon Screen Mfg. Co., Ltd.
- Kimitsugu Saito
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Fluid heating apparatus
- Patent number 6,465,765
- Issue date Oct 15, 2002
- Omron Corporation
- Masakazu Katayama
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Apparatus for processing substrates
- Patent number 6,074,515
- Issue date Jun 13, 2000
- Dainippon Screen Mfg. Co., Ltd.
- Izuru Iseki
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Apparatus and method for drying substrates
- Patent number 6,067,727
- Issue date May 30, 2000
- Dainippon Screen Mfg. Co., Ltd.
- Yusuke Muraoka
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Treating liquid replacing method, substrate treating method and sub...
- Patent number 5,826,601
- Issue date Oct 27, 1998
- Dainippon Screen Mfg., Co.
- Yusuke Muraoka
- B08 - CLEANING
Information Patent Grant
Device for rinsing and drying substrate
- Patent number 5,520,744
- Issue date May 28, 1996
- Dainippon Screen Manufacturing Co., Ltd.
- Kazonori Fujikawa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Apparatus for heat-treating wafers
- Patent number 4,849,608
- Issue date Jul 18, 1989
- Dainippon Screen Mfg. Co., Ltd.
- Yusuke Muraoka
- C30 - CRYSTAL GROWTH
Information Patent Grant
Heat processing apparatus for semiconductor manufacturing
- Patent number 4,803,948
- Issue date Feb 14, 1989
- Dainippon Screen Mfg. Co., Ltd.
- Keiji Nakagawa
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

Patents Applicationslast 30 patents

Information Patent Application
SUBSTRATE STAGE AND HEAT TREATMENT APPARATUS
- Publication number 20080024742
- Publication date Jan 31, 2008
- Tadahiro Ohmi
- C25 - ELECTROLYTIC OR ELECTROPHORETIC PROCESSES APPARATUS THEREFOR
Information Patent Application
HIGH PRESSURE PROCESSING METHOD
- Publication number 20060032520
- Publication date Feb 16, 2006
- KABUSHIKI KAISHA KOBE SEIKO SHO (KOBE STEEL, LTD)
- Yoshihiko Sakashita
- B08 - CLEANING
Information Patent Application
High-pressure processing apparatus and high-pressure processing method
- Publication number 20050079107
- Publication date Apr 14, 2005
- Dainippon Screen Mfg. Co., Ltd.
- Yusuke Muraoka
- G05 - CONTROLLING REGULATING
Information Patent Application
Cleaning apparatus for cleaning objects to be treated with use of c...
- Publication number 20050005957
- Publication date Jan 13, 2005
- Kabushiki Kaisha Kobe Seiko Sho
- Masahiro Yamagata
- B08 - CLEANING
Information Patent Application
High pressure processing apparatus and method
- Publication number 20040231698
- Publication date Nov 25, 2004
- Dainippon Screen Mfg. Co., Ltd.
- Ikuo Mizobata
- B08 - CLEANING
Information Patent Application
Substrate treating apparatus
- Publication number 20040221880
- Publication date Nov 11, 2004
- Kabushiki Kaisha Toshiba
- Hiroshi Tomita
- B08 - CLEANING
Information Patent Application
High pressure processing apparatus and high pressure processing method
- Publication number 20040194842
- Publication date Oct 7, 2004
- KABUSHIKI KAISHA KOBE SEIKO SHO (KOBE STEEL, LTD)
- Yoshihiko Sakashita
- B08 - CLEANING
Information Patent Application
High-pressure processing apparatus and high-pressure processing method
- Publication number 20040182419
- Publication date Sep 23, 2004
- Dainippon Screen Mfg. Co., Ltd.
- Yusuke Muraoka
- B08 - CLEANING
Information Patent Application
High pressure processing method and apparatus
- Publication number 20040123484
- Publication date Jul 1, 2004
- Kabushiki Kaisha Kobe Seiko Sho
- Tetsuya Yoshikawa
- B08 - CLEANING
Information Patent Application
Substrate processing method, substrate processing apparatus and sub...
- Publication number 20040105936
- Publication date Jun 3, 2004
- DAINIPPON SCREEN MFG. CO. LTD.
- Yusuke Muraoka
- G11 - INFORMATION STORAGE
Information Patent Application
High-pressure treatment apparatus and high-pressure treatment method
- Publication number 20040031441
- Publication date Feb 19, 2004
- Yusuke Muraoka
- B08 - CLEANING
Information Patent Application
High-pressure drying apparatus, high-pressure drying method and sub...
- Publication number 20030177659
- Publication date Sep 25, 2003
- Dainippon Screen Mfg. Co., Ltd.
- Kimitsugu Saito
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Substrate processing apparatus equipping with high-pressure process...
- Publication number 20030019578
- Publication date Jan 30, 2003
- Dainippon Screen Mfg. Co., Ltd.
- Tomomi Iwata
- C03 - GLASS MINERAL OR SLAG WOOL
Information Patent Application
High pressure processing apparatus and high pressure processing method
- Publication number 20020179114
- Publication date Dec 5, 2002
- KABUSHIKI KAISHA KOBE SEIKO SHO (KOBE STEEL, LTD)
- Yoshihiko Sakashita
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
High pressure processing apparatus and method
- Publication number 20020170577
- Publication date Nov 21, 2002
- Dainippon Screen Mfg. Co., Ltd.
- Ikuo Mizobata
- B08 - CLEANING
Information Patent Application
Method and system for processing substrate
- Publication number 20020160625
- Publication date Oct 31, 2002
- KABUSHIKI KAISHA KOBE SEIKO SHO
- Yoichi Inoue
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
High-pressure processing apparatus
- Publication number 20020148492
- Publication date Oct 17, 2002
- Kabushiki Kaisha Kobe Seiko Sho
- Masahiro Yamagata
- B08 - CLEANING
Information Patent Application
Fluid heating apparatus
- Publication number 20010017296
- Publication date Aug 30, 2001
- Omron Corporation and Dainippon Screen Mfg. Co.,
- Masakazu Katayama
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR

Yusuke Muraoka

Person

Patents Grantslast 30 patents

Substrate stage and heat treatment apparatus

High-pressure processing apparatus and high-pressure processing method

High pressure processing method and apparatus

High-pressure processing apparatus and high-pressure processing method

Substrate processing method, substrate processing apparatus and sub...

High pressure processing method

High pressure processing apparatus and method

High pressure processing apparatus and method

High pressure processing apparatus and high pressure processing method

High pressure processing apparatus

Substrate processing apparatus equipping with high-pressure process...

High pressure processing apparatus and high pressure processing method

Method and system for processing substrate

High-pressure drying apparatus, high-pressure drying method and sub...

Fluid heating apparatus

Apparatus for processing substrates

Apparatus and method for drying substrates

Treating liquid replacing method, substrate treating method and sub...

Device for rinsing and drying substrate

Apparatus for heat-treating wafers

Heat processing apparatus for semiconductor manufacturing

Patents Applicationslast 30 patents

SUBSTRATE STAGE AND HEAT TREATMENT APPARATUS

HIGH PRESSURE PROCESSING METHOD

High-pressure processing apparatus and high-pressure processing method

Cleaning apparatus for cleaning objects to be treated with use of c...

High pressure processing apparatus and method

Substrate treating apparatus

High pressure processing apparatus and high pressure processing method

High-pressure processing apparatus and high-pressure processing method

High pressure processing method and apparatus

Substrate processing method, substrate processing apparatus and sub...

High-pressure treatment apparatus and high-pressure treatment method

High-pressure drying apparatus, high-pressure drying method and sub...

Substrate processing apparatus equipping with high-pressure process...

High pressure processing apparatus and high pressure processing method

High pressure processing apparatus and method

Method and system for processing substrate

High-pressure processing apparatus

Fluid heating apparatus