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Yusuke Ono
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Fukushima, JP
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Patents Grants
last 30 patents
Information
Patent Grant
Reflective mask blank, reflective mask, and method for manufacturin...
Patent number
12,032,280
Issue date
Jul 9, 2024
AGC Inc.
Hiroshi Hanekawa
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Grant
Reflective mask blank, reflective mask, method of manufacturing ref...
Patent number
12,001,133
Issue date
Jun 4, 2024
AGC Inc.
Takuma Kato
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Grant
Reflective mask blank for EUV lithography and substrate with conduc...
Patent number
11,934,093
Issue date
Mar 19, 2024
AGC Inc.
Yusuke Ono
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Patents Applications
last 30 patents
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Patent Application
REFLECTIVE MASK BLANK, REFLECTIVE MASK, METHOD OF MANUFACTURING REF...
Publication number
20240280890
Publication date
Aug 22, 2024
AGC Inc.
Takuma KATO
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
REFLECTIVE MASK BLANK FOR EUV LITHOGRAPHY AND SUBSTRATE WITH CONDUC...
Publication number
20240184191
Publication date
Jun 6, 2024
AGC Inc.
Yusuke Ono
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
REFLECTIVE MASK BLANK, REFLECTIVE MASK, AND METHOD FOR MANUFACTURIN...
Publication number
20240160097
Publication date
May 16, 2024
AGC Inc.
Hiroshi HANEKAWA
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
REFLECTIVE MASK BLANK, REFLECTIVE MASK, METHOD OF MANUFACTURING REF...
Publication number
20240045320
Publication date
Feb 8, 2024
AGC Inc.
Takuma KATO
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
REFLECTIVE MASK BLANK FOR EUV LITHOGRAPHY AND SUBSTRATE WITH CONDUC...
Publication number
20230350284
Publication date
Nov 2, 2023
AGC Inc.
Yusuke Ono
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY