Yusuke Sato

Person

Ichihara-shi, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Novolak resins and resist materials
- Patent number 11,254,778
- Issue date Feb 22, 2022
- DIC Corporation
- Tomoyuki Imada
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Phenolic-hydroxyl-group-containing novolac resin and resist film
- Patent number 10,577,449
- Issue date Mar 3, 2020
- DIC Corporation
- Tomoyuki Imada
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Resin containing phenolic hydroxyl groups, and resist film
- Patent number 10,414,850
- Issue date Sep 17, 2019
- DIC Corporation
- Tomoyuki Imada
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Novolac phenol resin, manufacturing method therefor, photosensitive...
- Patent number 10,047,186
- Issue date Aug 14, 2018
- DIC Corporation
- Tomoyuki Imada
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Novolac-type phenolic hydroxyl group-containing resin, production m...
- Patent number 10,047,185
- Issue date Aug 14, 2018
- DIC Corporation
- Tomoyuki Imada
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Compound containing phenolic hydroxy group, photosensitive composit...
- Patent number 9,828,457
- Issue date Nov 28, 2017
- DIC Corporation
- Tomoyuki Imada
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Modified hydroxy naphthalene novolak resin, production method for m...
- Patent number 9,765,175
- Issue date Sep 19, 2017
- DIC Corporation
- Tomoyuki Imada
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Patents Applicationslast 30 patents

Information Patent Application
NOVOLAK RESINS AND RESIST MATERIALS
- Publication number 20190169348
- Publication date Jun 6, 2019
- DIC CORPORATION
- Tomoyuki Imada
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
NOVOLAC-TYPE PHENOLIC HYDROXY GROUP-CONTAINING RESIN, AND RESIST FILM
- Publication number 20190077901
- Publication date Mar 14, 2019
- DIC CORPORATION
- Tomoyuki Imada
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
NOVOLAC RESIN AND RESIST FILM
- Publication number 20180334523
- Publication date Nov 22, 2018
- DIC CORPORATION
- Tomoyuki Imada
- C07 - ORGANIC CHEMISTRY
Information Patent Application
RESIN CONTAINING PHENOLIC HYDROXYL GROUPS, AND RESIST FILM
- Publication number 20180327533
- Publication date Nov 15, 2018
- DIC CORPORATION
- Tomoyuki Imada
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PHENOLIC-HYDROXYL-GROUP-CONTAINING NOVOLAC RESIN AND RESIST FILM
- Publication number 20180134834
- Publication date May 17, 2018
- DIC CORPORATION
- Tomoyuki Imada
- C07 - ORGANIC CHEMISTRY
Information Patent Application
NOVOLAC TYPE PHENOL RESIN, MANUFACTURING METHOD THEREFOR, PHOTOSENS...
- Publication number 20170260315
- Publication date Sep 14, 2017
- DIC CORPORATION
- Tomoyuki IMADA
- C07 - ORGANIC CHEMISTRY
Information Patent Application
NOVOLAC-TYPE PHENOLIC HYDROXYL GROUP-CONTANING RESIN, PRODUCTION ME...
- Publication number 20170121444
- Publication date May 4, 2017
- DIC CORPORATION
- Tomoyuki Imada
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
PHOTOSENSITIVE COMPOSITION FOR PERMANENT FILMS, RESIST MATERIAL AND...
- Publication number 20170082923
- Publication date Mar 23, 2017
- DIC CORPORATION
- Tomoyuki Imada
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
MODIFIED HYDROXY NAPHTHALENE NOVOLAK RESIN, PRODUCTION METHOD FOR M...
- Publication number 20160177020
- Publication date Jun 23, 2016
- DIC CORPORATION
- Tomoyuki Imada
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
COMPOUND CONTAINING PHENOLIC HYDROXY GROUP, PHOTOSENSITIVE COMPOSIT...
- Publication number 20160159962
- Publication date Jun 9, 2016
- DIC CORPORATION
- Tomoyuki Imada
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...

Yusuke Sato

Person

Patents Grantslast 30 patents

Novolak resins and resist materials

Phenolic-hydroxyl-group-containing novolac resin and resist film

Resin containing phenolic hydroxyl groups, and resist film

Novolac phenol resin, manufacturing method therefor, photosensitive...

Novolac-type phenolic hydroxyl group-containing resin, production m...

Compound containing phenolic hydroxy group, photosensitive composit...

Modified hydroxy naphthalene novolak resin, production method for m...

Patents Applicationslast 30 patents

NOVOLAK RESINS AND RESIST MATERIALS

NOVOLAC-TYPE PHENOLIC HYDROXY GROUP-CONTAINING RESIN, AND RESIST FILM

NOVOLAC RESIN AND RESIST FILM

RESIN CONTAINING PHENOLIC HYDROXYL GROUPS, AND RESIST FILM

PHENOLIC-HYDROXYL-GROUP-CONTAINING NOVOLAC RESIN AND RESIST FILM

NOVOLAC TYPE PHENOL RESIN, MANUFACTURING METHOD THEREFOR, PHOTOSENS...

NOVOLAC-TYPE PHENOLIC HYDROXYL GROUP-CONTANING RESIN, PRODUCTION ME...

PHOTOSENSITIVE COMPOSITION FOR PERMANENT FILMS, RESIST MATERIAL AND...

MODIFIED HYDROXY NAPHTHALENE NOVOLAK RESIN, PRODUCTION METHOD FOR M...

COMPOUND CONTAINING PHENOLIC HYDROXY GROUP, PHOTOSENSITIVE COMPOSIT...